• 제목/요약/키워드: Octadecyltrichlorosilane

검색결과 52건 처리시간 0.025초

자체조립 단일막으로 코팅된 실리콘 기판의 표면특성 (Surface Characteristics of Silicon Substrates Coated with Self-assembled Mono-layers)

  • 최성훈;강호종
    • 폴리머
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    • 제28권1호
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    • pp.3-9
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    • 2004
  • 미세전자-기계계 (MEMS)의 윤활 막으로 적용되는 자체조립 단일막 (SAMs) 형성을 위하여 실란 변성 퍼플루오로폴리에테르 (SPFPE)를 합성하고 이를 실리콘 표면에 코팅하여, 형성된 SAMs에 의한 표면 특성 변화를 기존의 퍼플루오로폴리에테르 (PFPE), 옥타데실트리클로로실란 (OTS), 그리고 퍼플루오로옥틸트리클로로실란 (FOTS) SAMs와 비교 검토하였다. SPFPE에 의해 형성된 SAMs는 실리콘 표면과의 느린 반응성에 의하여 OTS와 FOTS와 비교하여 상대적으로 낮은 소수성을 가지나 열처리에 의하여 이들과 비슷한 소수성을 보였다. SPFPE에 의하여 형성된 SAMs 표면은 OTS와 FOTS와 유사한 0.3 nm의 표면 거칠기를 가지나 상대적으로 유연한 PFPE 주사슬의 움직임으로 인하여 OTS에 비하여 50% 정도 마찰력이 줄어드는 우수한 마찰 특성을 보였다.

$DDPO_4$$ODPO_4$SAM 코팅의 나노 응착 및 마찰 특성 연구 (Nano Adhesion and Friction of $DDPO_4$ and $ODPO_4$ SAM Coatings)

  • 윤의성;양승호;공호성
    • Tribology and Lubricants
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    • 제18권4호
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    • pp.267-272
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    • 2002
  • Nano adhesion between SPM(scanning probe microscope) tips and DDPO$_4$(octadecylphosphoric acid ester.) and ODPO$_4$(octadecylphosphoric acid ester) SAM(self-assembled monolayer.) was experimentally studied. Tests were performed to measure the nano adhesion and friction in both AFM(atomic force microscope) and LFM(lateral force microscope) modes with the applied normal load. DDPO$_4$ and ODPO$_4$ SAM were formed on Ti and TiOx surfaces. Ti and TiOx were coated on the Si wafer by ion sputtering. Adhesion and friction of DDPO$_4$ and ODPO$_4$ SAM surfaces were compared with those of OTS(octadecyltrichlorosilane) SAM and DLC surfaces. DDPO$_4$ and ODPO$_4$ SAM converted the Ti and TiOx surfaces to be hydrophobic. When the surface was hydrophobic, the adhesion and friction forces were found lower than those of bare surfaces. Work of adhesion was also discussed to explain how the surface was converted into hydrophobic Results also showed that tribological characteristics of DDPO$_4$ and ODPO$_4$ SAM had good properties in the adhesion, friction, wetting angle and work of adhesion. DDPO$_4$ and ODPO$_4$ SAM could be one of the candidates for the bio-MEMS elements.

Leidenfrost Points Tuned via Surface Coating and Structures

  • Jeon, Deok-Jin;Lee, Jun-Young;Yeo, Jong-Souk
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.126.1-126.1
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    • 2015
  • A quantitative relationship between Leidenfrost point and surface characteristics such as surface material and roughness is investigated. Based on the relationship, we have fabricated the surfaces with their Leidenfrost points (LFP) tuned by controlling surface coating and structures. As discovered by Leidenfrost, liquids placed on a hot plate levitate on the gas phase-air gap formed by the vaporization of liquids. This phenomenon is called 'Leidenfrost effect'. A change of LFP has attracted many researchers for several years but the ability to tune LFP is still a remaining issue. Many of previous work has progressed for various conditions so the systematic approach and analysis are needed to clearly correlate the LFP and the surface conditions. In this report, we investigate a relation of surface energy and LFP using various coating materials such as Octadecyltrichlorosilane (OTS) and 1H, 1H, 2H, 2H-Perfluorooctyltrichlorosilane (FOTS). Also, we analyze how surface roughness affects LFP via surface micro structuring with ICP-RIE fabrication process. The improved understanding can have potential applications such as the control of liquid droplet behavior at elevated temperatures for efficient cooling system.

