• Title/Summary/Keyword: MgO layer

Search Result 593, Processing Time 0.05 seconds

Study on working gas ratio dependance of BST thin film (작업가스비에 따른 BST 박막의 특성)

  • Cui, Ming-Lu;Kwon, Hak-Yong;Park, In-Chul;Kim, Hong-Bae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2004.07a
    • /
    • pp.393-396
    • /
    • 2004
  • 본 논문에서는 완충층용 MgO 박막을 P-type(100)Si 기판위에 작업가스 $Ar:O_2=80:20$, RF 파워 50W, 기판온도 $400^{\circ}C$, 10mtorr의 작업진공에서 $500{\AA}$ 증착하였다. 제작된 MgO/Si 기판위에 RF Magnetron sputtering법으로 작업가스 $Ar:O_2$의 비율을 90:10, 80:20, 70:30으로 변화하면서 $BST(Ba_{0.5}Sr_{0.5}TiO_3)$ 박막을 약 $2000{\AA}$ 증착하였다. XRD 측정결과 작업가스비의 변화에 관계없이(110)BST와 (111)BST 피크만이 관찰되었으며 작업가스 $Ar:O_2=80:20$에서 가장 양호한 결정성을 나타내었다. I-V 측정결과 인가전계 ${\pm}100kV/cm$에서 $10^{-7}A/cm^2$이하의 양호한 누설전류 특성을 보여주고 있으며 C-V 측정결과 작업가스 $Ar:O_2$의 비율 90:10, 80:20, 70:30에서의 비유전율은 각각 283, 305, 296으로서 작업가스비 80:20에서 제작된 박막의 특성이 가장 우수하였다. 작업가스비 80:20에서 제작된 박막의 SEM 측정결과 결정이 성장되었음을 확인할 수 있었고 그레인의 크기는 약 10nm였다.

  • PDF

Self-forming Barrier Process Using Cu Alloy for Cu Interconnect

  • Mun, Dae-Yong;Han, Dong-Seok;Park, Jong-Wan
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2011.02a
    • /
    • pp.189-190
    • /
    • 2011
  • Cu가 기존 배선물질인 Al을 대체함에 따라 resistance-capacitance (RC) delay나 electromigration (EM) 등의 문제들이 어느 정도 해결되었다. 그러나 지속적인 배선 폭의 감소로 배선의 저항 증가, EM 현상 강화 그리고 stability 악화 등의 문제가 지속적으로 야기되고 있다. 이를 해결하기 위한 방법으로 Cu alloy seed layer를 이용한 barrier 자가형성 공정에 대한 연구를 진행하였다. 이 공정은 Cu 합금을 seed layer로 사용하여 도금을 한 후 열처리를 통해 SiO2와의 계면에서 barrier를 자가 형성시키는 공정이다. 이 공정은 매우 균일하고 얇은 barrier를 형성할 수 있고 별도의 barrier와 glue layer를 형성하지 않아 seed layer를 위한 공간을 추가로 확보할 수 있는 장점을 가지고 있다. 또한, via bottom에 barrier가 형성되지 않아 배선 전체 저항을 급격히 낮출 수 있다. 합금 물질로는 초기 Al이나 Mg에 대한 연구가 진행되었으나, 낮은 oxide formation energy로 인해 SiO2에 과도한 손상을 주는 문제점이 제기되었다. 최근 Mn을 합금 물질로 사용한 안정적인 barrier 형성 공정이 보고 되고 있다. 하지만, barrier 형성을 하기 위해 300도 이상의 열처리 온도가 필요하고 열처리 시간 또한 긴 단점이 있다. 본 실험에서는 co-sputtering system을 사용하여 Cu-V 합금을 형성하였고, barrier를 자가 형성을 위해 300도에서 500도까지 열처리 온도를 변화시키며 1시간 동안 열처리를 실시하였다. Cu-V 공정 조건 확립을 위해 AFM, XRD, 4-point probe system을 이용하여 표면 거칠기, 결정성과 비저항을 평가하였다. Cu-V 박막 내 V의 함량은 V target의 plasma power density를 변화시켜 조절 하였으며 XPS를 통해 분석하였다. 열처리 후 시편의 단면을 TEM으로 분석하여 Cu-V 박막과 SiO2 사이에 interlayer가 형성된 것을 확인 하였으며 EDS를 이용한 element mapping을 통해 Cu-V 내 V의 거동과 interlayer의 성분을 확인하였다. PVD Cu-V 박막은 기판 온도에 큰 영향을 받았고, 200 도 이상에서는 Cu의 높은 표면에너지에 의한 agglomeration 현상으로 거친 표면을 가지는 박막이 형성되었다. 7.61 at.%의 V함량을 가지는 Cu-V 박막을 300도에서 1시간 열처리 한 결과 4.5 nm의 V based oxide interlayer가 형성된 것을 확인하였다. 열처리에 의해 Cu-V 박막 내 V은 SiO2와의 계면과 박막 표면으로 확산하며 oxide를 형성했으며 Cu-V 박막 내 V 함량은 줄어들었다. 300, 400, 500도에서 열처리 한 결과 동일 조성과 열처리 온도에서 Cu-Mn에 의해 형성된 interlayer의 두께 보다 두껍게 성장 했다. 이는 V의 oxide formation nergyrk Mn 보다 작으므로 SiO2와의 계면에서 산화막 형성이 쉽기 때문으로 판단된다. 또한, V+5 이온 반경이 Mn+2 이온 반경보다 작아 oxide 내부에서 확산이 용이하며 oxide 박막 내에 여기되는 전기장이 더 큰 산화수를 가지는 V의 경우 더 크기 때문으로 판단된다.

