• Journal of Microbiology and Biotechnology
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• 제31권2호
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• pp.233-239
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• 2021

Cyanobacteriochromes (CBCRs) are phytochrome-related photoreceptor proteins in cyanobacteria and cover a wide spectral range from ultraviolet to far-red. A single GAF domain that they contain can bind bilin(s) autocatalytically via heterologous recombination and then fluoresce, with potential applications as biomarkers and biosensors. Here, we report that a novel red/green CBCR GAF domain, SPI1085g2 from Spirulina subsalsa, covalently binds both phycocyanobilin (PCB) and phycoerythrobilin (PEB). The PCB-binding GAF domain exhibited canonical red/green photoconversion with weak fluorescence emission. However, the PEB-binding GAF domain, SPI1085g2-PEB, exhibited an intense orange fluorescence (λabs.max = 520 nm, λfluor.max = 555 nm), with a fluorescence quantum yield close to 1.0. The fluorescence of SPI1085g2-PEB was selectively and instantaneously quenched by copper ions in a concentration-dependent manner and exhibited reversibility upon treatment with the metal chelator EDTA. This study identified a novel PEB-binding cyanobacteriochrome-based fluorescent protein with the highest quantum yield reported to date and suggests its potential as a biosensor for the rapid detection of copper ions.

• 한국축산시설환경학회지
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• 제15권1호
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• pp.17-28
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• 2009

PEB system is more economical when compared with structures commonly used Hot rolled and welded light H-beam was introduced in the Standard Livestock Housing. This study suggested more economical technology for structural design by the reduction of live load, relief of deflection limit and reduction of importance factor. And, when applying wind Load as a result of examination with Low Rise Building Systems Manual considering open model, we can know that when the wind load is big, enclosed model is more stable than open model. In short, Suggesting more economical model and providing the method to reduce natural disaster, by the application of PEB system and the development of technology for structural design, are considered to strengthen the competitive power of farmhouse.

• Bulletin of the Korean Chemical Society
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• 제18권4호
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• pp.390-394
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• 1997

Nucleophilic substitution reactions of 2-thiopheneethyl benzenesulfonates (2-TEB) and 3-thiopheneethyl benzenesulfonates (3-TEB) with anilines and N,N-dimethylanilines (DMA) are investigated in acetonitrile at 60.0 ℃. The cross-interaction constants ρxz determined for the reactions with anilines are large negative (- 0.50) which are comparable to those for the similar predominantly frontside-attack SN2 reactions of 1-phenylethyl (1-PEB), 2-phenylethyl (2-PEB) and cumyl benzenesulfonates. A large negative ρxz value (- 0.4∼- 0.8) is considered to provide a mechanistic criterion for the frontside-attack SN2 mechanism with a four-center transition state. In agreement with this proposal the kinetic isotope effects, kH/kD, involving deuterated aniline nucleophiles are all greater than one reflecting partial N-H(D) bond cleavage in the transition state. The MO theoretical reactant structures of 1-PEB, 2-PEB and 2-TEB based on the PM3 calculation show that the benzene ring blocks the backside nucleophile approach to the reaction center carbon (Cα) enforcing the frontside-attack SN2 mechanism.

• 한국공간구조학회지
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• 제2권3호
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• pp.38-42
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• 2002

• Transactions on Electrical and Electronic Materials
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• 제6권4호
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• pp.135-139
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• 2005

In this paper, negative SU-8 photoresist processed at low temperature is characterized in terms of delamination. Based on a $3^3$ factorial designed experiment, 27 samples are fabricated, and the degree of delamination is measured for each. In addition, nine samples are fabricated for the purpose of verification. Employing the. neural network modeling technique, a process model is established, and response surfaces are generated to investigate degree of delamination associated with three process parameters: post exposure bake (PEB) temperature, PEB time, and exposure energy. From the response surfaces generated, two significant parameters associated with delamination are identified, and their effects on delamination are analyzed. Higher PEB temperature at a fixed PEB time results in a greater degree of delamination. In addition, a higher dose of exposure energy lowers the temperature at which the delamination begins and also results in a larger degree of delamination. These results identify acceptable ranges of the three process variables to avoid delamination of SU-8 film, which in turn might lead to potential defects in MEMS device fabrication.

