• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.73-73
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• 2008

In this work, the study on the $SiO_2$ film non-uniformity by PECVD (Plasma Enhanced Chemical Vapor Deposition) was performed. Plasma diagnostics was analyzed by a DLP(Double Langmuir Probe) and a probe-type QMS(Quadrupole Mass Spectrometer) in order to investigate the spatial distribution of the plasma species in the chamber. The relationship between the plasma species and the depositing rate of the films was examined. On the basis of this work, it was confirmed that O radical density mainly contributed to the increase in the depositing rate of the $SiO_2$ films and the electron temperature in the plasma had a main effect on the formation of the oxygen radicals.

• Journal of Physiology & Pathology in Korean Medicine
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• v.22 no.1
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• pp.162-170
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• 2008

Kamisungihwalhyul-tang(KSHT) has been used for many years as a therapeutic agent for cerebrovascular disease and hypertension in Oriental Medicine. But the effect of KSHT on hypertension and reactive oxygen is not well-known. This study was examined to investigate the effect of KSHT on hypertension and reactive oxygen. After administering KSHT extract to Sprague- Dawley Rat forinjected subcutaneous with deoxycorticosterone acetate(DOCA) 8 weeks, changes in blood pressure, pulse rate, 2,2-diphenyl-1-picrylhydrazyl, reactive oxygen species, angiotensin converting enzyme, aldosterone, catecholamine levels, electrolyte, uric acid, BUN, creatinine in plasma were examined, and immunohistochemical changes and scanning electron microscopic changes were observed. 2,2-diphenyl-1-picrylhydrazyl(DPPH) scavenging activity was increased, reactive oxygen species(ROS) was decreased in a KSHT concentration-dependent. Angiotensin converting enzyme(ACE) inhibitory activity was increased in a concentration-dependent by KSHT. KSHT significantly decreased the blood pressure and heart rate in DOCA-salt hypertensive rat. KSHT significantly decreased the levels of aldosterone in DOCA-salt hypertensive rat. KSHT significantly decreased the level of dopamine, norepinephrine, epinephrine in DOCA-salt hypertensive rat. $Na^+$, $K^+$ and Cl- were decreased significantly, $Ca^{2+}$ was increased significantly by KSHT. KSHT significantly decreased uric acid, BUN, creatinine.

• Asian Pacific Journal of Cancer Prevention
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• v.16 no.13
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• pp.5343-5348
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• 2015

Promoter hypermethylation of the runt-related transcription factor 3 (RUNX3) gene is associated with increased risk of hepatocellular carcinoma (HCC). Oxidative stress plays a vital role in both carcinogenesis and progression of HCC. However, whether oxidative stress and RUNX3 hypermethylation in HCC have a cause-and-effect relationship is not known. In this study, plasma protein carbonyl and total antioxidant capacity (TAC) in patients with hepatitis B virus (HBV)-associated HCC (n=60) and age-matched healthy subjects (n=80) was determined. RUNX3 methylation in peripheral blood mononuclear cells (PBMC) of subjects was measured by methylation-specific PCR. Effect of reactive oxygen species (ROS) on induction of RUNX3 hypermethylation in HCC cells was investigated. Plasma protein carbonyl content was significantly higher, whereas plasma TAC was significantly lower, in HCC patients than healthy controls. Based on logistic regression, increased plasma protein carbonyl and decreased plasma TAC were independently associated with increased risk for HCC. PBMC RUNX3 methylation in the patient group was significantly greater than in the healthy group. RUNX3 methylation in hydrogen peroxide ($H_2O_2$)-treated HepG2 cells was significantly higher than in untreated control cells. In conclusion, increase in oxidative stress in Thai patients with HBV-associated HCC was demonstrated. This oxidative increment was independently associated with an increased risk for HCC development. RUNX3 in PBMC was found to be hypermethylated in the HCC patients. In vitro, RUNX3 hypermethylation was experimentally induced by $H_2O_2$. Our findings suggest that oxidative stress is a cause of RUNX3 promoter hypermethylation in HCC cells.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.230.2-230.2
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• 2016

A new approach for antimicrobial is based on the overproduction of reactive nitrogen species (RNS), especially; nitric oxide (NO) and peroxinitrite ($ONOO^-$-) are important factors to deactivate the bacteria. Recently, non-thermal atmospheric pressure plasma jet (APPJ) has been frequently used in the field of microbial sterilization through the generation of different kinds of RNS/ROS species. However, in previous study we showed APPJ has combine effects ROS/RNS on bacterial sterilization. It is not still clear whether this bacterial killing effect has been done through ROS or RNS. We need to further investigate separate effect of ROS and RNS on bacterial sterilization. Hence, in this work, we have enhanced NO production, especially; by applying a 1% of HNO3 vapour to the N2 based APPJ. In comparison with nitrogen plasma with inclusion of water vapour plasma, it has been shown that nitrogen plasma with inclusion of 1% of HNO3 vapour has higher efficiency in killing the E. coli and different type of cancer cell through the high production of NO. We also investigate the enhancement of NO species both in atmosphere by emission spectrum and inside the solution by ultraviolet absorption spectroscopy. Moreover, qPCR analysis of oxidative stress mRNA shows higher gene expression. It is noted that 1% of HNO3 vapour plasma generates high amount of NO for killing bacteria and cancer cell killing.

