• 한국재료학회:학술대회논문집
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• 한국재료학회 2001년도 춘계학술발표강연 및 논문개요집
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• pp.120-120
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• 2001

• 한국재료학회:학술대회논문집
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• 한국재료학회 2000년도 추계학술발표강연 및 논문개요집
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• pp.115-115
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• 2000

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2002년도 International Meeting on Information Display
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• pp.628-631
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• 2002

$Al_2O_3$ capping layer and MgO protective layer were deposited by electron beam evaporation method using single crystal source. Thickness of the capping layer, $Al_2O_3$, was varied from 5 nm to 10 nm. Surface morphology was observed by SEM and AFM before and after hydration. And microstructure of deposited $Al_2O_3$ layer and chemical shift of electron binding energy were also observed by high resolution TEM and XPS, respectively, after hydration. From these results, it was found that Mg atoms diffused into $Al_2O_3$ layer, reacted with moisture and formed $Mg(OH)_2$ during hydration. As thickness of $Al_2O_3$ increased, extent of hydration increased. $Al_2O_3$ capped MgO thin films and uncapped MgO thin films were deposited on AC-PDP test panel to characterize discharge properties. Although $Al_2O_3$ has poor discharge properties rather than MgO, because of many hydrated species on the surface of MgO, similar discharge properties were observed.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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• pp.1207-1210
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• 2005

The MgO protective layer provides protection from the discharge, lowers the discharge voltage and prolongs the AC-PDP lifetime. We have investigated the characteristics of degradation of MgO protective layer, which correlates to the image-sticking[1] and the lifetime in AC-PDP. The degraded MgO have been changed the surface morphology of MgO. It was found that panel lifetime depended on degradation of MgO protective.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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• pp.481-482
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• 2006

플라즈마 화상표시기 (PDP)의 보호막 물질로 사용 중인 다결정 MgO의 특성을 개선하기 위하여 본 연구에서는 MgO에 희토류계 원소를 치환하여 제조하였으며, 치환량에 따른 MgO 보호막의 광학적 특성과 전기적 특성을 고찰하였다. MgO + 100 ppm $Gd_2O_3$조성으로 제작한 MgO 박막의 이차전자 방출계수 값이 순수 MgO 보다 35% 높게 나타났다. $Gd_2O_3$ dopant가 100 ppm 첨가시까지 밀도가 증가하였으나, 그 이상 첨가시 감소하는 경향을 나타냈다. 가속전압 200 V에서 이차전자 방출계수는 0.138 이었고 표면거칠기는 5.77 nm 이었으며 투과율은 550 nm 에서 95.76% 이었다.

• 한국전기전자재료학회논문지
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• 제18권11호
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• pp.1019-1023
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• 2005

We have examined the electrical and optical characteristics of the plasma display panel produced by vacuum in-line sealing technology. In the MgO layer deposited at room temperature, after sealing at the panel temperature of $430^{\circ}C$, the luminous efficiency decreased compared with that of the panel before sealing. Moreover, firing and sustain voltage of the sealed panel increased compared with that of the panel before sealing. This was resulted from that the MgO protective layer was cracked by the softening of the dielectric layer during the sealing process. In order to avoid the MgO crack during the vacuum in-line sealing, thermally stable MgO layer or lower temperature sealing is required.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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• pp.1057-1059
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• 2008

Study of the ion-induced-, photo- and exo-electron emission from a Sc doped MgO protective layer has been performed. It is established that doping with Sc increases photo- and especially exo-electron emission from MgO films while the ion-induced electron emission coefficient $\gamma$ stays unchanged.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2002년도 International Meeting on Information Display
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• pp.228-231
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• 2002

We report the effect of density of thin films on moisture adsorption and hydration of MgO thin film, usually used as a protective layer in AC-PDP After hydration, lots of hemispherical shaped clusters, $Mg(OH)_2$, formed on the surface of MgO thin films. However clusters formed on low-density thin films were bigger than those on high-density films. From ERD spectra, it seemed that the concentration of hydrogen was very high in the region 20 nm from the surface of MgO thin film. The low-density thin film had more hydrogen than high-density thin film. From simulation results of ERD and RBS it was found that hydration reaction also occurred in the inner part of the film. So diffusion of Mg atoms from the inner part of the film to the surface and $H_2O$ molecules from the surface to the inner part of the film is important. And because low density thin film has many short paths for diffusion of Mg atoms and $H_2O$ molecules, low-density thin film is more hydrated. So to suppress hydration of MgO thin films, high-density thin film is needed.

• 한국세라믹학회:학술대회논문집
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• 한국세라믹학회 2000년도 추계총회,초청강연,특별강연,연구발표회
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• pp.197.2-197
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• 2000

• 반도체디스플레이기술학회지
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• 제7권2호
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• pp.63-67
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• 2008

The MgO protective layer plays an important role in plasma display panels (PDPs). Our previous work demonstrated that the properties of MgO thin film could be improved, which were deposited by ion beam assisted deposition (IBAD). However arc discharge always occurs during the IBAD process. To avoid this problem, oxygen neutral beam assisted deposition (NBAD) is used to deposit MgO thin films in this paper. The energy of the oxygen neutral beam was used as the parameter to control the deposition. The experimental results showed that the oxygen neutral beam energy was effective in determining in F/$F^+$ centers, crystal orientation, surface morphology of the MgO thin film, and the discharge characteristics of AC PDP. The lowest firing voltage $(V_f)$ and the highest secondary electron emission coefficient $(\gamma)$ were obtained when the neutral beam energy was 300 eV.