• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.491-491
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• 2013

A novel plasma system has been developed for 3-dimensional modification of the carbon nano-powders. Improvement of dispersion of these nano materials are studied by plasma discharge, not using chemical modification. The plasma process is considered to great advantages over wet chemical process due to environmental, economic viewpoint, and uniformity over the treated volume. The uniform dispersion is a critical factor for these material's nano composite applications. Using this plasma system, graphene, carbon black, and CNT was treated and functionalized. Several key discharge conditions such as Ar/H2/O2 or Ar/H2/NH3 gas ratio, treatment time, power, feeder's vibration frequency are investigated. Hydrophobic of graphene has turned some more into hydrophilic by reaction test with water, electrophoresis, surface contact angle test, and turbidity analysis. The oxygen content ratio in the plasma treated CNT has increased about 3.7 times than the untreatedone. In the case of graphene and carbon black, the oxygen- and nitrogen- content has been enhanced average 10%. O-H (N-H) peak, C-O (C-N) peak, and C=O (C=N) peak data have been detected by FTIR measurement and intensified compared to before-plasma treatment due to O2 or NH3 content.

• Proceedings of the Korean Fiber Society Conference
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• 2003.04a
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• pp.434-435
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• 2003

Physicochemical properties of a polymer surface significantly affect adhesion, wetting, and dyeing properties. In recent years, low temperature plasma technology has been widely used for surface modification of polymers. Surface fluorination by low temperature plasma treatment has been employed to improve the water and oily repellency of textile fabrics. However, very few results have been reported on soil release properties of the oxygen plasma treated textile fabrics. (omitted)

• Korean Chemical Engineering Research
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• v.48 no.3
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• pp.355-358
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• 2010

Inductively coupled low temperature plasmas with oxygen, argon, mixture of oxygen and argon, and nitrogen have been used to modify polycarbonate(PC) films at the various process conditions. All plasma treatments generally had a tendency to increase the surface roughness of PC regardless of process conditions. The treatment of oxygen plasma showed the highest value in the surface roughness and mostly enhanced the generation of oxygen containing polar groups as much as 43% in comparison of untreated PC. The contact angle of untreated PC decreased from $82.31^{\circ}$ to the lowest value of $9.17^{\circ}$ after oxygen plasma treatment. The increase of RF delivered power had an effect on the rapid reduction of contact angle, but gas flow rates did not effect to reduce contact angles so much.

• Applied Chemistry for Engineering
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• v.34 no.5
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• pp.534-540
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• 2023

The high-rate performance is limited by several factors, such as polarization generation, low electrical conductivity, low surface energy, and low electrolyte permeability of CF_X, which is widely used as a cathode active material in the lithium primary battery. Therefore, in this study, we aimed to improve the battery performance by using carbon fluoride modified by surface treatment using oxygen plasma as a cathode for lithium primary batteries. Through XPS and XRD analysis, changes in the surface chemical characteristics and crystal structure of CF_X modified by oxygen plasma treatment were analyzed, and accordingly, the electrochemical characteristics of lithium-ion primary batteries were analyzed and discussed. As a result, the highest number of semi-ionic C-F bonds were formed under the oxygen plasma treatment condition (7.5 minutes) with the lowest fluorine to carbon (F/C) ratio. In addition, the primary cell prepared under this condition using carbon fluoride as the active material of the cathode showed the highest 3 F/C(3 C rate-performance) rate-performance and maintained a relatively high capacity (550 mAh/g) even at high rates. In this study, it was possible to produce lithium primary batteries with high-rate performance by adjusting the fluorine contents of carbon fluoride and the type of carbon-fluorine bonding through oxygen plasma treatment.

• Journal of Adhesion and Interface
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• v.9 no.1
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• pp.9-15
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• 2008

EVA foam was treated by oxygen plasma under a various treatment time for surface modification. The effect of plasma treatment on surface properties of EVA foam was investigated in terms of FT-IR ATR, XPS, contact angle, and SEM analysis and the adhesion characteristic of the EVA foam was studied in peel strength. As a results, EVA foam treated by plasma led to an elimination of organic compound, an increase of oxygen content, and an increase of surface roughness, resulting in improving the adhesion properties of the EVA foam. As the plasma treatment time increased, the hydrophilicity and physical change of surface of the EVA foam were increased and showed maximum value at 180 s and 420 s, respectively. The maximum adhesion strength appeared at plasma treatment time of 420 s and therefore, in this study the physical change was thought to be a major factor for improving the adhesion of the EVA foam.

