• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.04a
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• pp.129-132
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• 2000

The PDP(Plasma Display Panel) barrier rib material on the glass substrate was patterned for fabrication of the PDP cell using Nd:YAG laser(1064 nm) which can generate the second(532 nm) and forth(266 nm) harmonic wave by HGM(harmonic generation modules). At a scan speed of 20 ${\mu}m/s$ with the second harmonic wave(532 nm) of Nd:YAG laser, the etching threshold laser fluence of the PDP material was 6.5 $mJ/cm^2$ and a sample(thickness = 180 ${\mu}m$) on the glass substrate was removed clearly at a laser fluence of 19.5 $mJ/cm^2$. In order to increase the throughput of the fabrication we divided a single-beam into multi-beams by using a metal mask between the sample and the focusing lens. As a result, 10 lines of PDP cell were formed by one laser beam scanning at a scan speed of 200 ${\mu}m/s$ and a laser fluence of 2.86 $J/cm^2$.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.18 no.10
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• pp.936-940
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• 2005

IMML(Inorganic metal multi-layer) was used as cathode in the OLED devices to reduce the reflectance or ITO and increase the contrast ratio. Device structure was $ITO/{\alpha}-NPD/Alq_3:DCJTB/Alq_3/IMML/Al$. $Alq_3$ and DCJTB (4 - (dicyanomethylene) - 2 - ( 1 - propyls) 6 - methy 4H - pyrans) as host material lot red emission and red emitting guest material. IMML made three different layer: thin aluminum layer, aluminum layer doped with silicon monoxide, thick aluminum layer. The red OLED device with IMML showed the average reflectance of $4.97\%$, and then normal OLED with or without polarizer showed the average reflectance of $4.55\%$, $46\%$ at visible range from 380 nm to 780 nm. The brightness of OLED with IMML at 13 V was 5557 $cd/m^2$, and that of normal OLED with polarizer was 4872 $cd/m^2$. IMML could be the substitution for polarizer with same reflection, low cost, easy process in flat panel display market.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.11a
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• pp.56-56
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• 2009

In this study, we fabricated the engineered $SiO_2/Si_3N_4/SiO_2$(ONO) tunnel barrier with high-k $HfO_2$ trapping layer for application high performance flash MLC(Multi Level Cell). As a result, memory device show low operation voltage and stable memory characteristics with large memory window. Therefore, the engineered tunnel barrier with ONO stacks were useful structure would be effective method for high-integrated MLC memory applications.

• Proceedings of the KIEE Conference
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• 2007.11c
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• pp.165-169
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• 2007

Organic EL has been expected to adopt to a new styles of technology that make flat display after Tang & Vanslyke made food electric luminescence device in late 1980s. Their studies based on multi layer structure that consists of emitting layer and carrier transporting layer using proper organic material. In this study we made multi layer device using $Eu(TTA)_3(phen)$ as a luminescence material by PVD and investigate luminous properties of each device. But oxidization of organic layer by ITO, energy walls in both pole interface, contaminations of ITO surface, importance of protecting membrane, diffusive dimming of light to cathode organic layer, these causes of degradations are common facts of a macromolecule and micromolecule. We think these degradation caused by the impact of heat and electro-chemical factor, bulk effect and interface phenomenon, and raise a question.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.04b
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• pp.85-88
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• 2002

We have carried out two-beam interference experiments to form holographic gratings on chalcogenide $Ag/As_{40}Se_{15}S_{35}Ge_{10}$ multi-layer. In this study, holographic gratings have been formed using He-Ne laser(632.8nm) under different polarization combinations(intensity polarization holography, phase polarization holography). The diffraction efficiency was obtained by +1st order intensity and formed grating structure was investigated using atomic force microscopy.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.206-206
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• 2011

