• 제목/요약/키워드: Nanoimprint Lithography

검색결과 169건 처리시간 0.037초

Characteristics of hybrid mask mold for combined nanoimprint and photolithography technique

  • MOON KANSHUN;CHOI BANGLIM;PARK IN-SUNG;HONG SUNSHUM;YANG KIHYUN;LEE HEON;AHN JINHO
    • 한국반도체및디스플레이장비학회:학술대회논문집
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    • 한국반도체및디스플레이장비학회 2005년도 추계 학술대회
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    • pp.147-150
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    • 2005

  • We process a novel approach cal led combined nanoimprint and photolithography (CNP) to greatly simplify the fabrication in conventional nanoimprint lithography (NIL). In this study, a novel HMM with anti-sticking $SiO_2$ layer is introduced to improve the quality of transferred pattern. The surface property was investigated using contact angle measurement and spectrophotometer. Replicate pattern with CNP using HMM showed complete pattern transfer without defect.

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