• 제목/요약/키워드: Oxygen Generator

검색결과 138건 처리시간 0.032초

중공사막에서의 물질전달 특성에 관한 연구 (A Study on the Characteristics of Mass Transfer in Hollow Fiber Membranes)

  • 김기범;김종석;김종수;유일수;이왕로;김성종
    • 멤브레인
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    • 제14권2호
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    • pp.142-148
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    • 2004
  • 본 연구는 호흡부전환자를 위한 진동형 혈관 내 폐 보조장치를 사용하여 산소전달효율을 향상시키기 위한 연구이다. 유량은 점프와 유량을 사용하여 조정하였다. 가진 장치는 압전 진동자, 함수 발생기와 전력 증폭기로 구성하였다. 기체의 유량은 120 cm 길이의 중공사를 통하여 6 L/min까지 하였으며 압전 진동자로 가진 하였다. PVDF 센서와 FRF를 사용하여 VIVLAD에서 발생하는 주파수를 검출하였다. 실험결과, 최대 진폭이 발생하고 중공사들에 진동이 전달되어 최대 산소전달속도가 발생함을 확인할 수 있었다. 이 최대 진폭은 다양한 유속과 각각의 모듈에서 35 Hz 영역에서 발생함을 확인할 수 있었다.

극저온 헬륨가스 가열장치 개발 (Heating Apparatus Development for Cryogenic Gaseous Helium)

  • 정용갑;권오성;조남경;조인현
    • 한국추진공학회:학술대회논문집
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    • 한국추진공학회 2009년도 제33회 추계학술대회논문집
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    • pp.363-367
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    • 2009
  • 산화제로 액체산소를 사용하고 산화제 탱크 내부에 가압제 용기가 설치된 액체추진기관의 가압시스템에서는 가압제 용기에서 극저온으로 토출되는 가압제가 가스발생기 후단의 열교환기를 통과하여 극저온에서 고온으로 온도가 상승되어 추진제 탱크의 얼리지로 공급된다. 이러한 가압시스템을 개발하기 위해서는 열교환기를 모사할 수 있는 가열장치를 적용하여 인증시험을 수행하여야 한다. 본 연구에서는 가압시스템 개발시험에 적용할 수 있는 극저온 헬륨가스 가열장치를 개발하였고 이에 대한 가열시험을 수행하였다.

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극저온 헬륨가스 가열장치 개발 및 시험 (Heating Apparatus Development and Tests for Cryogenic Gaseous Helium)

  • 정용갑;조남경
    • 한국추진공학회지
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    • 제15권1호
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    • pp.63-68
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    • 2011
  • 산화제로 액체산소를 사용하고 산화제 탱크 내부에 가압제 용기가 설치된 액체추진기관의 가압시스템에서는 가압제 용기에서 극저온으로 토출되는 가압제가 가스발생기 후단의 열교환기를 통과하여 극저온에서 고온으로 온도가 상승되어 추진제 탱크의 얼리지로 공급된다. 이러한 가압시스템을 개발하기 위해서는 열교환기를 모사할 수 있는 가열장치를 적용하여 인증시험을 수행하여야 한다. 본 연구에서는 가압시스템 개발시험에 적용할 수 있는 극저온 헬륨가스 가열장치를 개발하였고 이에 대한 가열시험을 수행하였다.

산화제 과잉 예연소기 냉각 성능 수치 해석 (Numerical Analysis on Cooling Characteristics of Oxidizer-Rich Preburner)

  • 이선미;하성업;이수용
    • 한국추진공학회지
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    • 제17권3호
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    • pp.67-75
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    • 2013
  • 케로신-액체산소 로켓 엔진에 적용되는 산화제 과잉 예연소기의 냉각 성능 확인을 위한 수치 해석을 수행하였다. 예연소기 1차 연소구역을 상사하기 위하여 분사기 배열에 따른 혼합비를 바탕으로 연소가스 물성치를 계산하였고, 냉각제로서 채널을 흐르는 산소의 물성치는 실제기체 조건에 대하여 적용하였으며, 1차 연소구역과 냉각제로 쓰인 액체산소의 혼합과정은 다상혼합모델을 적용하였다. 수치 해석으로 계산된 결과를 연소시험과 비교하였으며, 이를 통하여 재생냉각 채널과 연소실에서의 물성 등을 정량적으로 파악할 수 있었다.

Al2O3 유전체를 이용한 산소/공기 원료에 따른 오존발생기의 특성 (A Characteristic Analysis of Ozone Generator Using the Al2O3 Ceramic Dielectric According to Gas Type(O2/Air))

  • 박현미;송현직;박원주;이광식
    • 조명전기설비학회논문지
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    • 제28권5호
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    • pp.76-81
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    • 2014
  • The ozone generation is commonly made with silent discharge method using quartz glass dielectric. In this paper, using $Al_2O_3$ dielectric to instead of the traditional quartz glass dielectric to improve the system efficiency is presented. The dielectric was manufactured as tube shape (Internal diameter${\times}$ Outside diameter: $11{\times}15mm$) using 99% $Al_2O_3$ ceramic. The characteristics of dielectric discharge and ozone generation were studied of experiments with variation of discharge power, discharge electrode space and rate of flow for supplied gas ($O_2$/Air). As the experimental results, in the same discharge space, the ozone concentration continuously increased with input power increasing, and ozone yield increased until saturation happened. Also, the expended power increased with discharge space extended due to discharge power increased. In additional, the ozone concentration of oxygen ozone was higher than air that was observed when using oxygen ozone in proposed experiments.

