• Title/Summary/Keyword: Micro Multi-Square Structure

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A Study on the Injection Molding Technology by Micro Multi-Square Strucrure Mold (다중 미세 각주 구조물의 사출성형기술 연구)

  • 제태진;신보성;박순섭
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 1997.10a
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    • pp.1061-1064
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    • 1997
  • Micro injection molding technology is very important fiw mass product of micro structures or micro parts. And, it is so difficult that the molding technology of micro pole or thin wall(barrier rib) structures with high aspect ratio. In this stud). \vc intend to research on the basic technology of micro wall structure part:< with high aspect ratio by the inject~on moldins method. The mold for esperimenrs with micro multi-square structures was made by L, I(;A process. One square polc's size is 157 157pm. height 50011111. And the distance of each poles is 5011n1. 7'hus. molding products will be for~nctl like as the net structure with thin wall of about 50pn thickness.(aspect ratio 10) Ihrough the e~lxriment. \be obtained the prociuctr of micro multi-square slructure with bout 37.000 cell per a piece. 'Ihe micro injection molding process technolog for thin wall by multi-square structure mold was analy~cd.

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A study of planarization in polysilicon MEMS structure (폴리실리콘 MEMS 구조물의 평탄화에 관한 연구)

  • Jeong, Moon-Ki;Park, Sung-Min;Jung, Jae-Woo;Jeong, Hae-Do;Kim, Hyoung-Jae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.11a
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    • pp.362-363
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    • 2005
  • The objectives of this paper are to achieve good planarization of the deposited film and to improve deposition efficiency of multi-layer structures by using surface-micromaching process in MEMS technology. Planarization characteristic of poly-Si film deposited on thin oxide layer with MEMS structures is evaluated with different slurries. Patterns used for this research have shapes of square, density, line, hole, pillar, and micro engine part. Advantages and disadvantages of CMP for MEMS structures are observed respectively by using the test patterns with structures larger than 1 um line width. Preliminary tests for material selectivity of poly-Si and oxide are conducted with two types of slurries: ILD1300 and Nalco2371. And then, the experiments were conducted based on the pretest.

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