  • PDF

Inhibition of Escherichia coli O157:H7 Attachment by Interactions Between Lactic Acid Bacteria and Intestinal Epithelial Cells

  • Kim, Young-Hoon;Kim, Sae-Hun;Whang, Kwang-Youn;Kim, Young-Jun;Oh, Se-Jong
    • Journal of Microbiology and Biotechnology
    • /
    • v.18 no.7
    • /
    • pp.1278-1285
    • /
    • 2008
  • The intestinal epithelial cell (IEC) layer of the intestinal tract makes direct contact with a number of microbiota communities, including bacteria known to have deleterious health effects. IECs possess innate protective strategies against pathogenic challenge, which primarily involve the formation of a physicochemical barrier. Intestinal tract mucins are principal components of the mucus layer on epithelial surfaces, and perform a protective function against microbial damage. However, little is currently known regarding the interactions between probiotics/pathogens and epithelial cell mucins. The principal objective of this study was to determine the effects of Lactobacillus on the upregulation of MUC2 mucin and the subsequent inhibition of E. coli O157:H7 attachment to epithelial cells. In the current study, the attachment of E. coli O157:H7 to HT-29 intestinal epithelial cells was inhibited significantly by L. acidophilus A4 and its cell extracts. It is also important to note that the expression of MUC2 mucin was increased as the result of the addition of L. acidophilus A4 cell extracts (10.0 mg/ml), which also induced a significant reduction in the degree to which E. coli O157:H7 attached to epithelial cells. In addition, the mRNA levels of IL-8, IL-1$\beta$, and TNF-$\alpha$ in HT-29 cells were significantly induced by treatment with L. acidophilus A4 extracts. These results indicate that MUC2 mucin and cytokines are important regulatory factors in the immune systems of the gut, and that selected lactobacilli may be able to induce the upregulation of MUC2 mucin and specific cytokines, thereby inhibiting the attachment of E. coli O157:H7.

A Study on the Al2O3 Thin Film According to ALD Argon Purge Flow Rate and Application to the Encapsulation of OLED (ALD 아르곤 퍼지유량에 따른 Al2O3박막 분석 및 유기발광 다이오드 봉지막 적용에 관한 연구)