HIPIMS Arc-Free Reactive Deposition of Non-conductive Films Using the Applied Material ENDURA 200 mm Cluster Tool

  • Chistyakov, Roman
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.96-97
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    • 2012
  • In nitride and oxide film deposition, sputtered metals react with nitrogen or oxygen gas in a vacuum chamber to form metal nitride or oxide films on a substrate. The physical properties of sputtered films (metals, oxides, and nitrides) are strongly influenced by magnetron plasma density during the deposition process. Typical target power densities on the magnetron during the deposition process are ~ (5-30) W/cm2, which gives a relatively low plasma density. The main challenge in reactive sputtering is the ability to generate a stable, arc free discharge at high plasma densities. Arcs occur due to formation of an insulating layer on the target surface caused by the re-deposition effect. One current method of generating an arc free discharge is to use the commercially available Pinnacle Plus+ Pulsed DC plasma generator manufactured by Advanced Energy Inc. This plasma generator uses a positive voltage pulse between negative pulses to attract electrons and discharge the target surface, thus preventing arc formation. However, this method can only generate low density plasma and therefore cannot allow full control of film properties. Also, after long runs ~ (1-3) hours, depends on duty cycle the stability of the reactive process is reduced due to increased probability of arc formation. Between 1995 and 1999, a new way of magnetron sputtering called HIPIMS (highly ionized pulse impulse magnetron sputtering) was developed. The main idea of this approach is to apply short ${\sim}(50-100){\mu}s$ high power pulses with a target power densities during the pulse between ~ (1-3) kW/cm2. These high power pulses generate high-density magnetron plasma that can significantly improve and control film properties. From the beginning, HIPIMS method has been applied to reactive sputtering processes for deposition of conductive and nonconductive films. However, commercially available HIPIMS plasma generators have not been able to create a stable, arc-free discharge in most reactive magnetron sputtering processes. HIPIMS plasma generators have been successfully used in reactive sputtering of nitrides for hard coating applications and for Al2O3 films. But until now there has been no HIPIMS data presented on reactive sputtering in cluster tools for semiconductors and MEMs applications. In this presentation, a new method of generating an arc free discharge for reactive HIPIMS using the new Cyprium plasma generator from Zpulser LLC will be introduced. Data (or evidence) will be presented showing that arc formation in reactive HIPIMS can be controlled without applying a positive voltage pulse between high power pulses. Arc-free reactive HIPIMS processes for sputtering AlN, TiO2, TiN and Si3N4 on the Applied Materials ENDURA 200 mm cluster tool will be presented. A direct comparison of the properties of films sputtered with the Advanced Energy Pinnacle Plus + plasma generator and the Zpulser Cyprium plasma generator will be presented.

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입력가스의 유량변화와 첨가가스에 따른 고농도 오존발생특성 (High Concentration Ozone Generation Characteristics by Variation of Additional Gases and Flow Rates of Inlet Gas)

  • 박승록;이대희
    • 조명전기설비학회논문지
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    • 제16권6호
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    • pp.95-101
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    • 2002
  • 고농도의 오존발생에 영향을 주는 많은 변수들이 존재한다. 이러한 변수들은 오존발생장치 설계시 매우 중요한 요소가 되고 설계전에 반드시 고려되어야 할 것들이다. 오존발생장치 설계 후에도 고농도 오존발생에 크게 영향을 주는 주변변수들이 있다. 본 연구에서는 오존발생에 영향을 주는 많은 주변변수들중에서 입력산소가스의 유량과 여기에 첨가되는 첨가가스가 고농도의 오존발생에 미치는 영향을 조사하였다. 결과적으로, 입력산소가스의 유량을0.75[LPM]~2.00[LPM]으로 변화시키면서 오존농도를 측정한 결과 1.25[LPM]에서 71145[ppm]의 최대오존발생량을 보여주었다. 입력산소가스에 첨가되는 질소가스의 유량을 0.0[vol%]~6.4[vol%]으로 변화시켜가면서 발생되는 오존농도를 측정한 결과 첨가되는 질소가스량이 0.8[vol%]인 경우 최대 73135[ppm]의 오존을 얻을 수 있었다. 이것은 순수산소만을 입력가스로 사용했을 때보다 최대오존발생량이 3[%]가량 증가한 결과이다. 입력산소가스에 첨가되는 아르곤가스의 유량을 0.0[vol%]~6.4[vol%]으로 변화시켜가면서 발생되는 오존농도를 측정한 결과 첨가되는 아르곤가스량이 0.8[vol%]인 경우 최대 67288[ppm]의 오존을 얻을 수 있었다.

