• Korean Journal of Materials Research
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• v.7 no.2
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• pp.157-161
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• 1997

The crystallographic site dependent substitution of $^{18}O$ for $^{16}O$ in $Bi_{2}Sr_{2}Ca_{0.8}Y_{0.2}Cu_{2}^{16}O_{8+\delta}$ has heen investigated. In the Kaman spectra of $Bi_{2}Sr_{2}Ca_{0.8}Y_{0.2}Cu_{2}^{16}O_{8+\delta}$ three prominent Raman bands are observed at 297. 464, and $623cm^{-1}$. As the $^{16}O$ arc replaced hy $^{18}O$, all the three bands shift to lower wavewnumbers. The rate of this isotopic shift is similar for the hands at 397 and $464cm^{-1}$. whereas it is quite slower for the hand at $623cm^{-1}$ '['his implys that the $^{16}O-^{18}O$ exchange reaction is crystallographic sites dependent. .Assuming a tetragonal symmetry, we assign the bands at 623. 464, and $297cm^{-1}$ to the vibrations of $O_{pl}(A_{g}),\;O_{ap}\;and\;O_{Bi}$ respectively.

• Korean Journal of Materials Research
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• v.8 no.7
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• pp.591-595
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• 1998

In this work, the freestanding GaN single crystalline substrates without cracks were grown by hydride vapor phase epitaxy (HVPE) and its some properties were investigated. The GaN substrate, having a current maximum size of 350 $\mu\textrm{m}$-thickness and 100$\textrm{mm}^2$ area, were obtained by HVPE growth of thick film GaN on sapphire substrate and subsequent mechanical removal of the sapphire substrate. A lattice constant of $C_o$= 5.18486 $\AA$ and a FWHM of DCXRD was 650 arcsec for the single crystalline GaN substrate. The low temperature PL spectrum consist of three excitonic emission and a deep D- A pair recombination at 1.8eV. The Raman E, (high) mode frequency was 567$cm^{-1}$ which was the same as that of strain free bulk single crystals. The Hall mobility and carrier concentration was 283$cm^3$<\ulcornerTEX>/ V.sand 1.1$\times$$10^{18}cm^{-3}$, respectively.

• Korean Journal of Materials Research
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• v.8 no.3
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• pp.229-237
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• 1998

We grew the hexagonal GaN films on (100) Si and (00.1) sapphire substrates in the temperature range of $300~730^{\circ}C$ by the direct reaction between thermally ionized N-source and thermally evaporated Ga-source. The GaN growth rates are increased at the initial stage of GaN formation and it was saturated to some values by the coalescence of each crystallites. The oxygen signal was observed in XPS spectra for all the GaN films grown in this work, especially low- temperature grown GaN film may due to incorporation of the residual oxygen in the growth chamber. The surface of low-temperature and shorter time grown films covered only Ga-droplets. however, with increasing the both substrate temperature and the growth time GaN is growth to crystallites. and coalescence to ring-type crystallites. With sufficient supply of N-source, they were changed to platelets. In the PL spectrum measured at 20 K, we observed the impurity related emission at 3.32eV and 3.38eV.

• Journal of Sensor Science and Technology
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• v.7 no.3
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• pp.218-224
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• 1998

2nO and $Al_{2}O_{3}$ powder were weighed in 1 : 1 mole ratio and ball-milled in ethanol for 3 h. Dried mixture were pressed and then sintered at $900^{\circ}C{\sim}1200^{\circ}C$ for 3 h in vacuum($3{\times}10^{-5}$ Torr). According to XRD, remnant ZnO and $Al_{2}O_{3}$ not converted to $ZnAl_{2}O_{4}$ were observed up to $1100^{\circ}C$, which were completely changed to$ZnAl_{2}O_{4}$ ternary compound at $1200^{\circ}C$. Optical bandgap is calculated at 4.75 eV. With increasing sintering temperature, PL spectrums shifted to shorter wavelengths and are appeared 430nm at $1200^{\circ}C$.

• Journal of Sensor Science and Technology
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• v.11 no.2
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• pp.118-123
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• 2002

$ZnGa_2O_4$ thin film phosphors have been deposited using a pulsed laser deposition technique on $Al_2O_3$(0001) substrates at a substrate temperature of $550^{\circ}C$ with various oxygen pressures 100, 200 and 300 mTorr. The films grown under different growth oxygen pressures have been characterized using microstructural and luminescent measurements. The different photoluminescence (PL) characteristics with the increase in oxygen pressures may result from the change of the crystallinity and the composition ratio of Zn and Ga in the films. The luminescent spectra show a broad band extending from 300 to 600 nm peaking at 460 nm. The PL brightness data obtained from the $ZnGa_2O_4$ films grown under optimized conditions have indicated that the sapphire is a promising substrate for the growth of high quality $ZnGa_2O_4$ thin film phosphor.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.10 no.6
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• pp.389-393
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• 2000

