• 한국정밀공학회지
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• 제30권6호
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• pp.596-600
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• 2013

We report here on the processing and manufacturing of thin film for printed electronics by micro-gravure coating system. The micro-gravure coating systems are consisted of various modules such as web and system tension controller, micro-gravure coating units, dispenser and hybrid dry units (UV, NIR, Hot air). Especially, for the optimization of system, the number of idle roller was minimized and tension isolating infeeder was included. Also, we applied four patterns circle, 45 degree, square and 35 degree for the optimizing coating thickness. The micro-gravure coating system which applied various patterns to enable continuous coating process and fast coating time compare with conventional batch coating system. In this paper, introduce of micro-gravure coating system and testing results of coating thickness (20~700nm), coating time (1~2sec) and surface roughness (3~12nm) by using micro-gravure coating system.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2008년도 추계학술대회A
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• pp.1098-1102
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• 2008

To increase the ink transfer rate in the micro-gravure-offset printing, the liquid transfer process between two separating plates is investigated. During the liquid transfer process, in which one plate is fixed and the other one moves vertically, a sessile droplet is separated into two droplets. The volume ratio of the two droplets depends on the contact angles of the two plates. In a numerical study of the ink transfer processes, liquid transfer between two parallel separating plates and between a trapezoidal cavity and an upward moving plate are simulated, as models of the printing of ink from the offset pad onto the substrate and the picking up of ink from the gravure plate by the offset pad, respectively. Also, in experimental study, to obtain various surface contact angles, chemical treatment, plasma treatment, and electrowetting- on-dielectric (EWOD) surface are considered. The transfer rate between two plates is calculated by analyzing the droplet images. From the results, the optimal surface contact angles of the units of the micro-gravure-offset printing can be characterized.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2012년도 춘계학술대회 논문집
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• pp.473-474
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• 2012

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2008년도 추계학술대회 논문집
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• pp.717-718
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• 2008

• 한국정밀공학회지
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• 제25권5호
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• pp.96-102
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• 2008

Manufacturing of printed electronics using printing technology has begun to get into the hot issue in many ways due to the low cost effectiveness to existing semi-conductor process. This technology, with low cost and high productivity, can make it possible to produce printed electronics such as TFT, solar cell, RFID Tag, printed battery, and so on. In this study, apparatus of gravure-offset printing are developed for fine line-width/gap printing and the results obtained from the apparatus shows that it is possible to make around 20 micro-meter line-width/gap printing patterns. The roll-to-roll printing system for fine line-width printing based on primary experiment is presented. The printing results obtained from the system shows around 30 micro-meter line-width/gap printing patterns.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2008년도 춘계학술대회 논문집
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• pp.961-962
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• 2008

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2001년도 추계학술대회 논문집
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• pp.186-189
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• 2001

The main method in micro-etching process, used in manufacturing semiconductors, electronic components, circuits, is Photo Masking method that exposes and develops on the photo-sensitivity solutions or films. This method enables one to process highly precisely, $\pm$0.03 mm in end line location area. But this has limits in a high speed / wide width process, difficulties in endless masking, and the problem of high price. We have developed the direct masking method to make use of Gravure printing, widely used in grocery packing sheet printing. We made cylinder tools to influence the masking quality by laser stream process. We have confirmed that the end line location accuracy in the line width of the product is improved from 0.12 mm to $\pm$0.07 mm level, after etching process.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2007년도 춘계학술대회A
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• pp.461-466
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• 2007

There has been a great interest in printing technology as a low cost and mass production method for the application of printed electronics such as printed TFT, solar cell, RFID Tag, printed battery, and so on. In this study, apparatuses of gravure-offset printing are developed for fine line-width/gap printing and examining pattern distortion occurred in gravure-offset printing process. The fine line-width/gap pattern shows that it is possible to make around 20 micro-meter line-width/gap printing patterns. Pattern distortion is modeled, and the amount and shape of the distortion are calculated by using commercial FEM code. The roll-to-roll printing system under development consists of unwinder/rewinder, two printing units, one coating unit, drying units, guiding unit, vision system, and other auxiliary devices. For multi-layer printing, the system is designed to be capable of printing two different materials.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2013년도 춘계학술대회 논문집
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• pp.163-164
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• 2013

• 대한기계학회논문집A
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• 제34권3호
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• pp.263-271
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• 2010

e-Printing은 전통 인쇄 기술을 기반으로 하는 전자소자를 생산하기위한 새로운 기술이다. 이러한 인쇄 전자 소자들은 가격을 낮추기 위하여 대면적 인쇄가 요구된다. 이렇듯 원가를 절감하며 전자 소자에 요구되는 정밀도를 충족하기 위하여 롤투롤(Roll to Roll) 방식의 그라비아(Gravure) 인쇄 시스템이 하나의 대안으로 제시된다. 그라비아 인쇄에는 인쇄 전자 소자의 성능에 영향을 미치는 요소들이 매우 많다 : 건조 방식, 건조 온도, 운전 장력, 인쇄 속도, 잉크 점도, 잉크의 전도성, 망점 및 패턴의 정밀도. 이상에서 언급한 요소들은 각각 매우 밀접한 관계를 가지고 있다. 따라서 인쇄 전자소자의 성능을 향상시키기 위해서는 반듯이 인쇄 적합조건을 찾아야만 한다. 본 논문에서는, 전도성 잉크 및 그라이아 인쇄기를 사용하여 다양한 요소의 조건을 변화하여 패턴(선 및 면)을 인쇄하였으며, 각 인쇄 요소의 변화가 인쇄 전자소자의 성능에 미치는 영향에 관하여 분석 및 연구를 수행하였다.