투명 전도성 산화물 (TCO, Transparent Conductive Oxide) 박막을 태양전지에 적용하기 위해서는 우수한 전기 전도성 및 가시광 영역에서 높은 투과율을 가져야 한다. 대표적인 TCO 물질인 ITO (Indium tin oxide) 박막은 우수한 전기적, 광학적 특성을 가지고 있지만 $400^{\circ}C$ 이상의 고온에서는 전기저항이 급격히 증가하게 되어 실제 태양전지 패널에 적용했을 때 전기적 특성이 저하된다. 따라서 태양전지용 TCO 박막을 개발 시, 뛰어난 고온 안정성이 요구되고 있다. 본 연구에서는 고온 안정적 특성을 지니는 Ga3+를 도핑한 ZnO 계열 TCO인 GZO/ITO multi-layered 박막을 증착하였다. 또한 buffer layer의 두께 변화 및 구조 제어를 통한 최위층 박막의 전기적 특성 및 결정성을 조사하였으며 다층 박막의 계면 간 특성 및 굴절률 제어를 통한 광학적 물성을 연구하였다.

• Proceedings of the KIEE Conference
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• 2005.10a
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• pp.82-85
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• 2005

Organic EL has been expected to adopt to a new styles of technology that make flat display after Tang & Vanslyke made good electric luminescence device in late 1980s. Their studies based on multi layer structure that consists of emitting layer and carrier transporting layer using proper organic material. In this study, we made multi layer device using $Eu(TTA)_3(phen)$ as a luminescence material by PVD and investigate luminous properties of each device. But oxidization of organic layer by ITO, energy walls in both pole interface, contaminations of ITO surface, importance of protecting membrane, diffusive dimming of light to cathode organic layer, these causes of degradations are common facts of a macromolecule and micromolecule. We think these degradation caused by the impact of heat and electro-chemical factor, bulk effect and interface phenomenon, and raise a question.

• Proceedings of the Korean Institute of Building Construction Conference
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• 2019.05a
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• pp.141-142
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• 2019

As part of the recent low-energy policy, insulation standards for buildings are increasing every year. In addition, the conventional styrofoam heat insulation material has a problem in that the thickness of the heat insulation material to achieve the standard heat transmission rate is rapidly increased. Although the risk of spreading the structure vulnerable to fire due to insufficient spacing between buildings due to thickened insulation is increasing, the high cost of high efficiency insulation is difficult to solve. On the other hand, it is known that the method to be used as a formwork using insulation is excellent in cost reduction effect by reducing the amount of formwork used and simplifying the subsequent insulation work. The purpose of this study is to evaluate the strength characteristics of multi - layered insulation materials with appropriate strength by reducing the thickness of the insulation by appropriately combining high performance phenolic foam insulation and styrofoam insulation.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.16 no.7
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• pp.647-655
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• 2003

Commonly used SAW duplexers have a difficulty on manufacture so that a transmission line is printed on the package or an LTCC multi-layer is needed because a quarter-wave transmission line which is a kind of an isolation network is applied to the SAW duplexers. In this study, new structures of one chip type SAW duplexers are proposed. In the proposed structure, Tx and Rx SAW ladder filters and isolation networks are located on a single 36LiTaO$_3$ piezoelectric substrate. The manufacture process is very simple than commonly used product. It is possible to improve tile performance by means of optimizing the micro-strip line lumped elements. It is easy to integrate and modulate with other surrounding components. The optimal design techniques can be applied to other kind of multi-port devices.

• Proceedings of the KIEE Conference
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• 2002.06a
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• pp.110-113
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• 2002

Organic EL has been expected to adopt to a new styles of technology that make flat display after Tang & Vanslyke made good electric luminescence device in late 1980s. Their studies based on multi layer structure that consists of emitting layer and carrier transporting layer using proper organic material. In this study. we made multi layer device using $Eu(TTA)_3(phen)$ as a luminescence material by PVD and investigate luminous properties of each device. But oxidization of organic layer by ITO. energy walls in both pole interface. contaminations of ITO surface, importance of protecting membrane, diffusive dimming of light to cathode organic layer. these causes of degradations are common facts of a macromolecule and micromolecule. We think these degradation caused by the impact of heat and electro-chemical factor, bulk effect and interface phenomenon. and raise a question.