• 한국분말재료학회지
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• 제22권6호
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• pp.426-431
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• 2015

Microstructural examination of the Nb-Si-B alloys at Nb-rich compositions is performed. The Nb-rich corner of the Nb-Si-B system is favorable in that the constituent phases are Nb (ductile and tough phase with high melting temperature) and $T_2$ phase (very hard intermetallic compound with favorable oxidation resistance) which are good combination for high temperature structural materials. The samples containing compositions near Nb-rich corner of the Nb-Si-B ternary system are prepared by spark plasma sintering (SPS) process using $T_2$ and Nb powders. $T_2$ bulk phase is made in arc furnace by melting the Nb slug and the Si-B powder compact. The $T_2$ bulk phase was subsequently ball-milled to powders. SPS is performed at $1300^{\circ}C$ and $1400^{\circ}C$, depending on the composition, under 30 MPa for 600s, to produce disc-shaped specimen with 15 mm in diameter and 3 mm high. Hardness tests (Rockwell A-scale and micro Vickers) are carried out to estimate the mechanical property.

• 한국초전도ㆍ저온공학회논문지
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• 제3권1호
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• pp.1-5
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• 2001

In order to investigate the effect of fatigue damage on the properties of RRR in this study. fatigue tests at room temperature and residual resistivity measurement tests at 12K were carried out using annealed 9 strand Cu-Ni/NbTi/Cu composite cables Through fatigue tests of NbTi composite cables. a conventional S-N curve could be obtained even though there existed a possibility of fretting among strands, From the resistivity measurement of a NbTi strand after fatigue test, it was found that the RRR of xii·gin strand for annealed cables was 3 times more than that for as-received one. With increasing of fatigue cycles at a sress amplitude level. the RRR decreased. which was resulted from the accumulation of damage such as lattice defects and dislocation within the Cu stabilizer.

• 한국전기전자재료학회논문지
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• 제13권12호
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• pp.1051-1057
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• 2000

A traveling-wave CPW(coplanar waveguide) electrode with abruptly broken input/output-taper for LiNbO$_3$optical modulator was designed and fabricated. The electrical characteristics of traveling-wave electrode on z-cut LiNbO$_3$crystal with SiO$_2$buffer layers were measured by network analyzer. To confirm the possibility of the electro-optic modulator electrode, detailed calculations of the impedance, microwave effective index and attenuation constants are presented as a function of the microwave electrode thickness, but the buffer layer thickness is fixed as 1${\mu}{\textrm}{m}$. These characteristics are discussed from the viewpoint of the device optimization and are expected to be design guides for the LiNbO$_3$modulator’s electrodes.

• Progress in Superconductivity
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• 제4권1호
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• pp.37-41
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• 2002

In this work. we have designed two different kinds of Rapid Single Flux Quantum (RSFQ) OR-gates. One was based on the already developed RSFQ cells and the other was aimed to develop a more compact version. In the first circuit, we used a combination of two D Flip-Flops and a merger and in the other circuit we used a combination of RS Flip-Flops and Confluence Buffer. We tested the circuit performance by using the simulation tools, Xic and Wrspice. We obtained the operation margins of the circuit elements by a margin calculation program, and we obtained the minimum operation margins of $\pm$30%. The circuits were laid out, aimed to fabricate by using the existing KRISS Nb process. KRISS Nb process includes the $Nb／Al_2$$O_3$／Nb trilayer fabricated by DC magnetron sputtering and the reactive ion etching technique for the definition of the features. The major tools used in the layouts were Xic and L-meter.

• Progress in Superconductivity
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• 제12권2호
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• pp.114-117
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• 2011

We report our efforts on the development of Nb-based non-hysteretic Josephson junction fabrication process for quantu device applications. By adopting and modifying the existing Nb-aluminum oxide tunnel junction process, we develop a process for non-hysteretic Josephson junction circuits using metal-silicide as metallic barrier material. We use sputter deposition of Nb and $MoSi_2$, PECVD deposition of silicon oxide as insulator material, and ICP-RIE for metal and oxide etch. The advantage of the metal-silicide barrier in the Nb junction process is that it can be etched in $SF_6$ RIE together with Nb electrode. In order to define a junction area precisely and uniformly, end-point detection for the RIE process is critical. In this paper, we employed thin Al layer for the etch stop, and optimized the etch condition. We have successfully demonstrated that the etch stop properties of the inserted Al layer give a uniform etch profile and a precise thickness control of the base electrode in Nb trilayer junctions.

