• 제목/요약/키워드: Mo doping

검색결과 136건 처리시간 0.027초

Simulation of Source/Drain Doping Effects and Performance Analysis of MoS2 Transistor

  • Kim, Chul-min;Park, Il Hoo;Lee, Kook Jin
    • EDISON SW 활용 경진대회 논문집
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    • 제5회(2016년)
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    • pp.285-287
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    • 2016
  • 이황화 몰리브덴(Molybdenum disulfide: $MoS_2$)을 채널(Channel) 물질로 이용하여 metal-oxide-semiconductor(MOS) 구조를 제작하고, 효율적인 제작과정을 제시하였고 특히, Source/Drain의 Doping concentration을 조절하여 효과적인 $MoS_2$ Transistor를 제작 및 시뮬레이션 하였다. 그 후 여러 MOSFET의 특성 분석을 통하여 소자로서의 기능을 확인해보았다. 그리고 특히 채널의 전기적인 특성을 분석하고 채널 내 그리고 contact 사이의 저항 및 mobility의 특성을 알아보았는데, 그 중 Source/Drain Doping Effect와 performance 분석을 통해, 최적화된 $MoS_2$ Transistor를 찾아보았다.

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N- and P-doping of Transition Metal Dichalcogenide (TMD) using Artificially Designed DNA with Lanthanide and Metal Ions

  • Kang, Dong-Ho;Park, Jin-Hong
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.292-292
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    • 2016
  • Transition metal dichalcogenides (TMDs) with a two-dimensional layered structure have been considered highly promising materials for next-generation flexible, wearable, stretchable and transparent devices due to their unique physical, electrical and optical properties. Recent studies on TMD devices have focused on developing a suitable doping technique because precise control of the threshold voltage ($V_{TH}$) and the number of tightly-bound trions are required to achieve high performance electronic and optoelectronic devices, respectively. In particular, it is critical to develop an ultra-low level doping technique for the proper design and optimization of TMD-based devices because high level doping (about $10^{12}cm^{-2}$) causes TMD to act as a near-metallic layer. However, it is difficult to apply an ion implantation technique to TMD materials due to crystal damage that occurs during the implantation process. Although safe doping techniques have recently been developed, most of the previous TMD doping techniques presented very high doping levels of ${\sim}10^{12}cm^{-2}$. Recently, low-level n- and p-doping of TMD materials was achieved using cesium carbonate ($Cs_2CO_3$), octadecyltrichlorosilane (OTS), and M-DNA, but further studies are needed to reduce the doping level down to an intrinsic level. Here, we propose a novel DNA-based doping method on $MoS_2$ and $WSe_2$ films, which enables ultra-low n- and p-doping control and allows for proper adjustments in device performance. This is achieved by selecting and/or combining different types of divalent metal and trivalent lanthanide (Ln) ions on DNA nanostructures. The available n-doping range (${\Delta}n$) on the $MoS_2$ by Ln-DNA (DNA functionalized by trivalent Ln ions) is between $6{\times}10^9cm^{-2}$ and $2.6{\times}10^{10}cm^{-2}$, which is even lower than that provided by pristine DNA (${\sim}6.4{\times}10^{10}cm^{-2}$). The p-doping change (${\Delta}p$) on $WSe_2$ by Ln-DNA is adjusted between $-1.0{\times}10^{10}cm^{-2}$ and $-2.4{\times}10^{10}cm^{-2}$. In the case of Co-DNA (DNA functionalized by both divalent metal and trivalent Ln ions) doping where $Eu^{3+}$ or $Gd^{3+}$ ions were incorporated, a light p-doping phenomenon is observed on $MoS_2$ and $WSe_2$ (respectively, negative ${\Delta}n$ below $-9{\times}10^9cm^{-2}$ and positive ${\Delta}p$ above $1.4{\times}10^{10}cm^{-2}$) because the added $Cu^{2+}$ ions probably reduce the strength of negative charges in Ln-DNA. However, a light n-doping phenomenon (positive ${\Delta}n$ above $10^{10}cm^{-2}$ and negative ${\Delta}p$ below $-1.1{\times}10^{10}cm^{-2}$) occurs in the TMD devices doped by Co-DNA with $Tb^{3+}$ or $Er^{3+}$ ions. A significant (factor of ~5) increase in field-effect mobility is also observed on the $MoS_2$ and $WSe_2$ devices, which are, respectively, doped by $Tb^{3+}$-based Co-DNA (n-doping) and $Gd^{3+}$-based Co-DNA (p-doping), due to the reduction of effective electron and hole barrier heights after the doping. In terms of optoelectronic device performance (photoresponsivity and detectivity), the $Tb^{3+}$ or $Er^{3+}$-Co-DNA (n-doping) and the $Eu^{3+}$ or $Gd^{3+}$-Co-DNA (p-doping) improve the $MoS_2$ and $WSe_2$ photodetectors, respectively.

