• 제목/요약/키워드: Nucleation Process

검색결과 320건 처리시간 0.022초

분무성형 공정에서 분무액적의 열이력 해석 및 고상분율 예측 (Thermal History Analysis and Solid Fraction Prediction of Gas-Atomized Alloy Droplets during Spray Forming)

  • 이언식
    • 한국분말재료학회지
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    • 제1권1호
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    • pp.85-94
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    • 1994
  • In order to predict droplet velocity and temperature profiles and fractional solidification with flight distance during spray forming, the Newtonian heat transfer formulation has been coupled with the classical heterogeneous nucleation and the specific solidification process. It has been demonstrated that the thermal profile of the droplet in flight is significantly affected by process parameters such as droplet size, initial gas velocity, undercooling. As the droplet size and/or the initial gas velocity increase, the onset and completion of solidification are shifted to greater flight distances and the solidification process also extends over a wider range of flight distances. The amounts of solid fractions formed during recoalescence, segregated solidification and eutectic solidification are insensitive to droplet size and initial gas velocity whereas those are strongly affected by the degree of undercooling. There are good linear relations between the undercooling and the corresponding solid fractions generated during recoalesced, segregated and eutectic stages.

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CRYSTALLIZATION KINETICS OF Fe-Si-B-Cu-Nb AMORPHOUS RIBBONS

  • Zhou, S.X.;Ulvensoen, J.H.;Hoier, R.
    • 한국자기학회지
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    • 제5권5호
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    • pp.511-514
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    • 1995
  • The crystallization kinetics of $Fe_{73.5}Si_{13.5}B_{9}Cu_{1}Nb_{3}$ amorphous alloy has been investigated using differential scanning calorimetry (DSC). The crystallization process had two stages, i.e. precipitation of the $\alpha$-Fe(Si) solid solution and the tetragonal borides. The isothermal transformation data of the amorphous alloy has been fitted successfully to the generalized Johnson-Mehl-Avrami equation. The mean time exponent, n, obtained is close to 2.5. The value of n=2.5 may be interpreted as being due to a diffusion-controlled transformation process with a constant nucleation rate, one likely transformation mode for the crystallization of metallic amorphous alloys. The activation energy of the overall crystallization process deduced from the time to 50% crystallization are about 81 kcal/mole. The value is of the same order as those estimated from viscous flow.

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Nucleation and growth mechanism of nitride films deposited on glass by unbalanced magnetron sputtering

  • Jung, Min J.;Nam, Kyung H.;Han, Jeon G.
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2001년도 춘계학술발표회 초록집
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    • pp.14-14
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    • 2001
  • Nitride films such as TiN, CrN etc. deposited on glass by PVD processes have been developed for many industrial applications. These nitride films deposited on glass were widely used for not only decorative and optical coatings but also wear and corrosion resistance coatings employed as dies and molds made of glass for the example of lens forming molds. However, the major problem of nitride coatings on glass by PVD process is non-uniform film owing to pin-hole and micro crack. It is estimated that nonuniform coating is influenced by a different surface energy between metal nitrides and glass due to binding states. In this work, therefore, for the evaluation of nucleation and growth mechanism of nitride films on glass TiN and CrN film were synthesized on glass with various nitrogen partial pressure by unbalanced magnetron sputtering. Prior to deposition, for the examination of relationship between surface energy and film microstructure plasma pre-treatment process was carried out with various argon to hydrogen flow rate and substrate bias voltage, duty cycle and frequency by using pulsed DC power supply. Surface energy owing to the different plasma pre-treatment was calculated by the measurement of wetting angle and surface conditions of glass were investigated by X-ray Photoelectron Spectroscopy(XPS) and Atomic Force Microscope(AFM). The microstructure change of nitride films on glass with increase of film thickness were analyzed by X-Ray Diffraction(XRD) and Scanning Electron Microscopy(SEM).

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고온 플라즈마를 이용한 붕소 함유 나노입자 제조에 관한 연구 (Study on Synthesis of Boron-Containing Nanoparticles Using Thermal Plasma System)

  • 신원규
    • 대한기계학회논문집B
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    • 제36권7호
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    • pp.731-736
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    • 2012
  • 열플라즈마 시스템을 이용하여 붕소 함유 나노입자를 제조하기 위한 새로운 방법이 시도되었다. $BCl_3$$CH_4$ 전구체 기체를 열플라즈마 영역으로 분사하여 고온에서 분해시킨 후, 기체상 응핵 및 성장 과정을 통하여 붕소 또는 붕소 카바이드 입자를 제조하였다. X 선 광분자 분석법을 이용하여 입자 표면의 화학적 결합 상태 및 카바이드와 관련된 B-C 결합 구조 내의 붕소와 탄소의 원자 비율을 측정 및 분석하였다. 또한 나노입자 형상 및 크기 분석을 위해 주사식 투과현미경과 전자에너지손실분광법이 이용되었다. 제조된 나노입자는 30-70 nm 내의 크기 분포를 갖고 있으며, $BCl_3$$CH_4$ 전구체 기체가 각각 20 sccm, 25 sccm 사용되었을 때 B-C 결합 구조 내의 붕소와 탄소의 비는 2.13 이었다.

