• Title/Summary/Keyword: Metal oxide semiconductor

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A Dimming Method for the UHD Broadcast LED Lighting (UHD 방송용 LED 조명의 조도제어 방법)

  • Shin, Dong-Seok;Park, Chong-Yeun
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.29 no.2
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    • pp.8-18
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    • 2015
  • This paper proposes a dimming method and a hybrid LED driving circuit suitable for the ultra high definition (UHD) broadcasting. There are major two problems during the dimming control for traditional LED broadcast lightings; one is a flicker that occurred when camera filming to these lightings, and the other is that linear control is impossible for LED luminous intensity under 10% due to LED electrical characteristics. The proposed dimming method and the driving circuit are designed to solve two problems simultaneously. For high level dimming control region from 10 to 100%, the analog control method was applied to the switching regulator constructed by MOSFET operated in the saturation region. For low level dimming control region under 10%, the fast PWM control method with the linear regulator constructed by MOSFET in the ohmic region was used. We verified experimentally that the dimming method is able to control the luminous intensity linearly from 1 to 100% and the flicker disappears on images taken by the charge coupled device (CCD) and the complementary metal oxide semiconductor (CMOS) cameras. Therefore, the proposed method is suitable for the UHD broadcasting.

Comparison on commercial simulators for nano-structure device simulation- For ISE-TCAD and Micro-tec - (나노 구조 소자 시뮬레이션을 위한 상용 시뮬레이터의 비교 분석 - ISE-TCAD와 Micro-tec을 중심으로 -)

  • 심성택;임규성;정학기
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.6 no.1
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    • pp.103-108
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    • 2002
  • The metal-oxide-semiconductor field-effect transistor(MOSFET) has undergone many changes in the last decade In response to the constant demand for increased speed, decreased power, and increased packing density. The state -of-the-art simulation programs are developed by engineers and scientists. This paper has compared commercial programs of Micro-tec and ISE-TCAD in device simulation. This paper investigates LDD MOSFET using two simulators. Bias condition is applied to the devices with gate lengths(Lg) 180㎚. We have presented MOSFET's characteristics such as I-V characteristic and electric field, and compared Micro-tec with ISE TCAD.

Thermal Model for Power Converters Based on Thermal Impedance

  • Xu, Yang;Chen, Hao;Lv, Sen;Huang, Feifei;Hu, Zhentao
    • Journal of Power Electronics
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    • v.13 no.6
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    • pp.1080-1089
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    • 2013
  • In this paper, the superposition principle of a heat sink temperature rise is verified based on the mathematical model of a plate-fin heat sink with two mounted heat sources. According to this, the distributed coupling thermal impedance matrix for a heat sink with multiple devices is present, and the equations for calculating the device transient junction temperatures are given. Then methods to extract the heat sink thermal impedance matrix and to measure the Epoxy Molding Compound (EMC) surface temperature of the power Metal Oxide Semiconductor Field Effect Transistor (MOSFET) instead of the junction temperature or device case temperature are proposed. The new thermal impedance model for the power converters in Switched Reluctance Motor (SRM) drivers is implemented in MATLAB/Simulink. The obtained simulation results are validated with experimental results. Compared with the Finite Element Method (FEM) thermal model and the traditional thermal impedance model, the proposed thermal model can provide a high simulation speed with a high accuracy. Finally, the temperature rise distributions of a power converter with two control strategies, the maximum junction temperature rise, the transient temperature rise characteristics, and the thermal coupling effect are discussed.

Fabrications and properties of MFIS capacitor using $LiNbO_3$/AIN structure ($LiNbO_3$/AIN 구조를 이용한 MFIS 커패시터의 제작 및 특성)

  • 이남열;정순원;김용성;김진규;정상현;김광호;유병곤;이원재;유인규
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.743-746
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    • 2000
  • Metal-ferroelectric-insulator-semiconductor(MFIS) devices using Pt/$LiNbO_3$/Si structure were successfully fabricated. The dielectric constant of the AIN film calculated from the capacitance in the accumulation region in the capacitance-voltage(C-V) curve was about 8.2. The gate leakage current density of MIS devices using a aluminum electrode showed the least value of 1$\times$$1O^{-8}$A/$cm^2$ order at the electric field of 500kV/cm. The dielectric constant of $LiNbO_3$film on AIN/Si structure was about 23 derived from 1MHz capacitance-voltage (C-V) measurement and the resistivity of the film at the field of 500kV/cm was about 5.6$\times$ $1O^{13}$ $\Omega$.cm.