  • DongWoon Lee;Ki Rak Kim;Eou Sik Cho;Yong-min Jeon;Sang Jik Kwon
    • Journal of the Semiconductor & Display Technology
    • /
    • v.22 no.1
    • /
    • pp.23-27
    • /
    • 2023
  • Organic light-emitting diode(OLED) is very thin organic films which are hundreds of nanometers. Unlike bottom-emission OLED(BEOLED), top-emission OLED(TEOLED) emits light out the front, opaque moisture absorbents or metal foils can't be used to prevent moisture and oxygen. And it is difficult to have flexible characteristics with glass encapsulation, so thin film encapsulation which can compensate for those two disadvantages is mainly used. In this study, Al2O3 thin films by atomic layer deposition(ALD) were examined by changing the argon gas purge flow rate and we applied this Al2O3 thin films to the encapsulation of TEOLED. Ag / ITO / N,N'-Di-[(1-naphthyl)-N,N'-diphenyl]-1,1'-biphenyl-4,4'-diamine / tris-(8-hydroxyquinoline) aluminum/ LiF / Mg:Ag (1:9) were used to fabricate OLED device. The characteristics such as brightness, current density, and power efficiency are compared. And it was confirmed that with a thickness of 40 nm Al2O3 thin film encapsulation process did not affect OLED properties. And it was enough to maintain a proper OLED operation for about 9 hours.

  • PDF

Distribution of Various Nitrogenous Compounds and Respiratory Oxygen Consumption Rate in Masan Bay, Korea During Summer 1986 (1986년 하계 마산만의 각종 질소화합물분포와 산소소비율에 대한 연구)

  • YANG, DONG-BEOM
    • 한국해양학회지
    • /
    • v.27 no.4
    • /
    • pp.303-310
    • /
    • 1992
  • Studies on the distribution of nitrogenous compounds, and respiratory oxygen consumption rate were carried out in Masan Bay, Korea where large amount of industrial and domestic wastewaters are discharged. In August 1986 the surface layer was significantly influenced by freshwater input. Below the seasonal pycnocline, an oxygen-deficient condition developed in a large area of Masan Bay. Concentrations of DIN, DON and PN were 735.6, 1261.8 and 48.5 umol/l at the head, and 79.1, 73.0 and 39.5 umol/l at the mouth of the inner Masan Bay, respectively. Phytoplankton carbon production was 2,695 mgC/m$^2$/day at the mouth of inner Masan Bay. Dissolved oxygen contents were lower than 1 ml/l from 3 m depth in inner Masan Bay and from 10 m depth in the outer Masan Bay. The high concentration of ammonium and phosphate in the lower layer suggests the active degradation of organic materials in the bottom waters and leaching from sediments. The ERS activity was 232.1 ul O$_2$/l/h in the surface waters of the innermost part of Masan Bay and respiratory oxygen consumption is likely to proceed at a rate of 442 ml O$_2$/m$^2$/day in the bottom waters of this bay. Nitrate removal rate was estimated to be 0.25 umol/l/day via denitrification in the bottom waters of the Masan Waterway. It is estimated from the ETS activity that, at the mouth of inner Masan Bay, 9.3-10.5% of carbon fixed in the upper layer was decomposed below the themocline.

  • PDF

Microstructure and Corrosion Properties of Plasma Electrolytic Oxide Coatings on AZ31 Magnesium Matrix Composite (플라즈마 전해 산화 처리한 AZ31 및 Al18B4O33w/AZ31 마그네슘 복합재료 피막의 미세구조 및 부식특성)

  • Cheon, Jinho;Park, Yongho;Park, Ikmin
    • Korean Journal of Metals and Materials
    • /
    • v.49 no.3
    • /
    • pp.270-274
    • /
    • 2011
  • Plasma electrolytic oxidation (PEO) treatment was performed on squeeze cast AZ31 alloy and $Al_{18}B_4O_{33}w/AZ31$ composite. Scanning electron microscope (SEM) was employed to characterize the surface morphology and cross-section microstructure of the coating. The phase structures of the PEO coating were analyzed by X-ray diffraction (XRD). The corrosion resistance of the PEO coating was evaluated by electrochemical method. The results showed that the $Al_{18}B_4O_{33}$ whisker on the surface of the composite was decomposed and $MgAl_2O_4$ was formed in the PEO coating layer of $Al_{18}B_4O_{33}w/AZ31$ composite during PEO treatment. As a result, the electrochemical corrosion potential of the PEO coated $Al_{18}B_4O_{33}w/AZ31$ composite was increased compared with that of AZ31 alloy.