Mechanism of Tungsten Recovery from Spent Cemented Carbide by Molten Salt Electrodeposition

  • Hongxuan Xing;Zhen Li;Enrui Feng;Xiaomin Wang;Hongguang Kang;Yiyong Wang;Hui Jin;Jidong Li
    • Journal of Electrochemical Science and Technology
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    • 제14권1호
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    • pp.75-84
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    • 2023
  • The accumulation of spent carbide (YG8), not only pollutes the environment but also causes waste of tungsten, cobalt and other rare metal resources. To better address this issue, we proposed a combined electrochemical separation process of low-temperature aqueous solution and high-temperature molten salt for tungsten and cobalt. H2WO4 was obtained from spent carbide in an aqueous solution, and we calcined it to obtain WO3, which was used as a raw material to obtain tungsten by using molten salt electrodeposition. The influence of the current efficiency and the electrochemical behavior of the discharge precipitation of W(VI) were also studied. The calcination results showed that the morphology of WO3 was regular and there were no other impurities. The maximum current efficiency of 82.91% was achieved in a series of electrodeposition experiments. According to XRD and SEM analysis, the recovered product was high purity tungsten, which belongs to the simple cubic crystal system. In the W(VI) reduction mechanism experiments, the electrochemical process of W(VI) in NaCl-Na2WO4-WO3 molten salt was investigated using linear scanning voltammetry (LSV) and chronoamperometry in a three-electrode system. The LSV showed that W(VI) was reduced at the cathode in two steps and the electrode reaction was controlled by diffusion. The fitting results of chronoamperometry showed that the nucleation mechanism of W(VI) was an instantaneous nucleation mode, and the diffusion coefficient was 7.379×10-10 cm2·s-1.

열분석에 의한 PDP 격벽용 출발유리조성의 결정화 특성 연구 (Crystallization Kinetics by Thermal Analysis (DTA) on Starting Glass Compositions for PDP(Plasma Display Panel) Rib)

  • 전영욱;차재민;김대환;이병철;류봉기
    • 한국세라믹학회지
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    • 제39권8호
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    • pp.721-727
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    • 2002
  • 고함량 PbO계 조성 PDP 격벽용 유리의 경우, 광학적, 기계적 및 전기적 물성들을 만족시키며, 동시에 높은 온도에서 열처리공정을 거쳐야 하므로, 유리의 조성-물성-공정상의 trade-off가 발생하여, 이를 극복하기 위한 방안으로서 유리의 결정화가 유효하다. 이에 본 연구에서는 고함량 PbO계 조성 PDP 격벽용 후보 유리계의 최적결정화조건을 확립하고자 열시차분석법(DTA)에 의한 결정화 특성을 연구하였다. $62PbO-19B_2O_3-10SiO_2-9(Al_2O_3-K_2O-BaO-ZnO)$(in wt%) 조성계의 유리에 결정핵생성 및 성장을 위해 $TiO_2$를 3 wt%를 첨가한 수, 용융/냉각/분쇄 처리 후 얻어진 유리 분말을 $445^{\circ}C$에서 각각 1∼10시간 열처리하여 핵생성을 시켰으며, 이렇게 얻어진 각 유리 분말은 각기 $5∼25^{\circ}C/min$의 가변 승온속도로 DTA 측정을 하였다. DTA 결정화 피크 온도는 승온속도가 높아짐에 따라 증가하였고, 열처리 시간이 증가함에 따라 감소하였다. Avrami 변수는 1에 근사하는 값이 얻어져서, 표면결정화가 우선하였으며, 최대 핵생성 처리시간은 2시간이었다.

이온 선택성 전극을 이용한 탄산칼슘 형성 특성 연구 : 마그네슘-칼슘 비율과 반응 온도의 영향 (Characterization of CaCO3 Formation Using an Ion Selective Electrode : Effects of the Mg/Ca Ratio and Temperature)