Reactive oxygen species increase neuronal excitability via activation of nonspecific cation channel in rat medullary dorsal horn neurons

  • Lee, Hae In;Park, Byung Rim;Chun, Sang Woo
    • The Korean Journal of Physiology and Pharmacology
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    • 제21권4호
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    • pp.371-376
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    • 2017
  • The caudal subnucleus of the spinal trigeminal nucleus (medullary dorsal horn; MDH) receives direct inputs from small diameter primary afferent fibers that predominantly transmit nociceptive information in the orofacial region. Recent studies indicate that reactive oxygen species (ROS) is involved in persistent pain, primarily through spinal mechanisms. In this study, we aimed to investigate the role of xanthine/xanthine oxidase (X/XO) system, a known generator of superoxide anion ($O_2{^-}$), on membrane excitability in the rat MDH neurons. For this, we used patch clamp recording and confocal imaging. An application of X/XO ($300{\mu}M/30mU$) induced membrane depolarization and inward currents. When slices were pretreated with ROS scavengers, such as phenyl N-tert-butylnitrone (PBN), superoxide dismutase (SOD), and catalase, X/XO-induced responses decreased. Fluorescence intensity in the DCF-DA and DHE-loaded MDH cells increased on the application of X/XO. An anion channel blocker, 4,4-diisothiocyanatostilbene-2,2-disulfonic acid (DIDS), significantly decreased X/XO-induced depolarization. X/XO elicited an inward current associated with a linear current-voltage relationship that reversed near -40 mV. X/XO-induced depolarization reduced in the presence of $La^{3+}$, a nonselective cation channel (NSCC) blocker, and by lowering the external sodium concentration, indicating that membrane depolarization and inward current are induced by influx of $Na^+$ ions. In conclusion, X/XO-induced ROS modulate the membrane excitability of MDH neurons, which was related to the activation of NSCC.

Growth of ZnTe Thin Films by Oxygen-plasma Assisted Pulsed Laser Deposition

  • Pak, Sang-Woo;Suh, Joo-Young;Lee, Dong-Uk;Kim, Eun-Kyu
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.185-185
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    • 2011
  • ZnTe semiconductor is very attractive materials for optoelectronic devices in the visible green spectral region because of it has direct bandgap of 2.26 eV. The prototypes of ZnTe light emitting diodes (LEDs) have been reported [1], showing that their green emission peak closely matches the most sensitive region of the human eye. Another application to photovoltaics proved that ZnTe is useful for the production of high-efficiency multi-junction solar cells [2,3]. By using the pulse laser deposition system, ZnTe thin films were deposited on ZnO thin layer, which is grown on (0001) Al2O3substrates. To produce the plasma plume from an ablated ZnO and ZnTe target, a pulsed (10 Hz) YGA:Nd laser with energy density of 95 mJ/$cm^2$ and wavelength of 266 nm by a nonlinear fourth harmonic generator was used. The laser spot focused on the surface of the ZnO and ZnTe target by using an optical lens was approximately 1 mm2. The base pressure of the chamber was kept at a pressure around $10^{-6}$ Torr by using a turbo molecular pump. The oxygen gas flow was controlled around 3 sccm by using a mass flow controller system. During the ZnTe deposition, the substrate temperature was $400^{\circ}C$ and the ambient gas pressure was $10^{-2}$ Torr. The structural properties of the samples were analyzed by XRD measurement. The optical properties were investigated by using the photoluminescence spectra obtained with a 325 nm wavelength He-Cd laser. The film surface and carrier concentration were analyzed by an atomic force microscope and Hall measurement system.

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Bio Clean Room(BCR)의 멸균을 위한 산소 클러스터이온 발생 장치 개발에 관한 연구 (A Study on the Development of Oxygen Cluster Ion Generator for Sterilization of Bio Clean Room(BCR))

  • 박동일;정광섭;김영일;김성민
    • 설비공학논문집
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    • 제25권1호
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    • pp.7-13
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    • 2013
  • Bio Clean Room(BCR) and pharmaceutical product manufacturing facilities require careful assessment of many factors, including HVAC, controls, room finishes, process equipment, room operations, and utilities. Flow of equipment, personnel, and product must also be considered along with system flexibility, redundancy, and maintenance shutdown strategies. It is important to involve designers, operators, commissioning staff, quality control, maintenance, constructors, validation personnel, and the production representative during the conceptual stage of design. Critical variables for room environment and types of controls vary greatly with the clean space's intended purpose. It is particularly important to determine critical parameters with quality assurance to set limits and safety factors for temperature, humidity, room pressure, and other control requirements. In this paper, oxygen cluster ion equipment was utilized in order to enhance the indoor air quality and to prevent the airborne infection of ward in hospital. Moreover, the performance test of the equipment was also performed in order to develop the optimal sterilization system of BCR using the equipment.