• Fashion & Textile Research Journal
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• v.16 no.3
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• pp.456-461
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• 2014

The objective of this study is to give PP(polypropylene) fabric a good affinity for water. Oxygen plasma was treated to PP fabrics in a commercial glow discharge reactor with different RF power, discharge pressure, and reaction time. The PP fiber surfaces were characterized by the measurement of contact angle and ESCA. A JEOL scanning electron microscope was used to observe the surface morphology of fibers. The spontaneous water uptake amount of PP fabrics was determined by the demand wettability test. To determine the effect of aging on the surface properties of $O_2$ plasma treated PP, all the above measurements of the samples were carried out after 1, 7, 30, 60, and 150 days. The results are as follows. The PP fiber surfaces treated by $O_2$ plasma treatment have a chemical composition that consisted of various oxygen containing polar groups. Consequently, the contact angles of the treated PP fibers decreased, which improved the water uptake rate of PP fabrics. Surface roughness of the treated PP affected the fabric wettabiity as well. Wettability of the treated PP decreased and leveled off with aging. The $O_2$ plasma treatment is a simple and effective method to increase the water uptake rate of PP fabrics.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.251.1-251.1
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• 2013

Combination of oxidative vacuum annealing and oxygen plasma treatment can serve as a simple and efficient method of line-width modification of imprinted nanopatterns. Since the vacuum annealing and oxygen plasma could lead mass loss of polymeric materials, either one of the process can yield a narrowed patterns. However, the vacuum annealing process usually demands quite high temperatures (${\geq}300^{\circ}C$) and extended annealing time to get appreciable line-width reduction. Although the plasma treatment may be considered as an effective low temperature rapid process for the line-width reduction, it is also suffering for the lowered controllability on application to very fine patterns. We have found that the vacuum annealing temperature can be lowered by introducing the oxygen in the vacuum process and that the combination of oxygen plasma treatment with the vacuum annealing could yield the best result in the line-with reduction of the imprinted polymeric nanopatterns. Well-defined line width reduction by more than 50% was successfully demonstrated at relatively low temperatures. Furthermore, it was verified that this process was applicable to the nanopatterns of different shapes and materials.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.485-487
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• 2008

By the oxygen plasma exposure to the organic light-emitting diodes, the turn-on voltage decreased from 10.5 to 7 V and luminance increased from 470 to $852\;cd/m^2$. Synchrotron radiation photoelectron spectroscopy results showed that during oxygen plasma exposure, oxygen ions were diffused into organic layer and induced p-type doping effect.

• Journal of Magnetics
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• v.5 no.3
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• pp.99-101
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• 2000

Oxygen-plasma effects of single crystal and thin film samples of $La_{0.7}Ca_{0.3}MnO_{3-\delta}$ have been studied. Our resistivity measurements indicate that oxygen plasma treatment gives rise to oxygen diffusion into bulk regions, which results in a decrease of $Mn^{3+}$ concentration in oxygen nonstoichiometric $La_{0.7}Ca_{0.3}MnO_{3-\delta}$ and in the activation energies of Holstein's small polarons in the paramagnetic region.

• Proceedings of the Korean Magnestics Society Conference
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• 2000.09a
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• pp.268-272
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• 2000

Oxygen-plasma effects of single crystal and thin film samples of L $a_{0.7}$C $a_{0.3}$Mn $O_{3-}$$\delta$/ have been studied. Our resistivity measurements indicate that oxygen plasma treatment gives rise to oxygen diffusion into bulk regions, which results in a decrease of M $n^{3+}$ concentration in oxygen nonstoichiometric L $a_{0.7}$C $a_{0.3}$Mn $O_{3-}$$\delta$/ and in the activation energies of Holstein's small polarons in the paramagnetic region.n.egion.n.n.

