• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.126.2-126.2
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• 2015

대표적인 금속 칼코지나이드 2차원 물질인 이황화 몰리브덴($MoS_2$)의 대면적 합성을 위해 화학적 기상 증착 (Chemical Vapor Deposition) 방법을 이용하였다. 몰리브덴을 포함한 $Mo(CO)_6$ 전구체와 황이 포함된 $H_2S$ 가스를 적절한 비율로 반응시켰고, 증착 속도를 조절하여 한 층부터 다섯 층까지의 얇은 $MoS_2$ 박막을 제작할 수 있었다. $MoS_2$ 박막들이 층별로 균일 하게 증착 되었는지 확인하기 위해 라만 분광법을 이용 하였고, x-선 분광법을 통해 몰리브덴과 황의 정확한 정량비를 알 수 있었다. 뿐만 아니라, 우리는 두께 의존성을 갖는 이차원 물질인 $MoS_2$ 각 층마다 나타나는 전자 구조적 특성 분석을 위해 자외선 분광법, 역광전자 분광법, 전자 에너지 손실 분광법을 사용하였다. 그 결과, $MoS_2$ 박막의 두께 별 일함수, 가전자대 최대값, 전도대 최소값, 밴드갭의 변화를 관찰할 수 있었다. 이는 기존 계산 결과와 비교하여 잘 일치함을 알 수 있다.

• Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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• 2000.11a
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• pp.406-413
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• 2000

The friction and wear behaviors of Magnetron Sputtered MoS$_2$films were investigated by using a pin on disk type tester which was designed and manufactured for this experiment. The experiment was conducted by using silicon nitride (Si$_3$N$_4$) as a pin material and Magnetron Sputtered MoS$_2$on bearing steel (STB2) as a disk material, under operating conditions that include different surface roughness (Polishing specimen, Grinding specimen)(2types), linear sliding velocities in the range of 22, 44, 66mm/sec (3types), normal loads vary from 9.8N, 19.6N, 29.4N(3types), corresponding to contact pressures of 1.9∼2.7GPa and atmospheric conditions of high vacuum( 1.3${\times}$10$\^$-4/Pa), medium vacuum( 1.3${\times}$10$\^$-l/Pa), ambient air(10$\^$5/Pa)(3types). We investigated fracture mechanism in magnetron sputtered MoS$_2$films with Magnetron Sputtering method in each experiment.

• Tribology and Lubricants
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• v.16 no.6
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• pp.409-414
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• 2000

The friction and wear behaviors of MoS$_2$ coatings were investigated by using a pin and disk type tester. The experiment was conducted by using silicon nitride as pin material and MoS$_2$-on-bearing steel as disk material under different operating conditions that include linear sliding velocities in the range of 22-66 ㎜/sec, normal loads varying from 9.8 N to 29.4 N, corresponding to maximum contact pressures of 1.18-2.83 GPa and atmospheric conditions of high vacuum, medium vacuum, ambient air. The results showed that low friction coefficient of the coating has been identified in high vacuum and that friction coefficient and wear volume increased with increasing normal load. Also at high load conditions, the friction coefficient and wear volume increased with increasing sliding velocity.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.194.1-194.1
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• 2014

기저면에 구조적 결함을 도입함으로써 그래핀과 $MoS_2$와 같은 이차원 결정의 물리, 화학, 전기 및 기계적 성질을 제어하려는 연구가 폭넓게 수행되고 있다. 본 연구에서는 플라즈마 속의 산소 래디컬을 이용하여 기계적 박리법으로 만들어진 단일층 그래핀과 $MoS_2$ 표면에 구조적 결함을 유도하고 제어하는 방법을 개발하였다. 라만 및 광발광 분광법을 통해 생성된 결함 밀도를 측정하고 전하 밀도 등의 화학적 변화를 추적하였다. 그래핀의 경우 산소 플라즈마 처리 시간에 따라 결함(defect)의 정도를 보여주는 라만 D-봉우리의 높이와 넓이가 커짐을 확인하였고 이를 G-봉우리의 높이와 비교하여 정량하였다. $MoS_2$의 경우 $E{^1}_{2g}$와 $A_{1g}$-봉우리의 높이가 점점 감소하고 광발광의 세기 또한 감소함을 확인하였다. 또한 본 연구에서는 기판의 편평도가 결함 생성 속도에 미치는 영향을 비교 및 분석하여 반응 메커니즘을 제시하고자 한다.

