• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.11a
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• pp.707-710
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• 2004

Chemical mechanical polishing (CMP) process has been widely used to planarize dielectric layers, which can be applied to the integrated circuits for sub-micron technology. Despite the increased use of CMP process, it is difficult to accomplish the global planarization of in the defect-free inter-level dielectrics (ILD). In this paper, we have investigated slurry properties and CMP performance of silicon dioxide (oxide) as a function of different temperature of slurry. Thermal effects on the silica slurry properties such as pH, particle size, conductivity and zeta potential were studied. Moreover, the relationship between the removal rate (RR) with WIWNU and slurry properties caused by changes of temperature were investigated. Therefore, the understanding of these temperature effects provides a foundation to optimize an oxide CMP Process for ULSI multi-level interconnection technology.

• Carbon letters
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• v.13 no.4
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• pp.212-220
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• 2012

Orange peel (OP) exhibits a sorption capacity towards anionic dyes such as reactive blue 19 (RB19). Cetyltrimethylammonium bromide (CTAB) as a cationic surfactant was used to modify the surface nature of OP to enhance its adsorption capacity for anionic dyes from an aqueous solution. Four adsorbents were investigated: the OP, sodium hydroxide-treated OP (SOP), CTAB-modified OP and CTAB-modified SOP. The physical and chemical properties of these sorbents were determined using nitrogen adsorption at 77 K and by scanning electron microscope and Fourier transform infrared spectroscopy techniques. The adsorption of the RB19 dye was assessed with these sorbents at different solution pH levels and temperatures. The effect of the contact time was considered to determine the order and rate constants of the adsorption process. The adsorption data were analyzed considering the Freundlich, Langmuir, Elovich and Tempkin models. The adsorption of RB19 by the assessed sorbents is of the chemisorption type following pseudo-first-order kinetics. CTAB modification brought about a significant increase in RB19 adsorption, which was ascribed to the grafting of the sorbent with a cationic surfactant.

• Membrane and Water Treatment
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• v.9 no.3
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• pp.189-194
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• 2018

Electrochemical reduction of nitrate was studied using Zn, Cu and (Ir+Ru)-Ti cathodes and Pt/Ti anode in a cell divided by an ion exchange membrane. During electrolysis, effects of the different cathode types on operating parameters (i.e., voltage, temperature and pH), nitrate removal efficiency and by-products (i.e., nitrite and ammonia) formation were investigated. Ammonia oxidation rate in the presence of NaCl was also determined using the different ratios of hypochlorous acid to ammonia. The operating parameter values were similar for all types of cathode materials and were maintained relatively constant. Nitrate was well reduced and converted mostly to ammonia using Zn and Cu cathodes. Ammonia, produced as a by-product of nitrate reduction, was oxidized in the presence of NaCl in the electrochemical process and the oxidation performance was enhanced upon increasing the hypochlorous acid-to-ammonia ratio to 1.09:1. Zn and Cu cathodes promoted the nitrate reduction to ammonia and the produced ammonia was finally removed from solution by reacting with hypochlorite ions. Using Zn or Cu cathodes, instead of noble metal cathodes, in the electrochemical process can be an alternative technology for nitrate-containing wastewater treatment.

• Microbiology and Biotechnology Letters
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• v.27 no.2
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• pp.118-123
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• 1999

A bacterial strain, designated T116, degrading terephthalic acid (TPA) was isolated from the soil around Taegu industrial area into which dye works wastewater flow. The isolate was identified as pseudomonas sp. based on its morphological and physiological characteristics. Degradation of TPA by the strain T116 was confirmed with UV scanning and HPLC. About 90% and 98% of TPA were degraded after 36 and 60 hours, respectively, during the culture in a liquid medium containing 0.1% TPA. Addition of KH2PO4 at a final concentration of 100ppm enhanced the chemical oxygen demand (COD) removal rate about 50% from dye works wastewater by Pseudomonas sp. T116. Optimum pH and temperature for COD reduction from wastewater were 7.0 and 3$0^{\circ}C$, respectively. The bacterium was applied to the continuous culture for the treatment of dye works wastewater whose TPA concentration and CODMn were 2,200ppm and 1,620ppm, respectively. It was observed that 90-95% of COD was eliminated after 4 days culture in the continuous culture with a retention time of 37 or 47 hours.

• YAKHAK HOEJI
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• v.40 no.3
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• pp.347-350
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• 1996

The post-antibiotic effect (PAE), which is defined as the period of time lag that the target organisms resume normal growth rate after complete removal of the antibiotics, of LB 20304 and ciprofloxacin was evaluated against Staphylococcus aureus 6538p and Escherichia coli 3190Y, respectively. The PAE was estimated by adding each antibiotic to a log phase of growth and incubating at $37^{\circ}$C for 1 h.Antibiotic was removed by centrifugation, and total viable cell counts were determined hourly for a further 10 h. The PAEs of LB20304 against S. aureus at concentrations of $1{\times}MIC\;and\;2{\mu}g/ml$ were 10 min and 93min, respectively. LB20304 showed a comparable PAE to ciprofloxacin. Against E. coli, the PAE of LB20304 was also similar to that of ciprofloxacin at concentration of $4{\times}MIC$ but it was much longer than that of ciprofloxacin at concentration of 2${\mu}g/ml$. LB20304 showed higher lethality than ciprofloxacin against both S. aureus and E. coli strains.

