• Proceedings of the Korean Society of Precision Engineering Conference
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• 2006.05a
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• pp.153-154
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• 2006

Development of sorting machine for photo diode and its control system is addressed. The sorting machine for optical communication device requires high positional precision because the alignment is one of the most important point in the sorting process. This sorting method describes how to detect the target chip's angle and position from the wafer. The machine vision system is used for the feedback control. This sorting machine is implemented by motion controller, machine vision and various solenoid valve and is interfaced with RS-232c, GPIB and PCI communication. This system gets the position accuracy within $1{\mu}m$ with our experiments.

• Korean Journal of Optics and Photonics
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• v.13 no.5
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• pp.384-389
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• 2002

A new idea of the wavelength locking module for DWDM application was investigated in the present research. Only one etalon photo-diode is generally used in the internal/external wavelength locking system. For the internal wavelength locking module with 50 GHz applications, an algle tuning method of the etalon commonly applied. However, the alignment process of the etalon with the angle tuning method is limited because the lock performance is extremely sensitive accoriding to the change of the tilting angle. In an optical viewpoint, the alignment tolerance of the locker module with the etalon PD array block was good, and the precise tuning of the wavelength was possible. The characteristics of free spectral range (FSR) and peak shift of wavelength according to the tilting angle with the locker module was investigated. For the present module, the optimized initial tilting angle was experimentally obtained.

• Transactions of the Korean Society of Mechanical Engineers
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• v.12 no.3
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• pp.440-449
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• 1988

Small vibration displacements may be measured by optical interferometers, based on the Michelson method. The standard Michelson interferometer works well when the mirror displacements are relatively large compared to the optical wavelength. But it does not work for displacements less than approximately a quater of optical wavelength. Several multiple reflection laser interferometers, simply modified standard Michelson interferometer, have been developed to decrease the minimum detectable limits. Among these a relatively simple and easy multiple reflection system is used to measure the small vibration displacements. This multiple reflection system is constructed with a right angle prism and a convex lens. Therefore this system makes it possible to measure a vibration displacement of the small area on the vibrating structure. The fringe interpolation method and curve fitting method are used to determine accurately the small vibration displacements from the measured interference fringe patterns. Also computer simulation technique is used to check the accuracies of these method. According to the results of the computer simulation technique, the curve fitting method is more accurate than the fringe interpolation method. The optically measured results are in good agreement with those of the standard accelerometer with high accuracy and it is possible to measure the peak vibration displacement as small as 9.01nm using multiple reflection system and curve fitting method.

• The Bulletin of The Korean Astronomical Society
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• v.35 no.1
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• pp.36.2-36.2
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• 2010

The CQUEAN (Camera for QUasars in EArly uNiverse) is an optical CCD camera optimized for observation of high redshift objects. It is going to be attached to the cassegrain focus of 2.1m telescope at McDonald Observatory, USA. We are making a focal reducer for CQUEAN to secure a larger field of view. The focal reducer is composed of four spherical lens, and it reduces the focal length of telescope by one third. We designed the lens configuration, performed tolerance analysis, and estimated the optical performance with ZEMAX. The differences in optical performace with/without filters were also investigated. The result from ZEMAX shows that the system has ample margin of errors for median seeing of 1.2" at McDonald observatory. Even with aberration and alignment tolerance, the performance is better than the original requirement. The lenses are now being made, and the lens barrel and an adapter for assembly of the Andor CCD camera and the filter wheel is now under designing process. We expect that the manufacturing of the focal reducer system as well as its optical test will be finished by April 2010.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.18 no.7
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• pp.56-62
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• 2019

The high-precision laser scriber carries out scribing alumina ceramic substrates for manufacturing ultra-small chip resistors. The ceramic substrates are loaded, aligned, scribed, transferred, and unloaded. The entire process is fully automated, thereby minimizing the scribing cycle time of the ceramic substrates and improving the throughput. The scriber consists of the laser optical system, pick-up module of ceramic substrates, pre-alignment module, TH axis drive work table, automation module for substrate loading / unloading, and high-speed scribing control S/W. The loader / unloader unit, which has the greatest influence on the scribing cycle time of the substrates, carries the substrates to the work table that carries out the cutting line work by driving the X and Y axes as well as by adsorbing the ceramic substrates. The loader / unloader unit consists of the magazine up / down part, X-axis drive part for conveying the substrates to the left and right direction, and the vision part for detecting the edge of the substrate for the primary pre-alignment of the substrates. In this paper, the laser scribing machining simulation is performed by applying the instrument mechanism of each component module. Through this study, the scribing machining process is first verified by analyzing the process operation and work area of each module in advance. In addition, the scribing machining process is optimized by comparing and analyzing the scribing cycle time of one ceramic substrate according to the alignment stage module speed.