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Effects of metal contacts and doping for high-performance field-effect transistor based on tungsten diselenide (WSe2)

  • Jo, Seo-Hyeon;Park, Jin-Hong
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.294.1-294.1
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    • 2016
  • Transition metal dichalcogenides (TMDs) with two-dimensional layered structure, such as molybdenum disulfide (MoS2) and tungsten diselenide (WSe2), are considered attractive materials for future semiconductor devices due to its relatively superior electrical, optical, and mechanical properties. Their excellent scalability down to a monolayer based on the van der Waals layered structure without surface dangling bonds makes semiconductor devices based on TMD free from short channel effect. In comparison to the widely studied transistor based on MoS2, researchs focusing on WSe2 transistor are still limited. WSe2 is more resistant to oxidation in humid ambient condition and relatively air-stable than sulphides such as MoS2. These properties of WSe2 provide potential to fabricate high-performance filed-effect transistor if outstanding electronic characteristics can be achieved by suitable metal contacts and doping phenomenon. Here, we demonstrate the effect of two different metal contacts (titanium and platinum) in field-effect transistor based on WSe2, which regulate electronic characteristics of device by controlling the effective barreier height of the metal-semiconductor junction. Electronic properties of WSe2 transistor were systematically investigated through monitoring of threshold voltage shift, carrier concentration difference, on-current ratio, and field-effect mobility ratio with two different metal contacts. Additionally, performance of transistor based on WSe2 is further enhanced through reliable and controllable n-type doping method of WSe2 by triphenylphosphine (PPh3), which activates the doping phenomenon by thermal annealing process and adjust the doping level by controlling the doping concentration of PPh3. The doping level is controlled in the non-degenerate regime, where performance parameters of PPh3 doped WSe2 transistor can be optimized.

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$BaTiO_3$ 세라믹의 유전손실에 미치는 Mn 첨가의 영향 (Effect of Mn Addition on the Dielectric Loss characteristics of $BaTiO_3$ Ceramics)

  • 김태중;한주환;이재열;이희영
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 하계학술대회 논문집
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    • pp.436-439
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    • 2000
  • Change of dielectric loss of use in high relative permitivity capacitor BaTiO$_3$ ceramic depends on Mn doping have been investigated. The powders used in this study were commercial BaTiO$_3$, TiO$_2$and, MnCO$_3$. Sample was fabricated by conventional ceramic process. The quantity of Mn was changed gradually from 0.lmol% to 10mo1%. The sintering densities were reduced with increasing amount of MnCO$_3$. This result is because of increase of low density second phase BaMnO$_3$. When the samples were doped by over 0.2mol% of MnCO$_3$, average grain sizes were enlarge to several tens ${\mu}{\textrm}{m}$. The dielectric losses were reduced by Mn doping to lmol% but, increased from lmol% to 10mo1% gradually.

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전기방사방법에 의해 합성된 ZnO 중공 나노섬유의 trimethylamine 가스 감응 특성 (Trimethylamine Sensing Characteristics of Molybdenum doped ZnO Hollow Nanofibers Prepared by Electrospinning)

  • 김보영;윤지욱;이철순;박준식;이종흔
    • 센서학회지
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    • 제24권6호
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    • pp.419-422
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    • 2015
  • Pure and Mo-doped ZnO hollow nanofibers were prepared by single capillary electrospinning and their gas sensing characteristics toward 5 ppm ethanol, trimethylamine (TMA), CO and $H_2$ were investigated. The gas responses and responding kinetics were dependent upon sensing temperature and Mo doping. Mo-doped ZnO hollow nanofibers showed high response to 5 ppm TMA ($R_a/R_g=111.7$, $R_a$: resistance in air, $R_g$: resistance in gas) at $400^{\circ}C$, while the responses of pure ZnO hollow nanofibers was low ($R_a/R_g=47.1$). In addition, the doping of Mo enhanced selectivity toward TMA. The enhancement of gas response and selectivity to TMA by Mo doping to ZnO nanofibers was discussed in relation to the interaction between basic analyte gas and acidic additive materials.

Simulation of metal-semiconductor contact properties for high-performance monolayer MoS2 field effect transistor

  • 박지훈;우영준;서승범;최성율
    • EDISON SW 활용 경진대회 논문집
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    • 제5회(2016년)
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    • pp.299-304
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    • 2016
  • 2차원 반도체 소재의 경우 물질종류마다 내포하고 있는 고유결함에 의해서 Fermi-Level Pinning 이 발생하여 이로 인한 Schottky Barrier transistor로 동작을 하게 되며, 이는 접합부에 Carrier Injection 정도와 Schottky Barrier을 통과하는 Tunneling 정도에 의해서 소자의 특성이 결정 된다. 본 연구에서는 시뮬레이션을 통하여 2차원 반도체인 $MoS_2$소자를 설계하고, S/D Doping에 따라 접촉 저항 개선 효과와 소자의 동작특성이 어떠한 영향을 미치는지 연구하여 최대 $250cm^2/V{\cdot}sec$의 field effect mobility 의 결과를 얻었다. 또한 S/D doping 에 따라 각 저항 성분의 영향을 분석하였으며 면저항 및 접촉 저항 둘 다 doping 농도가 증가함에 따라 감소하는 결과를 나타내며, S/D doping의 영향은 접촉저항에서 더 크게 나타났다. 더불어 2차원 반도체의 Resistance network model 을 제안하여 subthreshold 영역에서는 $R_{ic}$, saturation 영역에서는 $R_{ish}$ 가 전체저항에서 주요한 변수로 전체저항식에 포함되어야 한다는 것을 시뮬레이션을 통해서 검증하였다.