  • 한미송;최병영;이승우;박진영;채수천;방준환;송경선
    • 공업화학
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    • 제34권2호
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    • pp.111-120
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    • 2023
  • 이산화탄소 순환 물질 중 대표적인 광물인 탄산칼슘의 형성 과정을 관찰하고, 대표적 조절 변수인 마그네슘-칼슘 이온의 혼합 비율(Mg/Ca 비)과 온도가 pre-nucleation cluster (PNC) 및 탄산칼슘 형성에 미치는 영향을 분석하고자 실험과정에서 칼슘 이온 선택성 전극(calcium ion selective electrode, Ca ISE)을 이용하여 핵형성 과정을 연구하였다. 실험결과 미량의 결정이 형성되었으며 표면 원소 분석을 위해 에너지 분산 X선 분석법(energy dispersive X-ray spectroscopy, EDS)을 사용하였고, 형상 분석을 위해 주사 전자 현미경(field emission scanning electron microscope, FE-SEM)을 사용하였다. Mg/Ca 비와 온도 조건에 따라 다양한 형상의 결정질 탄산칼슘(방해석, 아라고나이트 등)을 확인하였으며 Ca ISE로부터 얻은 칼슘 이온 농도 그래프는 탄산칼슘 형성 과정을 보여주었다. 칼슘 이온 농도 그래프 분석을 통해 마그네슘 이온은 칼슘 이온과 탄산 이온의 결합을 방해하고 PNC 간 응집을 지연시켜 핵형성 및 탄산칼슘의 형성을 지연시킴을 확인하였다. 반면 온도는 이와 반대되는 효과를 보였으며, 본 실험 조건에서는 마그네슘 이온보다 더 큰 영향을 미쳤다. 또한 Mg/Ca 비와 온도에 따라 탄산칼슘의 형상이 뚜렷하게 변화하여 두 인자는 탄산칼슘 형성 과정에 전반적으로 영향을 미치는 중요 조절 변수임을 확인하였다.

연속파형 Nd:YAG 레이저를 이용한 SM45C 맞대기 용접의 공정 변수 (Process Parameters of Butt Welding of SM45C using a Continuous Wave Nd:YAG Laser Beam)

  • 유영태;노경보;오용석;김종신;임기건
    • 한국정밀공학회지
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    • 제20권7호
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    • pp.44-55
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    • 2003
  • The Nd:YAG laser process is known to have high speed and deep penetration capability to become one of the most advanced welding technologies. This paper describes the machining characteristics of SM45C carbon steel welding by use of an Nd:YAG laser. In spite of its good mechanical characteristics, SM45C carbon steel has a high carbon contents and suffers a limitation in the industrial application due to the poor welding properties. The major process parameters studied in the present laser welding experiment were position of focus, travel speed and laser power. Optical microscope and SEM were used to investigate the microstructures of the welded zone. The experimental results showed that penetration depth of the welding process increases with laser power. Both the microstructural investigation and the theoretical calculations indicated that materials undergoes a very high heating and cooling cycle during welding process. It was also found that the austenite nucleation takes place at the initial stage and the completion temperature of austenite transformation is much higher than in the case of the arc welding.

rf 플라즈마 화학기상증착기의 제작 및 특성 (Characterization and Construction of Chemical Vapor Deposition by using Plasma)

  • 김경례;김용진;현준원;이기호;노승정;최병구
    • 한국표면공학회지
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    • 제33권2호
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    • pp.69-76
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    • 2000
  • The rf plasma chemical vapor deposition is a common method employed for diamond or amorphous carbon deposition. Diamond possesses the strongest bonding, as exemplified by a number of unique properties-extraordinary hardness, high thermal conductivity, and a high melting tempera tore. Therefore, it is very important to investigate the synthesis of semiconducting diamond and its use as semiconductor devices. An inductively coupled rf plasma CVD system for producing amorphous carbon films were developed. Uniform temperature and concentration profiles are requisites for the deposition of high quality large-area films. The system consists of rf matching network, deposition chamber, pumping lines for gas system. Gas mixtures with methane, and hydrogen have been used and Si (100) wafers used as a substrate. Amorphous carbon films were deposited with methane concentration of 1.5% at the process pressure of S torr~20 torr, and process temperature of about $750^{\circ}C$. The nucleation and growth of the amorphous carbon films have been characterized by several methods such as SEM and XRD.

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MEMS 부품을 위한 다결정 박막의 탄성 물성치 추출 시스템의 매개변수의 영향 (Parametric Effects of Elastic Property Extraction System of Polycrystalline Thin-Films for Micro-Electro-Mechanical System Devices)

  • 정향남;최재환;정희택;이준기
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2004년도 추계학술대회 논문집
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    • pp.50-54
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    • 2004
  • A numerical system to extract effective elastic properties of polycrystalline thin-films for MEMS devices is already developed. In this system, the statistical model based on lattice system is used for modeling the microstructure evolution simulation and the key kinetics parameters of given micrograph, grain distributions and deposition process can be extracted by inverse method proposed in the system. In this work, the effects of kinetics parameters on the extraction of effective elastic properties of polycrystalline thin-films are studied by using statistical method. The effects of the fraction of the potential site( $f_{P}$ ) and the nucleation probability( $P_{N}$ ) among the parameters for deposition process of microstructure on the extraction of effective elastic properties of polycrystalline thin-films are studied.d.d.

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