• The Research Journal of the Costume Culture
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• v.11 no.1
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• pp.66-74
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• 2003

This study is to improve the worst lightfastness of a natural dye. To modify the fiber surface, low temperature oxygen plasma was carried out on silk fabric. The result is followed below after the examination of surface shape, dyeability, color change, UV absorbent influence and lightfastness. 1. When electric discharge outputs are 60W, 80W and 100w, and processing times are 10minutes, 20minutes and 40minutes, the etching effect of surface increased as electric discharge outputs and processing times increased. 2. When examined UV absorbent for 5hours, 10hours, 20hours, 40hours and 80hours, the value changes of E are 1.47, 2.51, 2.91, 3.71, 4.51 and 5.31 in case of Al pre-mordanting/ prasma 80W, 20min./ UVabsorbent 5% (100:1), 2.31, 2.47, 3.84, 3.90, 3.61 and 4.42 in case of Al pre-mordanting/prasma 80W, 20min.1 UV absorbent 5% (o.w.f.). The lightfastness decreased when UV absorbent increased. 3. Dyeability of the samples pre-treated with five different methods was in the following order: plasma processing for 20minutes at 60W/Al pre-mordanting > Al pre-mordanting > plasma processing for 20minutes at 60W > Al after-mordanting. non mordanting Plasma treatment had superior effect on dyeability. 4. When UV absorbent was applied in fabric, the sample under higher electric discharge out puts showed more effective in improving lightfastness.

• Proceedings of the Korean Vacuum Society Conference
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• 1993.02a
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• pp.6-6
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• 1993

With brief instroduction of fabrication methods of dia.ond fillls by plasma CVD, recent progress in diamond research mainly done in the author's laboratory at Osaka University is reviewed.especially on the following topics: "low temperature diallond fabrication", "ion implantation", "hydrogen plasma treatment of ion-implanted diaaond to remove ion-induced damage", "Oxygen diffusion into the bulk assisted by the hydrogen treatllent", and "hole-burning effect".ffect".

• Journal of the Korean institute of surface engineering
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• v.29 no.6
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• pp.760-765
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• 1996

Silicon oxide thin films are prepared by plasma-enhanced CVD (PECVD) using 100kHz and 13.56MHz generators. Source gases are two sorts of mixture, tetramethoxysilane (TMOS) and oxygen, and tetramethylsilane (TMS) and oxygen. We investigate the effect of frequency on film properties of deposited films including mechanical properties. 100kHz PECVD process can deposit silicon oxide films at $23^{\circ}C$ at the power of 20W. X-ray photoelectron spectroscopy (XPS), infrared spectroscopy (IR) and ellipsometric measurements reveal that the structural quality of the films prepared both by 100kHz process and by 13.56MHz process are very like silicon dioxide. The 100kHz process is adequate for low temperature deposition of SiOx films.

• Korean Journal of Exercise Nutrition
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• v.14 no.2
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• pp.87-93
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• 2010

PURPOSE. The purpose of this study was to investigate the effect of red-pepper ingestion on excess post-exercise oxygen consumption in young women. METHODS. The six female college students involved in this experiment. The subjects participated in two trials, standard meal (650 kcal) and standard meal +10 g red-pepper with 200 ml water. After the subjects allowed to have rest for 60 min, exercised by resistance program for 40 minutes. RESULTS. The excess post-exercise oxygen consumption (EPOC) was not affected by the red-pepper ingestion. However, post-exercise fat oxidation and plasma free fatty acid levels were higher in red-pepper trial than in control trial. CONCLUSION. Therefore, red-pepper ingestion before resistance exercise might be improve body fat reduction.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.281.1-281.1
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• 2016

Transition metal dichalcogenides (TMDCs) are promising layered structure materials for next-generation nano electronic devices. Many investigation on the FET device using TMDCs channel material have been performed with some integrated approach. To use TMDCs for channel material of top-gate thin film transistor(TFT), the study on high-k dielectrics on TMDCs is necessary. However, uniform growth of atomic-layer-deposited high-k dielectric film on TMDCs is difficult, owing to the lack of dangling bonds and functional groups on TMDC's basal plane. We demonstrate the effect of remote oxygen plasma pretreatment of large area synthesized few-layer MoSe2 on the growth behavior of Al2O3, which were formed by atomic layer deposition (ALD) using tri-methylaluminum (TMA) metal precursors with water oxidant. We investigated uniformity of Al2O3 by Atomic force microscopy (AFM) and Scanning electron microscopy (SEM). Raman features of MoSe2 with remote plasma pretreatment time were obtained to confirm physical plasma damage. In addition, X-ray photoelectron spectroscopy (XPS) was measured to investigate the reaction between MoSe2 and oxygen atom after the remote O2 plasma pretreatment. Finally, we have uniform Al2O3 thin film on the MoSe2 by remote O2 plasma pretreatment before ALD. This study can provide interfacial engineering process to decrease the leakage current and to improve mobility of top-gate TFT much higher.

• Journal of Adhesion and Interface
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• v.9 no.1
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• pp.9-15
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• 2008

EVA foam was treated by oxygen plasma under a various treatment time for surface modification. The effect of plasma treatment on surface properties of EVA foam was investigated in terms of FT-IR ATR, XPS, contact angle, and SEM analysis and the adhesion characteristic of the EVA foam was studied in peel strength. As a results, EVA foam treated by plasma led to an elimination of organic compound, an increase of oxygen content, and an increase of surface roughness, resulting in improving the adhesion properties of the EVA foam. As the plasma treatment time increased, the hydrophilicity and physical change of surface of the EVA foam were increased and showed maximum value at 180 s and 420 s, respectively. The maximum adhesion strength appeared at plasma treatment time of 420 s and therefore, in this study the physical change was thought to be a major factor for improving the adhesion of the EVA foam.