• Korean Journal of Materials Research
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• v.21 no.10
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• pp.563-567
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• 2011

We report the structural characterization of $Bi_xZn_{1-x}O$ thin films grown on c-plane sapphire substrates by plasma-assisted molecular beam epitaxy. By increasing the Bi flux during the growth process, $Bi_xZn_{1-x}O$ thin films with various Bi contents (x = 0~13.17 atomic %) were prepared. X-ray diffraction (XRD) measurements revealed the formation of Bi-oxide phase in (Bi)ZnO after increasing the Bi content. However, it was impossible to determine whether the formed Bi-oxide phase was the monoclinic structure ${\alpha}-Bi_2O_3$ or the tetragonal structure ${\beta}-Bi_2O_3$ by means of XRD ${\theta}-2{\theta}$ measurements, as the observed diffraction peaks of the $2{\theta}$ value at ~28 were very close to reflection of the (012) plane for the monoclinic structure ${\alpha}-Bi_2O_3$ at 28.064 and the reflection of the (201) plane for the tetragonal structure ${\beta}-Bi_2O_3$ at 27.946. By means of transmission electron microscopy (TEM) using a diffraction pattern analysis and a high-resolution lattice image, it was finally determined as the monoclinic structure ${\alpha}-Bi_2O_3$ phase. To investigate the distribution of the Bi and Bi-oxide phases in BiZnO films, elemental mapping using energy dispersive spectroscopy equipped with TEM was performed. Considering both the XRD and the elemental mapping results, it was concluded that hexagonal-structure wurtzite $Bi_xZn_{1-x}O$ thin films were grown at a low Bi content (x = ~2.37 atomic %) without the formation of ${\alpha}-Bi_2O_3$. However, the increased Bi content (x = 4.63~13.17 atomic %) resulted in the formation of the ${\alpha}-Bi_2O_3$ phase in the wurtzite (Bi)ZnO matrix.

• Proceedings of the Korean Magnestics Society Conference
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• 2004.12a
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• pp.54-55
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• 2004

• Proceedings of the Korean Magnestics Society Conference
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• 2007.05a
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• pp.268.2-268.2
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• 2007

• 한국전자현미경학회:학술대회논문집
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• 2005.11a
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• pp.85-88
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• 2005

• Proceedings of the Materials Research Society of Korea Conference
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• 2007.11a
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• pp.56.2-56.2
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• 2007

• Proceedings of the Korean Vacuum Society Conference
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• 1996.06a
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• pp.34-35
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• 1996

• Vacuum Magazine
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• v.5 no.2
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• pp.10-17
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• 2018

Chalcogenide and oxide heterostructures have been studied as a next-generation electronic materials, due to their interesting electronic properties, such as direct bandgap semiconductor, ferroelectricity, ferromagnetism, superconductivity, charge-density waves, and metal-insulator transition, and their modification near heterointerfaces, so called, electronic reconstruction. An angle-resolved photoemission spectroscopy (ARPES) is a powerful technique to unveil such novel electronic phases in detail, especially combined with high quality thin film preparation methods, such as, molecular beam epitaxy and pulsed laser deposition. In this article, the recent ARPES results in chalcogenide and oxide thin films will be introduced.

• Proceedings of the Materials Research Society of Korea Conference
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• 2005.05a
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• pp.227-227
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• 2005

• 한국전자현미경학회:학술대회논문집
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• 2005.05a
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• pp.95-97
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• 2005

• Proceedings of the Korean Magnestics Society Conference
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• 2002.12a
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• pp.96-97
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• 2002

최근에 스핀트로닉스 (spintronics) 분야에 대한 관심이 높아지면서 전기전도성과 자성을 동시에 지니는 자성반도체에 관한 연구가 다양하게 진행되어지고 있다. 특히 DMS (diluted magnetic semiconductor)는 상당한 관심을 가지고 많은 학자들에 의해 오랜 기간 연구되어져 왔고$^{1.3)}$ 특히, Matsumoto et al. $^{4.5)}$ 은 Co-doped anatase TiO$_2$ 박막을 LMBE (laser molecular beam epitaxy)로 제작하여 상온에서의 강자성을 발표한 바 있다. (중략)