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질소가 도핑된 DLC 막의 물성 조사 및 Mo-tip FEA 소자에의 응용 (Investigation of Physical Properties of N-doped DLC Film and Its Application to Mo-tip FEA Devices)

  • 주병권;정재훈;김훈;이윤희;이남양;오명환
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제48권1호
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    • pp.19-22
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    • 1999
  • N-doped and low-hydrogenated DLC thin films were coated on the Mo-tip FEAs in order to improve the field emission performance and their electrical properties were evaluated. The fabricated devices showed improved field emission performance in terms of turn-on voltage, emission current and current fluctuation. This result might be caused both by the shift of Fermi level toward conduction band by N-doping and by the inherent stability of DLC material. Furthermore, the transconductance of the DLC-coated Mo-tip FEA and electrical conductivity and optical band-gap of the deposited DLC films were investigated.

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Strategies to Induce Metastable T' Phase of Monolayer MoS2

  • 강성우
    • EDISON SW 활용 경진대회 논문집
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    • 제6회(2017년)
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    • pp.417-423
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    • 2017
  • Monolayer $MoS_2$의 metastable phase인 T' phase가 stable한 H phase보다 안정해지는 조건을 모색하기 위해 substitutional doping을 했을 때와 strain을 걸어주었을 때의 에너지 차이를 DFT 방법으로 계산하였다. Doping을 했을 때와 strain이 있을 때 T' phase와 H phase의 에너지 차이가 감소함을 확인하였으나 H phase보다 T' phase가 안정해지는 조건을 찾지는 못하였다. 하지만 이 방법을 기존의 alkali adsorption 방법과 병행하여 기존 방법의 단점을 보완할 수 있을 것을 기대해 볼 수 있다. 또한 전자구조 분석 중 얻은 dopant의 주기와 족에 따른 경향성은 다른 TMD 물질의 phase engineering을 design할 때 universal한 design rule로서 응용할 수 있음을 기대해 볼 수 있다.

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Mo 도핑을 이용한 NiCo LDH 나노결정의 산소발생반응 향상 (Enhancement of oxygen evolution reaction of NiCo LDH nanocrystals using Mo doping)

  • 조경원;유정호
    • 한국결정성장학회지
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    • 제34권3호
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    • pp.92-97
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    • 2024
  • 수소 생산을 위한 물 분해 시스템의 효율성을 높이려면 산소 발생 반응(OER, Oxygen Evolution Reaction)에서 촉매로 인해 발생하는 전기화학 반응의 높은 과전압을 감소시켜야 한다. 그중 전이금속을 포함하는 LDH(Layered Double Hydroxide)와 같은 화합물은 현재 사용되고 있는 백금 등의 귀금속을 대체할 수 있는 촉매 소재로 주목받고 있다. 본 연구에서는 저렴한 금속 다공성 물질인 니켈 폼을 지지체로 사용하였고, 수열합성 공정을 통해 NiCo LDH 나노결정을 합성하였다. 또한, OER 특성을 향상시키기 위해 Mo를 도핑하여 합성한 Mo 도핑된 NiCo LDH 나노결정 시료의 형태, 결정구조, 물분해 특성의 변화를 관찰하였다.

The Enhanced Magnetic Transition Temperature in Double Perovskites A2FeMoO6 (A=Ca, Sr and Ba) : Electron Doping Effects

  • Kim J.;Yang H. M.;Lee B. W.
    • Journal of Magnetics
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    • 제10권1호
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    • pp.10-13
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    • 2005
  • We have studied effects of the partial substitution of $La^{3+}$ for $A^{2+}$ on the magnetic properties of double perovskites $A_2FeMoO_6$ (A=Ca, Sr and Ba). Polycrystalline $A_{2-x}La_xFeMoO_6(0{\leq}x{\leq}0.2)$ samples have been prepared by the conventional solid-state reaction in a stream of 5% $H_2$/Ar gas. The x-ray data indicate that A=Ca is monoclinic with the space group P$2_1$/n, A=Sr is tetragonal with the space group I4/mmm, and A=Ba is cubic with the space group Fm3m. The substitution of $La^{3+}$ for $A^{2+}$ results in a cell volume increase for A=Ca and a cell volume reduction for A=Ba. The decrease of saturation magnetization with increasing x arises from the reduction of magnetic moment associated with the electron doping and the disorder at the Fe and Mo sites. The partial substitution of magnetic $La^{3+}$ for $A^{2+}$ considerably enhances the Curie temperature $T_c$ from 316 K for x = 0 to 334 K for x = 0.2. This enhancement of $T_c$ with $La^{3+}$ doping originates from electron doping effects in addition to ionic size ones.