• 한국강구조학회 논문집
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• 제23권3호
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• pp.357-365
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• 2011

저층 장스팬 철골프레임에는 강재절감을 위해 휨모멘트 저항을 극대화 한 판폭두께비가 큰 변단면 부재를 이용한 PEB시스템을 사용하고 있다. 과다한 외력에 의해 PEB시스템의 붕괴에 대한 안정성을 파악하기 위해서는 변단면 부재의 좌굴거동에 관한 실험 및 해석적 예측은 중요하다. 이에 본 연구에서는 변단면의 판폭(춤)두께비(d/t)와 변단면비를 주요 변수로 한 변단면 부재에 대한 실대형 실험을 행하였다. 현행 설계기준, 수정된 Yoda 모델을 이용한 소성힌지해석 및 유한요소해석으로 예측한 초기강성, 내력 및 모멘트-회전각관계에 대해서 실험결과와 비교하였다.

• 한국강구조학회 논문집
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• 제24권3호
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• pp.257-265
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• 2012

저층 장스팬 철골프레임에는 강재절감을 위해 휨모멘트 저항을 극대화 한 판폭두께비가 큰 변단면 부재를 이용한 PEB시스템을 사용하고 있다. 또한, 밀착조임 볼트접합은 완전조임 볼트접합에 비하여 공사비 절감과 시공용이성의 장점을 지니고 있다. 이에 본 연구에서는 밀착조임 볼트접합으로 이루어진 엔드플레이트형 접합형식에 판폭두께비가 큰 변단면 철골프레임의 실대형 실험을 행하였다. 변수로는 볼트체결방법과 재하하중방법이다. 프레임위치별 구조적 거동에 대해서 실험결과를 분석하고, 하중-변위관계에 대해서 해석결과와 비교하였다. 또한, 현장에서 밀착조임 볼트체결에 대한 볼트축력 도입과 사용성을 평가하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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• pp.43-44
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• 2005

SU-8 is a epoxy based photoresist designed for MEMS applications, where a thick, chemically and thermally stable image is desired. But SU-8 has proven to be very sensitive to variation in processing variables and hence difficult to use in the fabrication of useful structures. In this paper, negative SU-8 photoresist processed has been characterized in terms of delamination. Based on a full factorial designed experiment. Employing the design of experiment (DOE), a process parameter is established, and analyzing of full factional design is generated to investigate degree of delamination associated with three process parameters: post exposure bake (PEB) temperature, PEB time, and exposure energy. These results identify acceptable ranges of the three process variables to avoid delamination of SU-8 film, which in turn might lead to potential defects in MEMS device fabrication.

• Journal of information and communication convergence engineering
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• 제3권4호
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• pp.191-194
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• 2005

SU-8 is a epoxy based photoresist designed for MEMS applications, where a thick, chemically and thermally stable image are desired. However SU-8 has proven to be very sensitive to variation in processing variables and hence difficult to use in the fabrication of useful structures. In this paper, negative SU-8 photoresist processed has been characterized in terms of delamination, based on a full factorial designed experiment. Employing the design of experiment (DOE), a process parameter is established, and analyzing of full factorial design is generated to investigate degree of delamination associated with three process parameters: post exposure bake (PEB) temperature, PEB time, and exposure energy. These results identify acceptable ranges of the three process variables to avoid delamination of SU-8 film, which in turn might lead to potential defects in MEMS device fabrication.

• 한국정보통신학회:학술대회논문집
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• 한국해양정보통신학회 2005년도 추계종합학술대회
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• pp.891-894
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• 2005

SU-8은 부드러운 벽면을 가지는 두꺼운 패턴을 제작하는 데 사용되는 음성 감광제(negative photoresist)이다 .이것은 처리 후에 강성이 높고 화학적으로 강인한 장점을 가지고 있으며 최근 MEMS 디바이스의 구조체로 쓰이고 있다. 그러나 SU-8은 공정 처리요소들에 대하여 매우 민감하고 사용하기 어려운 것으로 알려져 있다. 본 연구에서는 공정 처리요소로 exposure energy, post exposure bake (PEB) temperature, PEB time을 조절하여 실험을 하였다. Response Surface Methodology (RSM)를 이용해 각 인자가 delamination에 미치는 영향에 대해 분석하였고 이를 바탕으로 SU-8의 delamination을 최소화하기 위한 처리요소들의 최적화 방안을 제시하였다.