• Bulletin of the Korean Chemical Society
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• v.30 no.4
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• pp.882-886
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• 2009

The electrode contact poling is one of the efficient tools to induce a stable polar order of nonlinear optical (NLO) chromophores in the solid film. Self-assembled NLO chromophores with high electro-optic (E-O) activities were utilized for quantitative determination of the chromophore order induced under contact poling by spectroscopic changes. We found that NLO chromophores rarely decompose under the high electric field during contact poling. The absorption spectra were de-convoluted into a sum of Gaussian components to separate energy transitions for a binary composite system which contains a secondary guest chromophore AJC146 in the self-assembled chromophore HDFD. Poling efficiency was significantly improved in the binary system compared to the individual components.

• Korean Journal of Optics and Photonics
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• v.16 no.5
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• pp.440-445
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• 2005

The limitation of measurement accuracy and reliability of autostigmatic null lens system are studied for the cases of using inter-distance of null lenses as the adjustment factor of alignment and fixing the distance by mounting. If we investigate the first case, the wavefront aberration of null lens system is compensated by the adjustment process even though the shape of aspherical surface is not properly fabricated. As the result, it brings about the problem of measurement reliability. However, for the fixing process by mounting null lenses, it doesn't cause the reliability problem because the wavefront aberration of null lens system is not compensated. Further, the fixing process shows nearly same result in measurement accuracy to the adjustment process, that is, $0.0316{\lambda}$ vs. $0.0326{\lambda}$. So, we can conclude the setup for autostigmatic null lens system must be constituted by means of the fixing process. Meanwhile, we introduce and define the alignment aperture on aspheircal mirror, which can be approximated as spherical zone for alignment of null lens system, and besides, we calculate the required fabrication accuracy of the zone for the necessary measurement accuracy.

• Korean Journal of Optics and Photonics
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• v.17 no.3
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• pp.248-255
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• 2006

Most optical security systems use a 4-f correlator, Mach-Zehnder interferometer, or a joint transform correlator(JTC). Of them, the JTC does not require an accurate optical alignment and has a good potential for real-time processing. In this paper, we propose an image encryption system using a position shift property of the JTC in the Fourier domain and a random phase image. Our encryption system uses two keys: one key is a random phase mask and the other key is a position shift factor. By using two keys, the proposed method can increase the security level of the encryption system. An encrypted image is produced by the Fourier transform for the multiplication image, which resulted from adding position shift functions to an original image, with a random phase mask. The random phase mask and position shift value are used as keys in decryption, simultaneously. For the decryption, both the encrypted image and the key image should be correctly located on the JTC. If the incorrect position shift value or the incorrect key image is used in decryption, the original information can not be obtained. To demonstrate the efficiency of the proposed system, computer simulation is performed. By analyzing the simulation results in the case of blocking of the encrypted image and affecting of the phase noise, we confirmed that the proposed method has a good tolerance to data loss. These results show that our system is very useful for the optical certification system.

• Journal of the Semiconductor & Display Technology
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• v.5 no.4 s.17
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• pp.11-15
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• 2006

Expose equipment system that is used for manufacturing process of Flat Panel Display, is most important equipment in whole process. Expose equipment that is for making pattern of mask on substrate, consists of optical part, stage part and transport part. The stage is an important part that aligns mask and substrate for delivering pattern of mask to substrate exactly. In this paper, control system of expose stage that is able to use mask and substrate of diverse size, with PC controller using GUI interface instead of PLC control system. The existing PLC control system does not have the suitable structure for using mask of diverse size. GUI interface integration control system is based on PC. So it has the advantage of convenient use and active operation. We embodied PLC control system in integration control system based on PC, and verified utility possibility through the standard test course.

• Journal of Astronomy and Space Sciences
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• v.24 no.1
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• pp.79-90
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• 2007

The AmonRa instrument, the primary payload of the international EARTHSHINE mission, is designed for measurement of deep space albedo from L1 halo orbit. We report the optical design, tolerance analysis and the optical performance of the breadborad AmonRa imaging channel instrument optimized for the mission science requirements. In particular, an advanced wavefront feedback process control technique was used for the instrumentation process including part fabrication, system alignment and integration. The measured performances for the complete breadboard system are the RMS 0.091 wave(test wavelength: 632.8 nm) in wavefront error, the ensquared energy of 61.7%($in\;14\;{\mu}m$) and the MTF of 35.3%(Nyquist frequency: $35.7\;mm^{-1}$) at the center field. These resulting optical system performances prove that the breadboard AmonRa instrument, as built, satisfies the science requirements of the EARTHSHINE mission.