• Journal of the Korean institute of surface engineering
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• v.39 no.6
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• pp.263-267
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• 2006

As technology advances, there is a demand for development of hard solid lubricant coating. (Ti, Cr, Zr)N-$MoS_2$ films were deposited on AISI H13 tool steel substrate by co-deposition of $MoS_2$ with (Ti, Cr, Zr)N using a D.C. magnetron sputtering process. The influence of the $N_2Ar$ gas ratio, the amount of $MoS_2$ in the films and the bias voltage on the mechanical and structural properties of the films were investigated. The highest hardness level was observed at the $N_2/Ar$ gas ratio of 0.3. Hardness of the films did not change much with the increase of the $MoS_2$ content in the films. As the substrate bias potential was increased, hardness level of the film reached maximum at -150 V. Surface morphology of these films indicated that high hardness was attributed to the fine dome structure.

• Particle and aerosol research
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• v.13 no.2
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• pp.79-85
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• 2017

This study identified the loss of minimum fluidization velocity and pressure in accordance with the superficial velocity of $NiO/MoO_3/MoS_2$, a rare metallic oxide and high value-added material in the lab-scale fluidized bed reactor (L=0.25 m, D=0.05 m). The average pressure loss in L/D 1, 2, and 3 of $NiO/MoO_3/MoS_2$ within the scope of superficial gas velocity between 0.07 and 0.45 m/s based on the L/D 1, 2, and 3 of the specimen was shown to be 290~1952 Pa at decreasing flux and 253~1925 Pa at increasing flux. The comparison between the theoretical value proposed by Wen and the test data showed a difference between 0.021~0.36 magnification. Based on these results, this study was able to determine the operation conditions where rare metallic oxides could be applied in real phenomena.

• Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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• 2002.10b
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• pp.151-152
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• 2002

An oxidized surface layer was intentionally formed on a sputtered $MoS_2$ film by introducing oxygen gas in the final stage of sputtering process. The film showed longer life than the normal Ar-sputtered film when the surface layer was slightly oxidized. A XPS analysis revealed co-existence of $MoS_2$ and $MoO_3$ in the surface layer. suggesting that the existence of some amount of oxides in the surface layer had beneficial effect. A confusing result was obtained: the life was much shorter than normal Ar-sputtered film when the film was exposed to $O_2$ environment for 1 minute after normal Ar-sputtering, although almost no oxide was detected in XPS analysis.

• Proceeding of EDISON Challenge
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• 2014.03a
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• pp.478-482
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• 2014

Graphene have renewed considerable interest in inorganic, two-dimensional materials for future electronics. However, graphene does not have a bandgap, it is limited to apply directly to transistors and logic devices. Hence, other layered materials such as molybdenum disulphide ($MoS_2$) have been investigated to address this challenge. Here, we find that the nature of contacts plays a more important role than the semiconductor itself. In order to understand the nature of $MoS_2$/metal contacts, we perform density functional theory electronic structure calculations based on linear combination of atomic for the geometry, bonding, binding energy, PDOS, LDOS and electronic structure. We choose Au as a contact metal because it is the most common contact metal. In this paper, we demonstrate $MoS_2$/Au contacts have a more promising potential in flexible nanoelectronics than $MoS_2$ itself.

• Tribology and Lubricants
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• v.16 no.3
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• pp.173-181
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• 2000

Friction, wear and corrosion characteristics of various MoS$_2$ bonded film lubricants were investigated to apply them to automotive wheel joints. MoS$_2$ bonded film lubricants were formulated by combinations of several additives and binders, and they were coated onto the pre-treated surfaces of specimens. Friction and wear characteristics were evaluated with Falex pin & vee-block test and LFW-1 block-on-ring test. For the corrosion resistant characteristics of the films, salt solution spray corrosion tests were performed. Results showed that MoS$_2$ bonded films containing both inorganic and organic corrosion-resistant additives yielded a synergy effect on anti-corrosion resistance. Also, binders having the better water-proof and thermal stability showed the lower friction and higher corrosion resistance.

• Journal of the Korean institute of surface engineering
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• v.33 no.4
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• pp.266-272
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• 2000

Sputtered $MoS_2$ thin films provide lubrication and wear improvements for vacuum and space applications. In this study, deposition of $MoS_2$ thin films by R.F. magnetron sputtering was studied with regard to the micro-structural change of $MoS_2$ film and mechanical properties. The coating parameters such as the working pressure, the RF power, the substrate temperature, the etching time were varied to determine how these parameters affected the film morphology and mechanical properties of deposited films. The best wear properties and critical load were observed with the film deposited at $70^{\circ}C$, 1.0$\times$$10^{ -3}$ Torr, 170W and 1 hour deposition time. The critical load increased with the increase of sputter etching time.