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Gate Electrode Dependence of MFSFETs using $LiNbO_3$ Thin Film ($LiNbO_3$ 박막을 이용한 MFSFET의 게이트 전극 의존성)

  • 정순원;김용성;김채규;이남열;김광호
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.11a
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    • pp.25-28
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    • 1999
  • Metal ferroelectric semiconductor Field Effect- Transistors(MFSFET) with various gate electrodes, that are aluminum, platinum and poly -Si, using LiNbO$_3$/Si(100) structures were fabricated and the properties of the FETs have been discussed. The drain current of the state of FET with Pt electrode was more than 3 orders of magnitude larger than the state current at the same gate voltage of 1.5 V, 7.rich means the memory operation of the MFSFET. A write voltage as low as about $\pm$4 V, which is applicable to low power integrated circuits, was used for polarization reversal. The retention properties of the FET using Al electrode were quite good up to about 10$^3$s and using Pt electrode remained almost the same value of its initial value over 2 days at room temperature.

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Electrical Characteristics of $Pt/HfSi_xO_y/Silicon$ Structure ($Pt/HfSi_xO_y/Silicon$ 구조의 전기적 특성에 관한 연구)

  • Park, Jun-Woong;Youm, Min-Soo;Shim, Heun-Sang;Kim, Sung-Il;Sung, Man-Young;Kim, Yong-Tae
    • Proceedings of the KIEE Conference
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    • 2002.11a
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    • pp.145-146
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    • 2002
  • Metal-Oxide-Semiconductor Field Effect Transistor(MOSFET)의 게이트 유전체로서 실리콘 산화막($SiO_2$)은 두께가 1.5nm 이하로 낮아질 경우 터널링 전류가 증가하여 누설 전류가 증가하게 된다. 이로 인해 사용 전력이 증가하게 되고, 소자의 성능을 떨어뜨리게 된다. 본 논문은 높은 유전상수와 넓은 에너지 밴드 갭을 갖는 $HfO_2$를 RF Magnetron Sputter를 이용하여 증착한 다음 RTA 열처리를 통하여 HfSixOy를 생성하여 전기적 특성을 측정하였다. 실험결과, 열처리 시간이 증가함에 따라 HfSixOy의 분포가 균일해지는 반면 두께가 얇아져서 누설 전류가 증가 하는 것으로 관찰되었다. $HfO_2$를 게이트 유전막으로 증착하였을 경우 $HfO_2/HfSixOy/Si$의 이중 박막 구조가 생겨 유전상수를 떨어뜨리는 반면, 실리콘 기판과 우수한 계면 특성을 갖는 HfSixOy만을 증착할 경우 양질의 단층 게이트 유전막으로 활용가능 할 것으로 사료된다.

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Calculation on Effect of Impurity Addition on Electronic State of $MnO_2$ Oxide Semiconductor by First Principle Moleculat Orbital Method (제1원리 분자궤도계산법에 의한 $MnO_2$ 산화물 반도체의 전자상태에 미치는 불순물 첨가 효과의 계산)

  • Lee, Dong-Yoon;Kim, Bong-Seo;Song, Jae-Sung;Kim, Hyun-Sik
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.11a
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    • pp.99-102
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    • 2003
  • The electronic structure of ${\beta}-MnO_2$ having impurities in the site of Mn was theoretically investigated by $DV-X_{\alpha}$ (the discrete variation $X{\alpha}$) method, which is a sort of the first principle molecular orbital method using Hatre-Fock-Slater approximation. The used cluster model was $[Mn_{14}MO_{56}]^{-52}$ (M = transient metals). Madelung potential and spin polarization were considered for more exact calculations. As results of calculations, the energy levels of all electron included in the model were obtained. The energy band gap and positions of impurity levies were discussed in association with impurity 34 orbital that seriously affect electrical properties of $MnO_2$. It was shown that the energy band gap decreased with the increase of the atomic number of transient metal impurity.

