• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2003.10a
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• pp.537-541
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• 2003

The a-Si:H TFTs using ferroelectric of SrTiO$_3$, as a gate insulator is fabricated on glass. Dielectric characteristics of ferroelectric is better than SiO$_2$, SiN. Ferroelectric increases ON-current, decreases threshold voltage of TFT and also breakdown characteristics. The a-Si:H deposited by PECVD shows absorption band peaks at wavenumber 2,000 $cm^{-1}$ /, 635 $cm^{-1}$ / and 876 $cm^{-1}$ / according to FTIR measurement. Wavenumber 2,000 $cm^{-1}$ /, 635 $cm^{-1}$ / are caused by stretching and rocking mode SiH1. The wavenumber of weaker band, 876 $cm^{-1}$ / is due to SiH$_2$ vibration mode. The a-SiN:H has optical bandgap of 2.61 eV, refractive index of 1.8 - 2.0 and resistivity of 10$^{11}$ - 10$^{15}$ aim respectively. Insulating characteristics of ferroelectric is excellent because dielectric constant of ferroelectric is about 60 - 100 and breakdown strength is over 1 MV/cm. TFT using ferroelectric has channel length of 8 - 20 $\mu$m and channel width of 80 - 200 $\mu$m. And it shows drain current of 3 $\mu$A at 20 gate voltages, Ion/Ioff ratio of 10$^{5}$ - 10$^{6}$ and Vth of 4 - 5 volts.

• Journal of the Korean Ceramic Society
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• v.30 no.12
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• pp.999-1006
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• 1993

Si3N4(p)-SiC(p) composites were prepared by gas pressure sintering at 190$0^{\circ}C$ for 1 hour. $\alpha$-SiC with average particle size of 0.48${\mu}{\textrm}{m}$ were dispersed from zero to 50vol% in $\alpha$-Si3N4 with average particle size of 0.5${\mu}{\textrm}{m}$. Y2O3-Al2O3 system was used as sintering aids. When 10vol% of SiC was added to Si3N4, optimum mechanical properties were observed; relative density of 98.8%, flextural strength of 930MPa, fracture toughness of 5.9MPa.m1/2 and hardness value of 1429kg/$\textrm{mm}^2$. Grain growth of $\beta$-Si3N4 was inhibited as the amount of added SiC was increased. SiC particles were found inside the $\beta$-Si3N4 intragrains in case of 10, 20 and 30vol%SiC added composites.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.37 no.8
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• pp.17-27
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• 2000

This paper presents deposition and characterization of hydrogenated microcrystalline silicon (${\mu}c$ -Si:H) films on low cost glass substrate by Hot Wire CVD(HWCVD). The HWCVD ${\mu}c$ -Si:H films had deposition rates ranging from 2${\AA}$/sec to 35${\AA}$/sec with the variations of preparation conditions, which was 10 times higher than that of the films obtained from the conventional PECVD method. From the Raman spectroscopy, the prepared silicon films were found to be composed of the mixture of crystalline and amorphous phases. The crystalline volume fraction and average crystallite size, obtained from the Raman To mode peak near 520cm$^{-1}$, were 37-63% and 6-10 nm, respectively. The conductivity activation energy($E_a$) of the ${\mu}c$ -Si:H films, representing the difference of conduction band and Fermi level in an intrinsic semiconductors, increased from 0.22eV to 0.68eV with increasing pressure from 30mTorr to 300mTorr. The increase of $E_a$ with pressure indicates that the deposited films have properties close to intrinsic semiconductors, which is also proved with low dark conductivity of the ${\mu}c$ -Si:H deposited at 300mTorr. The tungsten concentration incorporated into films was about $6{\times}10^{16}atoms/cm^3$ in the samples prepared at wire temperature of 1800$^{\circ}C$.

• 전자공학회논문지 IE
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• v.44 no.1
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• pp.6-9
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• 2007

Twenty four types of thermopile for micro spectrometer infrared sensors were fabricated on low-stress Si3N4 membranes with $l.2{\mu}m-thickness$ using MEMS technology. Thermopile were designed and fabricated for optimum conditions by five parameters of thermocouple numbers $(16\sim48)$, thermocouple line widths $(10{\mu}m-25{\mu}m)$, thermocouple lengths $(100{\mu}m-500{\mu}m)$, membrane areas $(12mm2\sim2.52mm2)$ and junction areas $(150{\mu}m2\sim750{\mu}m2)$, respectively. It was thought that measurement results could be used for thermopile infrared sensors optimum structure for micro spectrometers.

• Journal of Power System Engineering
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• v.19 no.1
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• pp.45-49
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• 2015

This study focuses on the crack-healing behavior and bending strength of SiC ceramics with sintering additives of $SiO_2$colloid. Optimized crack-healing condition was found to be 1hr at an atmosphere of 1373 K. The maximum crack size that can be healed at the optimized condition was a semi-elliptical surface crack of $450{\mu}m$ in diameter. After heat treatment at the optimum temperature in air, the crack morphology almost entirely disappeared and the strength recovered to the value of the smooth specimens at room temperature for the investigated crack sizes up to $450{\mu}m$. The crack with width $1.4{\mu}m$ can be completely heal the surface crack.

