• Title/Summary/Keyword: Oxygen desorption

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Current Variation in ZnO Thin-Film Transistor under Different Annealing Conditions (ZnO 박막트랜지스터의 어닐링 조건에 따른 전류 변화)

  • Yoo, Dukyean;Kim, Hyoungju;Kim, Junyeong;Jo, Jungyol
    • Journal of the Semiconductor & Display Technology
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    • v.13 no.1
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    • pp.63-66
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    • 2014
  • ZnO is a wide bandgap (3.3 eV) semiconductor with high mobility and good optical transparency. However, off-current characteristics of ZnO thin-film transistor (TFT) need improvements. In this work we studied the variation in ZnO TFT current under different annealing conditions. Annealing usually modifies gas adsorption at grain boundaries of ZnO. When oxygen is adsorbed, electron density decreases due to strong electronegativity of the oxygen, and TFT current decreases as a result. Our experiments showed that current increased after vacuum annealing and decreased after air annealing. We explain that the change of off-current is caused by the desorption and adsorption of oxygen at the grain boundaries.

Effect of Low Temperature Plasma and DCCA treatment on the Dyeing Properties of Wool Fabric (DCCA 처리와 저온플라즈마 처리가 양모직물의 염색성에 미치는 영향)

  • Jung, Young-Jin
    • Textile Coloration and Finishing
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    • v.20 no.4
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    • pp.53-59
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    • 2008
  • For the modification of wool surface, wool fabrics treated with oxygen low-temperature plasma(LTP) and dichloroisocyanuric acid(DCCA) were dyed with milling type acid dye. The difference of dyeing properties on modified and control wool fabric were investigated. DCCA treated wool showed that saturation dye uptake and dyeing desorption ratio were higher than LTP treated wool. Dyeing transition temperatures of DCCA and LTP treated wool fabrics were 20$^{\circ}C$ degree lower than control wool fabric. In light color fastness test, DCCA treated wool fabric was 1 grade lower than LTP or control wool fabric.

Evaluation of Anticorrosive Performance of Organic Coatings Subjected to Cyclic Wet-dry Exposure (흡 .탈수 반복 환경하에서의 유기도막의 방식성 평가)

  • 박진환;이근대;전호환
    • Journal of Ocean Engineering and Technology
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    • v.18 no.1
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    • pp.75-79
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    • 2004
  • Organic coatings are widely used to control of the corrosion of a steel structure. The water in coatings may cause the coatings to swell, leading to the degradation of the coatings. In addition, water affects the permeation of oxygen and other corrosive agents, and consequently, the presence of such substances at coating-metal interface promotes corrosion of the metal substrate. In this study, the anticorrosive properties of 4 types of coating, such as epoxy-epoxy, epoxy-urethane, urethane-epoxy, urethane-urethane, were evaluated. The evaluation tests were conducted under cyclic water-absorption/desorption conditions, consisting of alternative exposure to diluted 0.001M-LiCl(a$H_2O$≒1) and concentrated 10M-LiCl(a$H_2O$≒0.15). The anticorrosive performance of coatings was found to decrease in the order of urethane-urethane > urethane-epoxy > epoxy-epoxy coating.

흡.탈수 반복 환경에 있어서 유기도막의 방식성 평가

  • Park, Jin-Hwan;Lee, Geun-Dae;Jeon, Ho-Hwan
    • Proceedings of the Korea Committee for Ocean Resources and Engineering Conference
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    • 2003.05a
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    • pp.262-268
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    • 2003
  • Organic coatings are widely used to control the corrosion of steel structure. The water in coatings may cause swelling or solvation of coatings, leading to the degradation of coatings. In addition, water affects the permeation of oxygen and other corrosive agents, and consequently the presence of such substances at coating-metal interface promotes corrosion of metal substrate. In this study, the anticorrosive properties of 4 types of coating, such as epoxy-epoxy, epoxy-urethane, urethane-epoxy, urethane-urethane, were evaluated. The evaluation tests were carried out under cyclic water-absorption/desorption conditions, consisting of alternative exposure to diluted 0.001M-LiCl($a_{1120}{\fallingdotseq}1$) and concentrated l0M-LiCl($a_{1120}{\fallingdotseq}0.05$). The anticorrosive performances of coatings were found to decrease in the order of urethane-urethane> urethane-epoxy> epoxy-epoxy coating.