• Applied Chemistry for Engineering
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• v.21 no.1
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• pp.98-103
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• 2010

The effect of plasma treatment on surface characteristics of polycarbonate (PC) films was investigated using low pressure plasma and atmospheric pressure plasma with oxygen and argon. Untreated PC has a contact angle of $82.31^{\circ}$ with de-ionized water which reduced to $9.17^{\circ}$ as the lowest value after being treated with a low pressure plasma treatment with oxygen. Increase of delivered powers such as RF and AC with a high frequency and gas flow rates was not effective to reduce contact angles dramatically but gave the trend of reducing gradually. The surface of PC treated with plasma shows a low contact angle but the contact angle increases rapidly according to the exposure time in air ambient. Oxygen plasma was more effective to generate the polar functional group regardless of the type of plasma. Conclusively, a low plasma treatment with oxygen is more recommendable when the hydrophilic surface of PC is required.

• Journal of Conservation Science
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• v.30 no.3
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• pp.299-306
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• 2014

The possibility of a low-temperature argon plasma treatment as a mean of restoration technology for contaminated invaluable archive materials and artefacts, and evidencing documents was investigated along with an oxygen plasma treatment for comparison. For this purpose, the degree of color changes, ${\Delta}E^*ab$, and surface morphological changes due to plasma treatments as an evaluation of removal performance of artificial contaminants such as brilliant green dye and carbon deposit on cellulose acetate and plain paper as matrices, respectively, were measured and analyzed using a spectrophotometer and a field emission scanning electron microscope. Compared to the argon plasma treatment with sputtering characteristic, that of the oxygen plasma with characteristic of an oxidation reaction has shown superior results in removing the contaminants; the oxygen plasma has proven to damage the matrices significantly due to its oxidative characteristic, and post-plasma reactions has anticipated to be also detrimental to the surfaces, whereas, the problems caused by the counterpart has resulted in being negligible and rather has thought to be an appropriate mean for delicate restoration and/or removal operations of contaminants.

• Transactions on Electrical and Electronic Materials
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• v.2 no.4
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• pp.7-10
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• 2001

A new possibility of our atmospheric cold plasma torch has been examined on the surface treatment of an air-exposed vulcanized rubber compound. The plasma treatment effect was evaluated by the bondability with another rubber compound using a polyurethane adhesive. The adhesion property was improved by the treatment with plasma containing oxygen radicals. The oxygen radical generation from the plasma was verified and its efficiency was found to be dependent on the cathode material.

• Proceedings of the Korean Powder Metallurgy Institute Conference
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• 2006.09a
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• pp.514-515
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• 2006

In this study, multi-ply SiC fiber reinforced Ti-6Al-4V composites have been manufactured by plasma spraying and subsequent vacuum hot pressing. Two different sizes of Ti-6Al-4V feedstock powders were used for plasma spraying to form matrix. A considerable amount of oxygen was incorporated into as-sprayed Ti matrix during plasma spraying, and consequently caused matrix embrittlement. The use of coarse-sized feedstock powder reduced oxygen contamination, but tended to increase fiber spacing irregularity and fiber strength degradation. Longitudinal tensile strength and ductility of the composites were mainly affected by the matrix oxygen content.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.288-288
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• 2012

The oxidation characteristics of tungsten line pattern during the carbon-based mask layer removal process using oxygen plasmas and the reduction characteristics of the WOx layer formed on the tungsten line surface using hydrogen plasmas have been investigated for sub-50 nm patterning processes. The surface oxidation of tungsten line during the mask layer removal process could be minimized by using a low temperature ($300^{\circ}K$) plasma processing instead of a high temperature plasma processing for the removal of the carbon-based material. Using this technique, the thickness of WOx on the tungsten line could be decreased to 25% of WOx formed by the high temperature processing. The WOx layer could be also completely removed at the low temperature of $300^{\circ}K$ using a hydrogen plasma by supplying bias power to the tungsten substrate to provide an activation energy for the reduction. When this oxidation and reduction technique was applied to actual 40 nm-CD device processing, the complete removal of WOx formed on the sidewall of tungsten line could be observed.