• Journal of Korea Foundry Society
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• v.16 no.2
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• pp.116-123
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• 1996

The equipment for the horizontal continuous casting was built to produce hyper-eutectic Al-Si bars with a small cross-section of 25mm in diameter. The manufacturing processes including withdrawal cycle and secondary cooling methods were modified to refine the primary and the eutectic Si. The longitudinal casting speeds varied over the ranges of 670-1100mm/min for pure Al, and 200-350mm/min for Al-17wt%Si alloy. Due to the difference of cooling rate in the mould, microstructural asymmetry between the lower and the upper part of bar was observed. Thus, manufacturing processes such as cooling and withdrawal method were optimally combinated to get the homogeneous cast structure. With the increase of casting speed, the primary Si size was refined down to $30{\mu}m$ near the surface, and $80{\mu}m$ in the center of the bar.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.408-408
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• 2011

태양광 발전은 발전 셀의 특성상 태양광의 일사량과 태양과 셀 단면이 이루는 각도에 의하여 발전량에 차이를 가져온다. 태양전지의 표면의 입사각은 고정된 위치에서 태양전지 장치의 각도를 가변함으로서 변경 할 수 있다. 이 입사되는 빛의 각도를 변경하는 것은 효율개선의 한 측정의 방법으로써 사용된다. 본 연구에서는 입사각에 따른 a-Si/${\mu}$-Si 적층 태양전지의 양자 효율의 특성에 대해 분석하였다. 태양전지의 측정을 위하여 스테이지는 제작되었으며, 이 연구에서 양자효율 측정에 대한 유용성을 실험을 통해 입증하였다.

• Journal of the Korean Ceramic Society
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• v.32 no.9
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• pp.1003-1008
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• 1995

CVD-Si3N4/CVD-SiC/pack-SiC/pyro-carbon/(3-D C/C composite) multilayer coating was performed to improve the oxdiation resistance and erosion resistance properteis of the 3-D carbon/carbon composite, and the plasma test was performed to measure the oxidation resistance and erosion resistance properties. The thicknesses of each film layer were about 10${\mu}{\textrm}{m}$ for pack-SiC, 5${\mu}{\textrm}{m}$ for CVD-SiC and 40${\mu}{\textrm}{m}$ for CVD-Si3N4. When the multilayer coated specimen was exposed to the plasma flame with temperature of 500$0^{\circ}C$ for 20 seconds, it showed the weight loss five times less than that of the only pyro-carbon coated specimen.

• Composites Research
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• v.30 no.5
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• pp.310-315
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• 2017

In this study, we have investigated microstructure, mechanical properties and wear characteristic of aluminum metal matrix composites with a high volume fraction and uniformly dispersed SiC particles which produced by a liquid pressing process. The volume fraction of bimodal SiC/Al7075 composite was 12% higher than that of the monomodal SiC/Al7075 composite and a compressive strength is increased about 200 MPa. As a result of the abrasion test, the wear width and depth of the bimodal SiC/Al7075 composite were $285.1{\mu}m$ and $0.45{\mu}m$, respectively. The coefficient of friction of bimodal SiC/Al7075 was 0.16.

• Journal of the Korean Institute of Telematics and Electronics D
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• v.35D no.3
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• pp.39-45
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• 1998

SrBi$_{2}$Ta$_{2}$O$_{9}$ (SBT) ferroelectric thin films for nonvolatile memory were prepared on Pt/Ti/SiO$_{2}$/Si and RuO$_{2}$/SiO$_{2}$/Si substrates by RF magnetron sputtering. The dependences of crystalline and electrical properties on the lower electrode type(Pt and RuO$_{2}$) and the annealing temperatures were investigated. SBT films regardless of their electrode types showed typeical Bi layered peroviskite crystal structures. The crystalline quality of as-deposited SBT films was improved by the rapid thermal annealing at 650.deg. C for 30 sec. The remanetn polarization of 2Pr (Pr+-Pr-) of the annealed SBT films deposited on Pt/Ti/SiO$_{2}$/Si substrates were about 11 .mu.C/cm$^{2}$ and 3 .mu.C/cm$^{2}$, respectively. The leakage currents at 3 V bias voltage were about 0.8 .mu.A/cm$^{2}$ for SBT/ Pt/Ti/SiO$_{2}$/Si and about 1 .mu.A/cm$^{2}$ for SBT/RuO$_{2}$/SiO$_{2}$/Si sample. SBT films annealed at 650 .deg. C showed no degradation in Pr values after 10$^{11}$ polarization switching cycles, indicating good fatigue properties. In addition, for SBT samples deposited on Pt/Ti/SiO$_{2}$/Si, Pr values increased to more than that of initial state, suggesting the increament of leakage current caused by repeated polarization.