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Growth of ${\gamma}$-Al2O3 (111) on an ultra-thin interfacial Al2O3 layer/NiAl(110)

  • Lee, M.B.;Frederick, B.G;Richardson, N.V.
    • Journal of Korean Vacuum Science & Technology
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    • v.2 no.2
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    • pp.63-77
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    • 1998
  • The oxidation of NiAl(110) was investigated in the temperature regime between 300K and 1300 K using LEED (low energy electron diffraction), TPD (temperature programmed desorption) and HREELS (high resolution electron energy loss spectroscopy). The adsorption of N2O and O2 up to reconstructions. Stepwise annealing of the oxygen-saturated sample from 600 K to 1300K in UHV (ultra-high vacuum,) results in firstly the onset of randomly oriented then finally fairly well-ordered. 5 ${\AA}$ Al2O3 film with quasi-hexagonal periodicity. Ordered thicker oxide films of 18-30 ${\AA}$ seem to be grown on this interfacial oxide layer by direct oxidation of sample at elevated temperature between 1150 and 1300 K because of the LEED pattern consisting of new broad hexagonal spots and the previous 5 ${\AA}$ spots. Although the periodicity of surface oxygen arrays shows no significant change from an hexagonal close-packing, the O-O distance changes from ∼3.0 ${\AA}$ film to ∼2.9 ${\AA}$ for thicker oxides. with the appearance of Auger parameter, for the 5${\AA}$ film can be described better as an interfacial oxide layer. The observation of three symmetric phonon peaks can be also a supporting evidence for this phase assignment since thicker oxide films on the Same Ni2Al3(110) show somewhat different phonon structure much closer to that of the ${\gamma}$-Al2O3. The adsorption/desorption of methanol further proves the preparation of less-defective and/or oxygen-terminated Al2O3 films showing ordered phase transitions with the change of oxide thickness between 5 ${\AA}$ to 30 ${\AA}$.

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MicrostructuraL Characteristics During Hydrogen Desorption of Mechanical Milled TiH2 (기계적 합금화된 TiH2의 수소방출에 따른 미세조직 특성)

  • Jung S.;Jung Hyun-Sung;Ahn Jae-Pyoung;Park Jong-Ku
    • Journal of Powder Materials
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    • v.13 no.3 s.56
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    • pp.199-204
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    • 2006
  • We manufactured the metal hydrides of $(Ti_{0.88}Mg_{0.12})H_2$ using a very easy and cheap way that Ti-12%Mg blending powder was mechanically milled with liquid milling media such as isopropyl alcohol ($C_3H_8O$, containing oxygen) and hexane ($C_6H_{14}$, no oxygen) as hydrogen source. The $(Ti_{0.88}Mg_{0.12})H_2$ synthesized in isopropyl alcohol contained the high oxygen of 11.2%, while one in hexane had the low oxygen content of 0.7%. Such a difference of oxygen content affected the dehydriding behavior, phase transformation, and microstructural evolution at high temperature, which was investigated through X-ray diffraction and DSC measurements, and electron microscope observations.

Effects of Sputtering Power and Oxygen Flow Rate on the Electrical Properties of ATO Thin Films Made by DC Magnetron Sputtering (DC Magnetron Sputtering 법에 의해 ATO 박막 제조시 스퍼터전력 및 산소유량이 전기적 성질에 미치는 영향)

  • Lee, Hwan-Soo;Lee, Hae-Yong;Yoon, Cheon
    • Korean Journal of Materials Research
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    • v.9 no.5
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    • pp.533-537
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    • 1999
  • ATO(Sb doped $SnO_2$) thin films whose thicknesses were 600, 1100 and $2100\AA$ were prepared by DC magnetron sputtering method. They showed the lowest resistivity at DC sputtering power 0.24kW and had lower resistivity with increasing thickness. The power dependence of resistivity among ATO thin films was also different with thickness. The increase of carrier concentration in ATO thin films was responsible for the decrease of resistivity with thickness increase. ATO thin films which were prepared at 30sccm oxygen flow rate showed a great change of sheet resistance under 1M HCl solution. The investigation of SAM(Scanning Auger Microprobe) revealed that oxygen atomic percentage on the surface of ATO thin films was changed. The decrease of sheet resistance also occurred when ATO thin films, prepared at 30sccm oxygen flow rate, were exposed to air for a long period of time. For this reason, it was considered that the desorption of oxygen on ATO surface was accelerated by HCl.

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Weathering of coal and kerogen : implications on the geochmical carbon and oxygen cycle and the environmental geochemical reactions (탄질 유기물과 케로젠의 풍화 : 탄소와 산소의 지화학적 순환 및 환경화학적 반응에 미치는 영향)