• Carbon letters
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• v.9 no.3
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• pp.181-187
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• 2008

Batch sorption experiments were carried out for the removal of metylene blue from its aqueous solution using $H_3PO_4$ activated Acacia arabica carbon (AAC). The prepared activated carbon was characterized and was found as an effective adsorbent material. The operating variables studied were initial metylene blue concentration, AAC concentration and solution pH. AAC activated carbon posses a maximum sorption capacity for the range of initial dye concentrations studied (60~100 mg $L^{-1}$). The sorption kinetics were analyzed using reversible first order kinetics, second order, reversible first order, pseudo-first order, and pseudo-second order model. The sorption data tend to fit very well in pseudo-second order model for the entire sorption time. The average pseudo-second order rate constant, $K_{II}$ and regression coefficient value were determined to be 0.0174 mg $g^{-1}$ $min^{-1}$ and 0.9977. The biosorption process also fit well to reversible I order kinetics with a regression coefficient of 0.9878.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.50-50
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• 2007

최근 DRAM 소자 내에서 Ruthenium (Ru) 은 높은 화학적 안정성, 누설전류에 대한 높은 저항성, 고유전체와의 높은 안정성등과 같은 특성으로 인해 금속층-유전막(insulator)-금속층 캐패시터에 대한 하부전극으로 각광받고 있다. 일반적으로 Ru은 화학적으로 매우 안정하여 습식 식각으로 제거하기 어려우며, 이로인해 건식 식각을 이용하여 Ru을 제거하는 것이 널리 통용되고 있다. 하지만 칵 캐패시터의 분리를 위해 Ru을 건식 식각할 경우, 유독한 $Ru0_4$ 가스가 발생할 수 있으며 Ru 하부전극의 탈균일한 표면과 몰드 산화막의 손실을 유발할 수 있다. 이로인해 각 캐패시터간의 분리와 평탄화를 위해 CMP 공정이 도입되게 되었다. 이러한 CMP 공정에 공급되는 슬러리에는 부식액, pH 적정제, 연마입자등이 첨가되는데 이때 연마입자가 응집하여 슬러리의 분산 안정성 저하에 영향을 줄 수 있다. 그리하여 본 연구에서는 Ru CMP Slurry에서의 surfactant와 같은 첨가제에 따른 zeta potential, particle size, sedimentation의 분석을 통해 slurry 안정성에 대란 영향을 살펴보았다. 또한 선택된 surfactant가 첨가된 Ru CMP Slurry를 제조하여 Ru의 removal rate와 TEOS에 대한 selectivity를 측정해 보았다.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.271.1-271.1
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• 2013

Titania is usually used in sun-screens, tooth paste, and other daily used objects as a pigment. However, scientists have focused on titania as photocatalyst due to its excellent activities. By fabricating vanadium doped TiO2 and CuOx co-catalyzed TiO2 nano-size filter, the degradation level of the volatile organic compound (VOC) concentration was tested using 365nm UV LED as light source in a closed chamber. Main purpose for this test is to evaluate the activities of various catalysts for degrading the VOCs which are detrimental to human body and toluene and p-xylene were chosen in the VOC removal test. Target gas materials were injected into the test chamber with dry air as carrier gas which was flowed into the gas washer bottle filled with liquid form of VOC substance. When the VOC gas flows into the chamber, it is circulated by 200 mm fan in order to contact with the set-up filter on the aluminum holder. Target gas concentration in the chamber was monitored using VOC detector (miniRae3000, Raesystems) which was also placed inside the chamber. With the measured concentration, the VOC degradation efficiency and the degradation rate were evaluated and used to compare the catalytic activities.

• Journal of Korean Society of Water and Wastewater
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• v.12 no.4
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• pp.78-85
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• 1998

Strains degrading and decolorizing reactive dyes, Procion blue HEGN and Procion red HE7B were isolated from water system, are named as RBK1 and RRK, the growth characteristics of which were investigated. Decolorization efficiencies after 42 hrs in batch culture were 95% and 77%, respectively. and the optimal culture condition of temperature and pH were $30^{\circ}C$, 7.0. Decolorization efficiencies in condition of aerobic shaking culture by strains RBK1 and RRK conspicuously increased, and culture by strain RBK1 was found as 95% after 42 hrs, while standing culture was 64%, Optimum nitrogen source was peptone, and It was found that decolorization efficiencies by strains RBK1 and RRK increased up to 4,000mg/l of peptone concentration as nitrogen source, but peptone concentration did' nt influence the decolorization efficiency in above 4,000mg/l. When the concentration of dyes were more than 800 mg/l and 400 mg/l respectively, the strains RBK1 and RRK, which degrade Procion bule HEGN and Procion red HE7B, showed a sharply decreased decolorization efficiencies; then the specific growth rate were $0.25hr^{-1}$ and $0.09hr^{-1}$.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.10a
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• pp.593-597
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• 2005

FIB equipment can perform sputtering and chemical vapor deposition simultaneously. It is very advantageously used to fabricate a micro structure part having 3D shape because the minimum beam size of ${\phi}$ 10nm and smaller is available. Currently FIB is not being applied in the fabrication of this micro part because of some problems to redeposition and charging effect of the substrate causing reduction of accuracy with regards to shape and productivity. Furthermore, the prediction of the material removal rate information should be required but it has been insufficient for micro part fabrication. The paper have the targets that are FIB-CVD characteristic analysis and minimum line pattern resolution achievement fur 3D micro fabrication. We make conclusions with the analysis of the results of the experiment according to beam current, pattern size and scanning parameters. CVD of 8 pico ampere shows superior CVD yield but CVD of 1318 pico ampere shows the pattern sputtered. And dwell time is dominant parameter relating to CVD yield.