• 한국초전도ㆍ저온공학회논문지
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• 제15권3호
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• pp.1-4
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• 2013

We investigated the effect of Nb substitution for Ru on the structural and magnetic properties of $(Ru_{1-x}Nb_x)\;Sr_2(Sm_{1.4}Ce_{0.6})Cu_2O_z$ Samples. X-ray diffraction measurements indicated that nearly single-phase samples are formed in the range from x = 0 to 1.0. The superconducting transition temperature determined from the inflection in the field-cooled magnetic susceptibility decreased only slightly from $T_c$ = 25 K for x = 0 to $T_c$ = 22 K for x = 1.0, in consistent with the change in room temperature thermopower of the samples. However, the Nb substitution for Ru above x = 0.25 significantly suppressed the weak ferromagnetic component of the field-cooled magnetic susceptibility. It was also found that the Nb substitution for Ru results in an enhanced diamagnetic susceptibility with Nb content above x = 0.5 in both zero field-cooled and field-cooled magnetization measurements, in contrast to the behavior of the samples with $x{\leq}0.5$ in which the diamagnetic susceptibility decreases as the Nb content increases.

• 한국결정성장학회지
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• 제20권6호
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• pp.249-253
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• 2010

A-자리 경함 perovskite $La_{1/3}NbO_3$ 단결정 시편을 제작하여 10~800 K 온도범위에서 유전특성을 조사하였다. 50 K와 650 K 부근에서 유전이상이 나타났으며, 고온영역(약 650 K)에서 유전상수의 thermal hysterisis가 크게 나타났다. 교류전도도 측정으로부터 560~690 K에서 입내 활성화 에너지는 0.43 eV로 가장 낮게 나타났다. 이들의 결과로부터 50 K 부근의 dielectric anomaly는 $Nb^{5+}$-이온의 antiparallel 변위에 기인한 것이며, 650 K 부근의 dielectric anomaly는 $La^{3+}$-이온의 재배열에 기인한 것으로 추측된다.

• 한국전기전자재료학회논문지
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• 제11권2호
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• pp.106-110
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• 1998

The $LiNbO_3$ thin films were prepared directly on Si(100) substrates by conventional RF magnetron spurttering system for nonvolatile memory applications. RTA(Rapid Thermal Annealing) treatment was performed for as-deposited films in an oxygen atmosphere at 600 $^{\circ}C$ for 60 s. The rapid thermal annealed films were changed to poly-crystalline ferroelectric nature from amorphous of as-deposition. The resistivity of the ferroelectric $LiNbO_3$ film was increased from a typical value of $1{\sim}2{\times}10^8{\Omega}{\cdot}cm$ before the annealing to about $1{\times}10^{13}{\Omega}{\cdot}cm$ at 500 kV/cm and reduced the interface state density of the $LiNbO_3/Si$ (100) interface to about $1{\times}10^{11}/cm^2{\cdot}eV$. Ferroelectric hysteresis measurements using a Sawyer-Tower circuit yielded remanent polarization ($P_r$) and coercive field ($E_c$) values of about 1.2 ${\mu}C/cm^2$ and 120 kV/cm, respectively.

• 한국재료학회지
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• 제7권7호
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• pp.587-591
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• 1997

RBS와 XRD를 이용하여 C o-Nb이중층 실리사이드와 구리 배선층간의 열적안정성에 관하여 조사하였다. Cu$_{3}$Si등의 구리 실리사이드는 열처리시 40$0^{\circ}C$정도에서 처음 형성되기 시작하였는데, 이 때 형성되는 구리 실리사이드는 기판의 상부에 존재하던 준안정한 CoSi의 분해시에 발생한 Si원자와의 반응에 의한 것이다. 한편, $600^{\circ}C$에서의 열처리 후에는 CoSi$_{2}$층을 확산.통과한 Cu원자와 기판 Si와의 반응에 의하여 CoSi$_{2}$/Si계면에도 구리 실리사이드가 성장하였는데, 이렇게 구리 실리사이드가 CoSi$_{2}$/Si 계면에 형성되는 것은 Cu원자의 확산속도가 여러 중간층에서 Si 원자의 확산속도 보다 더 빠르기 때문이다. 열처리 결과 최종적으로 얻어진 층구조는 CuNbO$_{3}$/Cu$_{3}$Si/Co-Nb합금층/Nb$_{2}$O$_{5}$CoSi$_{2}$/Cu$_{3}$Si/Si이었다. 여기서 상부에 형성된 CuNbO$_{3}$는 Cu원자가 Nb$_{2}$O$_{5}$및 Co-Nb합금층과 반응하여 기지조직의 입계에 석출되어 형성된 것이다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 추계학술대회 논문집
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• pp.25-28
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• 1999

Metal ferroelectric semiconductor Field Effect- Transistors(MFSFET) with various gate electrodes, that are aluminum, platinum and poly -Si, using LiNbO$_3$/Si(100) structures were fabricated and the properties of the FETs have been discussed. The drain current of the state of FET with Pt electrode was more than 3 orders of magnitude larger than the state current at the same gate voltage of 1.5 V, 7.rich means the memory operation of the MFSFET. A write voltage as low as about $\pm$4 V, which is applicable to low power integrated circuits, was used for polarization reversal. The retention properties of the FET using Al electrode were quite good up to about 10$^3$s and using Pt electrode remained almost the same value of its initial value over 2 days at room temperature.