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Low-Frequency Noise Characteristics of SiGe pMOSFET Depending upon Channel Structures and Bias Conditions (SiGe pMOSFET의 채널구조와 바이어스 조건에 따른 잡음 특성)

  • Choi, Sang-Sik;Yang, Hun-Duk;Kim, Sang-Hoon;Song, Young-Joo;Cho, Kyoung-Ik;Kim, Jeonng-Huoon;Song, Jong-In;Shim, Kyu-Hwan
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.5-6
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    • 2005
  • High performance SiGe heterostructure metal-oxide-semiconductor field effect transistors(MOSFETs) were fabricated using well-controlled delta-doping of boron and SiGe/Si heterostructure epitaxal layers grown by reduced pressure chemical vapor deposition. In this paper, we report 1/f noise characteristics of the SiGe MOSFETs measured under various bias conditions of the gate and drain voltages changing in linear operation regions. From the noise spectral density, we found that the gate and drain voltage dependence of the noise represented same features, as usually scaled with $f^1$. However, 1/f noise was found to be much lower in the device with boron delta-doped layer, by a factor of $10^{-1}\sim10^{-2}$ in comparion with the device fabricated without delta-doped layer. 1/f noise property of delta-doped device looks important because the device may replace bipolar transistors most commonly embedded in high-frequency oscillator circuits.

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Development of an Uplift Measurement System for Overhead Contact Wire using High Speed Camera (고속카메라를 이용한 전차선 압상량 검측 시스템 개발)

  • Park, Young;Cho, Yong-Hyeon;Lee, Ki-Won;Kim, Hyung-Jun;Kim, In-Chol
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.10
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    • pp.864-869
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    • 2009
  • The measurement of contact wire uplift in electric railways is one of the most important test parameters to accepting the maximum permitted speed of new electric vehicles and pantographs. The contact wire uplift can be measured over short periods when the pantograph passes monitoring stations. In this paper, a high-speed image measurement system and its image processing method are being developed to evaluate dynamic uplift of overhead contact wires caused by pantograph contact forces of Korea Tilting Train eXpress (TTX) and Korea Train eXpress (KTX). The image measurement system was implemented utilizing a high-speed CMOS (Complementary Metal Oxide Semiconductor) camera and gigabit ethernet LAN. Unlike previous systems, the uplift measurement system using high speed camera is installed on the side of the rail, making maintenance convenient. On-field verification of the uplift measurement system for overhead contact wire using high speed camera was conducted by measuring uplift of the TTX followed by operation speeds at the Honam conventional line and high-speed railway line. The proposed high-speed image measurement system to evaluate dynamic uplift of overhead contact wires shows promising on-field applications for high speed trains such as KTX and TTX.

Novel Adaptive Blanking Regulation Scheme for Constant Current and Constant Voltage Primary-side Controlled Flyback Converter

  • Bai, Yongjiang;Chen, Wenjie;Yang, Xiaoyu;Yang, Xu
    • Journal of Power Electronics
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    • v.17 no.6
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    • pp.1469-1479
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    • 2017
  • Primary-side regulation (PSR) scheme is widely applied in low power applications, such as cell phone chargers, network adapters, and LED drivers. However, the efficiency and standby power requirements have been improved to a high standard due to the new trends of DOE (Department Of Energy) Level VI and COC (Code Of Conduct specifications) V5. The major drawbacks of PSR include poor regulation due to inaccurate feedback and difficulty in acquiring acceptable regulation. A novel adaptive blanking strategy for constant current and constant voltage regulation is proposed in this paper. An accurate model for the sample blanking time related to transformer leakage inductance and the metal-oxide-semiconductor field-effect transistor (MOSFET) parasitic capacitance is established. The proposed strategy can achieve accurate detection for ultra-low standby power. In addition, numerous control factors are analyzed in detail to eliminate the influence of leakage inductance on the loop stability. A dedicated controller integrated circuit (IC) with a power MOSFET is fabricated to verify the effectiveness of the proposed control strategy. Experimental results demonstrated that the prototype based on the proposed IC has excellent performance.