• 제목/요약/키워드: Micro/Nano Fabrication

검색결과 239건 처리시간 0.028초

Ti-Al-Si-N 박막 제작을 위한 합금 타겟 제조 및 박막의 기계적 특성 (Fabrication of Alloy Target for Formation of Ti-Al-Si-N Composite Thin Film and Their Mechanical Properties)

  • 이한찬
    • 한국전기전자재료학회논문지
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    • 제29권10호
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    • pp.665-670
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    • 2016
  • Prevailing dissemination of machine tools and cutting technology have caused drastic developments of high speed dry machining with work materials of high hardness, and demands on the high-hardness-materials with high efficiency have become increasingly important in terms of productivity, cost reduction, as well as environment-friendly issue. Addition of Si to TiAlN has been known to form nano-composite coating with higher hardness of over 30 GPa and oxidation temperature over $1,000^{\circ}C$. However, it is not easy to add Si to TiAlN by using conventional PVD technologies. Therefore, Ti-Al-Si-N have been prepared by hybrid process of PVD with multiple target sources or PVD combined with PECVD of Si source gas. In this study, a single composite target of Ti-Al-Si was prepared by powder metallurgy of MA (mechanical alloying) and SPS (spark plasma sintering). Properties of he resulting alloying targets were examined. They revealed a microstructure with micro-sized grain of about $1{\sim}5{\mu}m$, and all the elements were distributed homogeneously in the alloying target. Hardness of the Ti-Al-Si-N target was about 1,127 Hv. Thin films of Ti-Al-Si-N were prepared by unbalanced magnetron sputtering method by using the home-made Ti-Al-Si alloying target. Composition of the resulting thin film of Ti-Al-Si-N was almost the same with that of the target. The thin film of Ti-Al-Si-N showed a hardness of 35 GPa and friction coefficient of 0.66.

Growth and characterization of periodically polarity-inverted ZnO structures grown on Cr-compound buffer layers

  • Park, J.S.;Goto, T.;Hong, S.K.;Chang, J.H.;Yoon, E.;Yao, T.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.259-259
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    • 2010
  • Periodically polarity inverted (PPI) ZnO structures on (0001) Al2O3 substrates are demonstrated by plasmas assisted molecular beam epitaxy. The patterning and re-growth methods are used to realize the PPI ZnO by employing the polarity controlling method. For the in-situ polarity controlling of ZnO films, Cr-compound buffer layers are used.[1, 2] The region with the CrN intermediate layer and the region with the Cr2O3 and Al2O3 substrate were used to grow the Zn- and O-polar ZnO films, respectively. The growth behaviors with anisotropic properties of PPI ZnO heterostructures are investigated. The periodical polarity inversion is evaluated by contrast images of piezo-response microscopy. Structural and optical interface properties of PPI ZnO are investigated by the transmission electron microcopy (TEM) and micro photoluminescence ($\mu$-PL). The inversion domain boundaries (IDBs) between the Zn and the O-polar ZnO regions were clearly observed by TEM. Moreover, the investigation of spatially resolved local photoluminescence characteristics of PPI ZnO revealed stronger excitonic emission at the interfacial region with the IDBs compared to the Zn-polar or the O-polar ZnO region. The possible mechanisms will be discussed with the consideration of the atomic configuration, carrier life time, and geometrical effects. The successful realization of PPI structures with nanometer scale period indicates the possibility for the application to the photonic band-gap structures or waveguide fabrication. The details of application and results will be discussed.

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Fabrication of Viewing Angle Direction Brightness-Enhancement Optical Films using Surface Textured Silicon Wafers

  • Jang, Wongun;Shim, Hamong;Lee, Dong-Kil;Park, Youngsik;Shin, Seong-Seon;Park, Jong-Rak;Lee, Ki Ho;Kim, Insun
    • Journal of the Optical Society of Korea
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    • 제18권5호
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    • pp.569-573
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    • 2014
  • We demonstrate a low-cost, superbly efficient way of etching for the nano-, and micro-sized pyramid patterns on (100)-oriented Si wafer surfaces for use as a patterned master. We show a way of producing functional optical films for the viewing angle direction brightness-enhancement of Lambertian LED (light emitting diode)/OLED (organic light emitting diode) planar lighting applications. An optimally formulated KOH (Potassium hydroxide) wet etching process enabled random-positioned, and random size-distributed (within a certain size range) pyramid patterns to be developed over the entire (100) silicon wafer substrates up to 8" and a simple replication process of master patterns onto the PC (poly-carbonate) and PMMA (poly-methyl methacrylate) films were performed. Haze ratio values were measured for several film samples exhibiting excellent values over 90% suitable for LED/OLED lighting purposes. Brightness was also improved by 13~14% toward the viewing angle direction. Computational simulations using LightTools$^{TM}$ were also carried out and turned out to be in strong agreement with experimental data. Finally, we could check the feasibility of fabricating low-cost, large area, high performance optical films for commercialization.