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Additive Fabrication of Patterned Multi-Layered Thin Films of Ta2O5 and CdS on ITO Using Microcontact Printing Technique

  • Lee, Jong-Hyeon;Woo, Soo-Yeun;Kwon, Young-Uk;Jung, Duk-Young
    • Bulletin of the Korean Chemical Society
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    • 제24권2호
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    • pp.183-188
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    • 2003
  • The micro-patterning of multi-layered thin films containing CdS and $Ta_2O_5$ layers on ITO substrate with various structures was successfully obtained by combining three different techniques: chemical solution depositions, sol-gel, and microcontact printing (μCP) methods using octadecyltrichlorosilane (OTS) as the organic thin layer template. $Ta_2O_5$ layer was prepared by sol-gel casting and CdS one obtained by chemical solution deposition, respectively. Parallel and cross patterns of multi-layers with $Ta_2O_5$ and CdS films were fabricated additively by successive removal of OTS layer pre-formed. This study presents the designed architectures consisting of the two types of feature having horizontal dimensions of 170 ㎛ and 340 ㎛ with constant thickness ca. 150 nm of each deposited materials. The thin film lay-out of the cross-patterning is composed of four regions with chemically different layer compositions, which are confirmed by Auger electron microanalysis.

엔진 수트 측정 센서 표면에서의 흡착 오염 저감을 위한 실험적 연구 (I) (An Experimental Study for the Minimization of Soot Adsorption on the Optical Surface of an Engine Soot Detector (I))

  • 윤의성;김학열;공호성;한흥구
    • Tribology and Lubricants
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    • 제20권6호
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    • pp.343-349
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    • 2004
  • The adsorption of soot particles onto a sensor surface of the engine soot detector posses a critical problem in the measurement. In order to prevent the optical rod surface from soot contamination, various functional coatings and flow-induced cleaning were applied to the surface in this work. For surface coatings, various materials of self-assembled monolayers (SAM) such as OTS (octadecyltrichlorosilane), PFDTES (perfluorodecyl-triethoxysilane) and PFDTMS (perfluorodecyltrimethoxysilane) were coated on the optical rod surface ,which have different characteristics in both hydrophobicity and oleophobicity. These coatings were tested with soot content varying from $0\%\;to\;3wt\%$ and oil temperature from 20 to $70^{\circ}C$. Test results showed that surface coatings were not effective for preventing the adsorption of soot panicles on the surface of optical rod. It was thought that these coatings provided the surface with additional attractive surface forces. However, it was found that adsorption of soot particles onto a sensor surface was minimized by flow-induced cleaning. This effect was tested with varying the flow velocity.

One- and Two-Dimensional Arrangement of DNA-Templated Gold Nanoparticle Chains using Plasma Ashing Method

  • Kim, Hyung-Jin;Hong, Byung-You
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.291-291
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    • 2010
  • Electron-beam lithography (EBL) process is a versatile tool for a fabrication of nanostructures, nano-gap electrodes or molecular arrays and its application to nano-device. However, it is not appropriate for the fabrication of sub-5 nm features and high-aspect-ratio nanostructures due to the limitation of EBL resolution. In this study, the precision assembly and alignment of DNA molecule was demonstrated using sub-5 nm nanostructures formed by a combination of conventional electron-beam lithography (EBL) and plasma ashing processes. The ma-N2401 (EBL-negative tone resist) nanostructures were patterned by EBL process at a dose of $200\;{\mu}C/cm2$ with 25 kV and then were ashed by a chemical dry etcher at microwave (${\mu}W$) power of 50 W. We confirmed that this method was useful for sub-5 nm patterning of high-aspect-ratio nanostructures. In addition, we also utilized the surface-patterning technique to create the molecular pattern comprised 3-(aminopropyl) triethoxysilane (APS) as adhesion layer and octadecyltrichlorosilane (OTS) as passivation layer. DNA-templated gold nanoparticle chain was attached only on the sub-5 nm APS region defined by the amine groups, but not on surface of the OTS region. We were able to obtain DNA molecules aligned selectively on a SiO2/Si substrate using atomic force microscopy (AFM).

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표면 처리한 $SiO_2$를 게이트 절연막으로 하는 박막 트랜지스터의 특성 연구 (A STUDY ON THE ELECTRICAL CHARACTERISTICS OF ORGANIC THIN FILM TRANSISTORS WITH SURFACE-TREATED GATE DIELECTRIC LAYER)

  • 이재혁;이용수;박재훈;최종선;김유진
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2000년도 추계학술대회 논문집 학회본부 C
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    • pp.455-457
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    • 2000
  • In this work the electrical characteristics of organic TFTs with the semiconductor-insulator interfaces, where the gate dielectrics were treated by the two methods which are the deposition of Octadecyltrichlorosilane (OTS) on the insulator and rubbing the insulator surface. Pentacene is used as an active semiconducting layer. The semiconductor layer of pentacene was thermally evaporated in vacuum at a pressure of about $2{\times}10^{-7}$ Torr and at a deposition rate of $0.3{\AA}/sec$. Aluminum and gold were used for the gate and source/drain electrodes. OTS is used as a self-alignment layer between $SiO_2$ and pentacene. The gate dielectric surface was rubbed before pentacene is deposited on the insulator. In order to confirm the changes of the surface morphology the atomic force microscopy (AFM) was utilized. The characteristics of the fabricated TFTs are measured to clarify the effects of the surface treatment.