• Applied Chemistry for Engineering
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• v.25 no.4
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• pp.386-391
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• 2014

Atmospheric-pressure nonthermal corona discharge plasma was applied to the sterilization of biologically contaminated scoria powder. Escherichia coli (E. coli) culture solution was uniformly sprayed throughout the scoria powder for artificial inoculation, which was well mixed to ensure uniformity of the batch. The effect of the key parameters such as discharge power, treatment time, type of gas and electrode distance on the sterilization efficiency was examined and discussed. The experimental results revealed that the plasma treatment was very effective for the sterilization of scoria powder; 5-min treatment at 15 W could sterilize more than 99.9% of E. coli inoculated into the scoria powder. Increasing the discharge power, treatment time or applied voltage led to an improvement in the sterilization efficiency. The effect of type of gas on the sterilization efficiency was in order of oxygen, synthetic air (20% oxygen) and nitrogen from high to low. The inactivation of E. coli under the influence of corona discharge plasma can be explained by cell membrane erosion or etching resulting from UV and reactive oxidizing species (oxygen radical, OH radical, ozone, etc.), and the destruction of E. coli cell membrane by the physical action of numerous corona streamers.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.288-288
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• 2012

The oxidation characteristics of tungsten line pattern during the carbon-based mask layer removal process using oxygen plasmas and the reduction characteristics of the WOx layer formed on the tungsten line surface using hydrogen plasmas have been investigated for sub-50 nm patterning processes. The surface oxidation of tungsten line during the mask layer removal process could be minimized by using a low temperature ($300^{\circ}K$) plasma processing instead of a high temperature plasma processing for the removal of the carbon-based material. Using this technique, the thickness of WOx on the tungsten line could be decreased to 25% of WOx formed by the high temperature processing. The WOx layer could be also completely removed at the low temperature of $300^{\circ}K$ using a hydrogen plasma by supplying bias power to the tungsten substrate to provide an activation energy for the reduction. When this oxidation and reduction technique was applied to actual 40 nm-CD device processing, the complete removal of WOx formed on the sidewall of tungsten line could be observed.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.78-78
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• 2013

Recently, many platinoid metals like platinum and ruthenium have been used as an electrode of microelectronic devices because of their low resistivity and high work-function. However the material cost of Ru is very expensive and it usually takes long initial nucleation time on SiO2 during chemical deposition. Therefore many researchers have focused on how to enhance the initial growth rate on SiO2 surface. There are two methods to deposit Ru film with atomic layer deposition (ALD); the one is thermal ALD using dilute oxygen gas as a reactant, and the other is plasma enhanced ALD (PEALD) using NH3 plasma as a reactant. Generally, the film roughness of Ru film deposited by PEALD is smoother than that deposited by thermal ALD. However, the plasma is not favorable in the application of high aspect ratio structure. In this study, we used a bis(ethylcyclopentadienyl)ruthenium [Ru(EtCp)2] as a metal organic precursor for both thermal and plasma enhanced ALDs. In order to reduce initial nucleation time, we use several methods such as Ar plasma pre-treatment for PEALD and usage of sacrificial RuO2 under layer for thermal ALD. In case of PEALD, some of surface hydroxyls were removed from SiO2 substrate during the Ar plasma treatment. And relatively high surface nitrogen concentration after first NH3 plasma exposure step in ALD process was observed with in-situ Auger electron spectroscopy (AES). This means that surface amine filled the hydroxyl removed sites by the NH3 plasma. Surface amine played a role as a reduction site but not a nucleation site. Therefore, the precursor reduction was enhanced but the adhesion property was degraded. In case of thermal ALD, a Ru film was deposited from Ru precursors on the surface of RuO2 and the RuO2 film was reduced from RuO2/SiO2 interface to Ru during the deposition. The reduction process was controlled by oxygen partial pressure in ambient. Under high oxygen partial pressure, RuO2 was deposited on RuO2/SiO2, and under medium oxygen partial pressure, RuO2 was partially reduced and oxygen concentration in RuO2 film was decreased. Under low oxygen partial pressure, finally RuO2 was disappeared and about 3% of oxygen was remained. Usually rough surface was observed with longer initial nucleation time. However, the Ru deposited with reduction of RuO2 exhibits smooth surface and was deposited quickly because the sacrificial RuO2 has no initial nucleation time on SiO2 and played a role as a buffer layer between Ru and SiO2.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.04a
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• pp.67-68
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• 2008

A simple bi-layer structure of organic light emitting diode (OLED) was used to study the characteristics of anode preparation. Indium tin oxide (ITO) anode surface treatment of OLEDs was performed to get the optimum condition for the ITO anode. The ITO surface was treated by $O_2$ or $O_2$ / Ar mixed gas plasma with different processing time. The electrical characteristics of OLED were improved by plasma treatment. The operating voltage of OLED with $O_2$ or $O_2$/Ar mixed gas plasma treated anodes decreases from 8.2 to 3.4 V and 3.2V, respectively. The $O_2$ /Ar mixed gas plasma treatment results in better electrical property.

• Journal of the Korean institute of surface engineering
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• v.51 no.2
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• pp.133-137
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• 2018

Plasma devices such as jets, pencils, and torches have been developed as new tools that help penetration of target agents and applied to plasma medicine. However, these devices cannot be used in a large area. Therefore, we introduced a flexible plasma device, which can be treated of large area and designed as bendable plasma. In additional, in vitro model based on agarose gel was prepared that can be show effectiveness in the depth of penetration. Plasma treatment conditions such as power, time and distance can be optimized on the agarose gel wound model. The chemical structure of changed polysaccharides was predicted due to reactive excited atoms and molecules, UV photons, charged particles and reactive oxygen and nitrogen species (RONS).