전기분사를 이용한 의료용 금속 임플란트의 생분해성 PLGA 고분자 코팅 (Biodegradable PLGA Polymer Coating on Biomedical Metal Implants Using Electrospraying)

  • 조성배;박철호;박귀덕;정동준;한동근
    • 폴리머
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    • 제33권6호
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    • pp.620-624
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    • 2009
  • 의료용 금속 임플란트는 우수한 기계적 강도를 바탕으로 결손된 신체 부위의 보강, 대치, 회복을 위해 임상적으로 사용되고 있지만, 낮은 생체적합성 및 독성 때문에 염증 및 후기 혈전증, 재협착의 문제점을 가지고 있다. 이런 단점을 보안하기 위한 다양한 표면처리 기술 중, 본 연구에서는 금속표면에 생분해성 고분자인 poly (lactic-co-glycolic acid) (PLGA)를 이용하여 전기분사 코팅(electrospray coating) 기술을 검토하였다. 전기분사와 용액 인자들의 기초적인 조사를 바탕으로, 코팅 필름의 표면형상은 방울이 날아가는 거리, 용매의 비등점, 방울의 크기에 밀접한 관련이 있다. 고분자 필름의 두께는 분사량에 선형적으로 비례를 하였다. 이 결과는 전기분사된 고분자 방울이 계속적으로 고분자 필름 위에 적층되는 것을 보여준다. 따라서, 전기분사 코팅기술은 스텐트와 같은 의료용 금속 임플란트에 있어서 표면 형상 조절, 나노/마이크로 두께의 단/다중층의 고분자 필름을 제조하는데 적용될 수 있다.

Investigating vibration behavior of smart imperfect functionally graded beam subjected to magnetic-electric fields based on refined shear deformation theory

  • Ebrahimi, Farzad;Jafari, Ali
    • Advances in nano research
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    • 제5권4호
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    • pp.281-301
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    • 2017
  • In this disquisition, an exact solution method is developed for analyzing the vibration characteristics of magneto-electro-elastic functionally graded (MEE-FG) beams by considering porosity distribution and various boundary conditions via a four-variable shear deformation refined beam theory for the first time. Magneto-electroelastic properties of porous FG beam are supposed to vary through the thickness direction and are modeled via modified power-law rule which is formulated using the concept of even and uneven porosity distributions. Porosities possibly occurring inside functionally graded materials (FGMs) during fabrication because of technical problem that lead to creation micro-voids in FG materials. So, it is necessary to consider the effect of porosities on the vibration behavior of MEE-FG beam in the present study. The governing differential equations and related boundary conditions of porous MEE-FG beam subjected to physical field are derived by Hamilton's principle based on a four-variable tangential-exponential refined theory which avoids the use of shear correction factor. An analytical solution procedure is used to achieve the natural frequencies of porous-FG beam supposed to magneto-electrical field which satisfies various boundary conditions. A parametric study is led to carry out the effects of material graduation exponent, porosity parameter, external magnetic potential, external electric voltage, slenderness ratio and various boundary conditions on dimensionless frequencies of porous MEE-FG beam. It is concluded that these parameters play noticeable roles on the vibration behavior of MEE-FG beam with porosities. Presented numerical results can be applied as benchmarks for future design of MEE-FG structures with porosity phases.

나노리소그라피 기술을 이용한 초소수성 불소 실란 분자의 나노패턴 제조 (Fabrication of Superhydrophobic molecules Nanoarray by Dip-pen Nanolithography)

  • 연경흠;강필선;김경민;임정혁
    • 접착 및 계면
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    • 제19권4호
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    • pp.163-166
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    • 2018
  • 이 딥펜 나노리소그라피(DPN)는 원자 힘 현미경(AFM)을 기반으로 하는 나노 및 마이크로 패턴 제조 기술이다. 다양한 잉크 물질을 AFM 탐침에 코팅하여 탐침과 기판 사이에 형성된 물 메니스커스를 통해 기판으로 전이시켜 패턴을 제조한다. 본 연구에서는, 실란 전처리된 AFM 탐침 표면에 불소 실란 잉크 용액을 코팅하고 하이드록시기로 개질된 실리콘 기판 위에 접촉시킨 후, DPN 기술을 이용하여 표면으로 잉크 물질을 전이시키는 연구를 진행하였다. HDFDTMS 잉크 물질의 dot 어레이 패턴을 안정적으로 제조하였으며, AFM 탐침과 기판 사이의 접촉시간에 따라 패턴 크기가 선형적으로 증가하는 전형적인 DPN의 확산 메커니즘을 보였다.