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Superb Mechanical Stability of n-Octadecyltriethoxysilane Monolayer Due to Direct Chemical Bonds between Silane Headgroups and Mica Surface: Part II

  • 김성수
    • 통합자연과학논문집
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    • 제3권2호
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    • pp.96-102
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    • 2010
  • It is still controversial where the improved stability of n-octadecyltriethoxysilane self-assembled monolayer (OTE SAM) on plasma-pretreated mica surface exactly originates from. To date, it has been well known that the extensive cross-polymerization between silane headgroups is a crucial factor for the outstanding mechanical strength of the monolayer. However, this study directly observed that the stability comes not only from the cross-links but also, far more importantly, from the direct chemical bonds between silane headgroups and mica surface. To observe this phenomenon, n-octadecyltrichlorosilane monolayers were self-assembled on both untreated and plasma treated mica surfaces, and their adhesion properties at various stress conditions and force profiles in pure water were investigated and compared through the use of the surface forces apparatus technique. It revealed that, in pure water, there is a substantial difference of stability between untreated and plasma treated cases and the plasma treated surface is mechanically much more stable. In particular, the protrusion behavior of the monolayer during contact repetition experiment was always observed in the untreated case, but never in the plasma treated case. It directly demonstrates that the extensive chemical bonds indeed exist between silane head-groups and plasma treated mica surface and dramatically improve the mechanical stability of the OTE monolayer-coated mica substrate.

Superb Mechanical Stability of n-Octadecyltriethoxysilane Monolayer Due to Direct Chemical Bonds between Silane Headgroups and Mica Surface: Part I

  • 김성수
    • 통합자연과학논문집
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    • 제3권2호
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    • pp.89-95
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    • 2010
  • It is still controversial where the improved stability of n-octadecyltriethoxysilane self-assembled monolayer (OTE SAM) on plasma-pretreated mica surface exactly originates from. To date, it has been well known that the extensive cross-polymerization between silane head-groups is a crucial factor for the outstanding mechanical strength of the monolayer. However, this study clearly showed that the stability comes not only from the cross-links but also, far more importantly, from the direct chemical bonds between silane headgroups and mica surface. To examine this phenomenon, n-octadecyltrichlorosilane monolayers were self-assembled on both untreated and plasma treated mica surfaces, and their adhesion properties at various physical conditions (relative humidity, high stress, and contact repetition) were investigated and compared through the use of the surface forces apparatus technique. It revealed that, in highly humid conditions (>90%RH), there is a substantial difference of stability between untreated and plasma treated cases and the plasma treated surface is mechanically much more stable. It obviously proves that the extensive chemical bonds indeed exist between silane head-groups and plasma treated mica surface and dramatically improve the mechanical stability of the OTE monolayer-coated mica substrate.

Amino-Functionalized Alkylsilane SAM-Assisted Patterning of Poly(3-hexylthiophene) Nanofilm Robustly Adhered to SiO2 Substrate

  • Pang, Ilsun;Boo, Jin-Hyo;Sohn, Honglae;Kim, Sung-Soo;Lee, Jae-Gab
    • Bulletin of the Korean Chemical Society
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    • 제29권7호
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    • pp.1349-1352
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    • 2008
  • We report a novel patterning method for a homo-polymeric poly(3-hexylthiophene) (P3HT) nanofilm particularly capable of strong adhesion to a $SiO_2$ surface. An oxidized silicon wafer substrate was micro-contact printed with n-octadecyltrichlorosilane (OTS) monolayer, and subsequently its negative pattern was selfassembled with three different amino-functionalized alkylsilanes, (3-aminopropyl)trimethoxysilane (APS), N- (2-aminoethyl)-3-aminopropyltrimethoxy silane (EDAS), and (3-trimethoxysilylpropyl) diethylenetriamine (DETAS). Then, P3HT nanofilms were selectively grown on the aminosilane pre-patterned areas via the vapor phase polymerization method. To evaluate the adhesion, patterning, and the film itself, the PEDOT nanofilms and SAMs were investigated with a $Scotch^{(R)}$ tape test, contact angle analyzer, ATR-FT-IR, and optical and atomic force microscopes. The evaluation showed that the newly developed all bottom-up process can offer a simple and inexpensive patterning method for P3HT nanofilms robustly adhered to an oxidized Si wafer surface by the mediation of $FeCl_3$ and amino-functionalized alkylsilane SAMs.