  • 장수범
    • Economic and Environmental Geology
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    • v.32 no.1
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    • pp.101-111
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    • 1999
  • Sedimentary organic matter, exposed to continental surficial environment, reacts with oxygen supplied from the atmosphee and forms carbon-containing oxidation products. Knowledge of the rate and mechanisms of sedimentary organic matter weathering is important because it is one of the major controls on atmospheric oxygen level through geologic time. Under the abiological conditions, the oxidation rate of coal organic matter by molecular oxygen is enhanced by the increase of oxygen concentration and temperature. At ambient temperature and pressure, aqueous coal oxidation results in the formation of dissolved $CO_2$ dissolved organic carbon and solid oxidation products which are all quantitatively significant reaction products. The effects of pH, ultraviolet light, and microbial activity on the weathering of sedimentary organic matter are poorly contrained. Based on the results of geochmical and environmental studies, it is believed that the photochemical reaction should play an important role in the decomposition and oxidation of sedimentary organic matter removed from the weathering profile. At higher pH conditions, the production rate of DOC can be accelerated due to base catalysis. These high molecular weight oranic matter can react with man-made pollutants such as heavy metal ions via adsorption/desorption or ion exchange reactions. The effect of microbial activity on the oxidative weathering of sedimentary organic matter is poorly understood and remains to be studied.

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The Adsorption and Desorption of $NH_3$ on Rutile $TiO_2(110)-1{\times}1$ Surfaces

  • Kim, Bo-Seong;Li, Zhenjun;Kay, Bruce D.;Dohnalek, Zdenek;Kim, Yu-Gwon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.265-265
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    • 2012
  • The adsorption of molecular $NH_3$ on rutile $TiO_2(110)-1{\times}1$ surfaces was investigated using a temperature-programmed desorption (TPD) technique combined with a molecular beam apparatus. A quantitative investigation into the TPD spectra of $NH_3$ was made for $NH_3$ adsorbed on two kinds of rutile $TiO_2(110)-1{\times}1$ surfaces with the oxygen vacancy ($V_O$) concentration of ~0% (p-$TiO_2(110)$) and ~5% (r-$TiO_2(110)$), respectively. On both surfaces, non-dissociative adsorption of $NH_3$ was inferred from a quantitative analysis on the amount of adsorbed $NH_3$ and those desorbed. With increasing coverage, the monolayer desorption feature shifted from 400 K toward lower temperatures until it saturates at 160 K, suggesting a repulsive nature in the interaction between $NH_3$ molecules. At the very low coverage regime, the desorption features were found to extend up to 430 K and 400 K on p-$TiO_2(110)$ and p-TiO(110), respectively. As a result, the saturation coverage of monolayer of $NH_3$ was higher on the p-$TiO_2(110)$ surface than on the p-TiO(110) by about 10%. The desorption energy ($E_d$) of $NH_3$ obtained by inversion of the Polanyi-Wigner equation indicated that the difference between the $E_d$'s of $NH_3$ (that is, $E_d(on\;p-TiO_2(110)$) - $E_d$(on p-TiO(110)) was 14 kJ/mol at ${\theta}(NH_3)=0$ and decreased to 0 as the coverage approached to a monolayer. The observed adsorption behavior of $NH_3$ was interpreted using an interaction model between $NH_3$ and surface defects on $TiO_2$ such as VO's and $Ti^{3+}$ interstitials.

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Electronic Structure of the SrTiO3(001) Surfaces: Effects of the Oxygen Vacancy and Hydrogen Adsorption

  • Takeyasua, K.;Fukadaa, K.;Oguraa, S.;Matsumotob, M.;Fukutania, K.
    • Applied Science and Convergence Technology
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    • v.23 no.5
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    • pp.201-210
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    • 2014
  • The influence of electron irradiation and hydrogen adsorption on the electronic structure of the $SrTiO_3$ (001) surface was investigated by ultraviolet photoemission spectroscopy (UPS). Upon electron irradiation of the surface, UPS revealed an electronic state within the band gap (in-gap state: IGS) with the surface kept at $1{\times}1$. This is considered to originate from oxygen vacancies at the topmost surface formed by electron-stimulated desorption of oxygen. Electron irradiation also caused a downward shift of the valence band maximum indicating downward band-bending and formation of a conductive layer on the surface. With oxygen dosage on the electron-irradiated surface, on the other hand, the IGS intensity was decreased along with upward band-bending, which points to disappearance of the conductive layer. The results indicate that electron irradiation and oxygen dosage allow us to control the surface electronic structure between semiconducting (nearly-vacancy free: NVF) and metallic (oxygen de cient: OD) regimes by changing the density of the oxygen vacancy. When the NVF surface was exposed to atomic hydrogen, in-gap states were induced along with downward band bending. The hydrogen saturation coverage was evaluated to be $3.1{\pm}0.8{\times}10^{14}cm^{-2}$ with nuclear reaction analysis. From the IGS intensity and H coverage, we argue that H is positively charged as $H^{{\sim}0:3+}$ on the NVF surface. On the OD surface, on the other hand, the IGS intensity due to oxygen vacancies was found to decrease to half the initial value with molecular hydrogen dosage. H is expected to be negatively charged as $H^-$ on the OD surface by occupying the oxygen vacancy site.