초고속 원심방사에 의한 아세트산프로피온산 셀룰로오스/폴리부틸렌 숙시네이트 다공성 마이크론 섬유 제조 (Fabrication of Porous Cellulose Acetate Propionate/Polybutylene Succinate Microfibers by High Speed Centrifugal Spinning)

  • 김태영;김미경;김진수;이정언;정재훈;김영권;김태현;김기영;염정현
    • 한국염색가공학회지
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    • 제35권4호
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    • pp.239-245
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    • 2023
  • Cellulose is an abundant biodegradable material in nature with excellent properties, but due to its poor processability, it has been widely studied for processing through modification. Cellulose acetate propionate (CAP) is a cellulose derivative in which the hydroxyl group of cellulose is replaced by acetyl and propionyl groups. CAP has several advantages, such as excellent solubility, structural stability, light and weather resistance, and good transparency. Porous nanofibers with excellent specific surface area, which can be applied in various fields, can be easily formed by the phase separation method using highly volatile solvents. High speed centrifugal spinning is a nano/micro fiber preparation method with advantages such as fast spinning and easy alignment control. In this study, a CAP/polybutylene succinate (PBS) spinning solution with chloroform as solvent was prepared to prepare porous microfibers and the fiber morphology was examined as a function of the disk rotation speed in an high speed centrifugal spinning device.

전자빔 증착을 위한 소결체 지르코니아의 열충격 저항성 연구 (A Study on the Thermal Shock Resistance of Sintered Zirconia for Electron Beam Deposition)

  • 오윤석;한윤수;채정민;김성원;이성민;김형태;안종기;김태형;김동훈
    • 한국추진공학회지
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    • 제19권3호
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    • pp.83-88
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    • 2015
  • 열차폐 코팅(Thermal Barrier Coating) 기술의 하나로 연구되는 전자빔(EB, Electron Beam) 증착에 사용되는 코팅재료는 증착 공정 중에 고출력의 전자빔이 조사되기 때문에, 균일코팅을 위해서는 증착 중 코팅재료의 형상유지 및 안정한 융탕 형성이 필요하며, 이를 위해 적절한 밀도와 미세구조를 갖춘 잉곳(Ingot) 형태의 코팅소스가 요구된다. 본 연구에서는 8 wt%의 이트리아($Y_2O_3$)가 안정화제로 첨가된 지르코니아(8YSZ) 조성을 활용하여, 고출력 전자빔 조사환경에 사용가능한 잉곳제조를 위해 최적의 원료분말 조건을 확보하고자 하였다. 제조된 잉곳시료들에 대한 전자빔 조사 시, 수십 마이크론과 수십 나노 크기의 입자들로 구성된 혼합형 분말로 제조된 잉곳의 경우, 나노크기의 분말만으로 제조된 경우보다 향상된 열충격 저항성을 보였다.

표면 부조 홀로그램 마스크를 이용한 내부전반사 홀로그래픽 노광기술 (TIR Holographic lithography using Surface Relief Hologram Mask)

  • 박우제;이준섭;송석호;이성진;김태현
    • 한국광학회지
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    • 제20권3호
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    • pp.175-181
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    • 2009
  • 내부전반사 홀로그래픽 노광 기술은 넓은 면적(6")을 아주 미세하게($0.35{\mu}m$) 노광할 수 있는 차세대 광 노광 기술로서 평가받고 있다. 기존의 광 노광 기술은 $1.5{\mu}m/6}$ 이상이 가능한 (LCD용 노광기)과 $0.2{\mu}m/1.5"$ 이하(반도체용 노광기)의 패턴을 노광할 수 있도록 양분되어 발전하여 왔다. 이에 반하여 내부전반사 홀로그래픽 노광 기술은 일괄 노광 면적은 6"로 유지하면서 $0.35{\mu}m$에서 $1.5{\mu}m$의 사이의 패턴을 구현할 수 있는 특별한 능력을 갖고 있다. 이는 기존 광 노광 방식에서 반드시 필요로 하는 결상 광학계를 사용하지 않고 홀로그램 마스크를 사용하기 때문이다. 본 논문에서는 내부전반사 홀로그래픽 노광 기술의 핵심기술인 홀로그램 마스크를 표면 부조 홀로그램 형태로 구현할 수 있는 핵심 인자가 무엇인지를 분석하여 최적화 하는 방법에 대해 논하고, 이를 이용하여 노광한 미세패턴에 대한 결과를 실험적으로 평가하였다.