High-quality $Er^{3+}$ doped Mg : $LiNbO_3$single crystal fibers were grown by a micro-pulling down ($\mu$-PD) method. Single crystal fibers were pulled down through the nozzle, at a pulling down rate of 0.5 mm/min and using a Pt crucible with a nozzle 1 mm in diameter in air atmosphere. Defects such as bubbles, cracks and inclusions were not detected in any of the grown crystals. The optical transmission of Er : Mg : $LiNbO_3$crystal was measured and the energy levels of $Er_2O_3$ ion could be calculated. The photoluminescence spectrum of crystal fibers showed an energy band emission with the strongest line corresponding to the $^4I_{3/2}{\to}^4I_{15/2}$transition. The concentration dependence of the entire wavelength region emission intensity upon excitation intensity measured emission intensity for the 3 mol% MgO doped fibers was larger than that for the 1, 5 mol% MgO doped fibers.

• Korean Journal of Crystallography
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• v.8 no.1
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• pp.33-37
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• 1997

The optical properties of (1210) GaN epitaxy films grown on the (1012) $\alpha-A1_2O_3$ substrates have been studied. The hetero-epitaxy films were grown by the halide vapor phase epitaxy (HVPE) method using $Ga/HC1/NH_3/He$ system at $990^{\circ}C$. XRD, RHEED and SEM are used for the identification of the hetero-epitaxy films structure and surface morphology. The confirmed (1210) GaN epitaxy films were characterized by PL and Raman. By the Raman scattering, the active phonon modes of single-phase GaN films are varied with the arrangement of both polarization and propagation directions of laser beam with reference to the axis in single-phase crystal films. The Y(Z, Y & Z) X geometry allows scattering pat-terns of $A_1(TO)=533\;cm^{-1},\;E_1(TO)=559\;cm^{-1}\;and\;E_2=568 cm^{-1}$ modes, whereas in the Z(Y, Y & Z) X geometry the only $E_2$ mode are observed.

• Journal of the Korean Vacuum Society
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• v.16 no.3
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• pp.221-226
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• 2007

DBR (distributed Bragg reflectors) PSi (porous silicon) composite films displaying dual optical properties, both optical reflectivity and photoluminescence had been developed. DBR PSi samples were prepared by electrochemical etch of heavily doped $p^{++}-type$ silicon wafers (boron doped, polished on the <100> face, resistivity of $0.8-1.2m{\Omega}-cm$, Siltronix, Inc.). Free-standing DBR PSi films were treated with PMMA (polymethyl methacrylate) to produce flexible, stable composite materials in which the PSi matrix is covered with PMMA containing photoluminescent polysiloles. Optical characteristics of DBR PSi/polysilole-impregnated PMMA composite materials exhibit both their photonic reflectivity at 565 nm and photoluminescence at 510 nm, simultaneously. A possible application of this materials will be discussed.

• Korean Journal of Materials Research
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• v.8 no.7
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• pp.601-606
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• 1998

The $SrTi0_3$:Al, Pr red phosphors were prepared by solid state reaction method. Phosphor preparation parameters such as sintering temperature and time were optimized for the photoluminescence(PU intensity and the cathodoluminescence(CL) intensity. Powder samples showed the characteristic X-ray diffraction patterns of the perovskite structure and the average particle size of 3~5/$\mu\textrm{m}$ for particle size distribution(PSD) analysis. Also, scanning electron microscopy for the powder samples showed that the particles are reasonably crystallized with spherical shape. Especially, higher low voltage CL properties of $SrTi0_3$:Al, Pr phosphors than commercial $Y_2O_3$:Eu phosphors are expected to be applied for a low voltage field emission display(FED).

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.11a
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• pp.460-463
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• 2004

본 논문은 고에너지 방사선 검출을 위한 흔합형 구조의 방사선 센서를 제작, 반응 특성을 평가하였다. 먼저, 스크린 인쇄법을 이용하여 형광체 필름을 제작하였으며, 발광스펙트럼(PL, Photoluminescence) 및 잔광 시간(decay time) 측정을 통하여 형광체의 발광 특성을 조사하였다. 제작된 혼합구조의 방사선 센서는 $2{\mu}m$ 두께의 $HgI_2$와 $150{\mu}m$ 두께의 형광체 필름으로 제작되었으며, 면적은 $2\;cm\;{\times}\;2\;cm$이다. 방사선에 대한 전기적 검출 신호의 특성을 조사하기 위해 인가전압에 따른 암전류 및 방사선민감도, 선량에 따른 검출신호를 측정하였다. 측정결과, 제작된 $HgI_2$ 필름은 방사선에 의해 형광체에서 방출된 가시광 파장을 잘 흡수하였으며, 진단영역의 저에너지 방사선에 의해 직접 전기적 신호를 발생시켜 높은 방사선 민감도를 보였다. 뿐만 아니라, 인가전압에 대해 $10\;pA/mm^2$이하의 낮은 암전류를 가졌으며, 넓은 조사선량에서 우수한 선형성을 보였다.