• Title/Summary/Keyword: Metal organic deposition

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Quantitative Analysis of SO2 and NO2 Adsorption and Desorption on Quartz Crystal Microbalance Coated with Cobalt Gallate Metal-Organic Framework

  • Junhyuck Ahn;Taewook Kim;Sunghwan Park;Young-Sei Lee;Changyong Yim
    • Journal of Sensor Science and Technology
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    • v.32 no.3
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    • pp.147-153
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    • 2023
  • Metal-organic frameworks (MOFs) of cobalt gallate were synthesized and deposited on gold electrodes using self-assembly monolayers (SAMs) and hydrothermal processing. These MOF films exhibit strong adsorption capabilities for gaseous particulates, and the use of SAMs allows the synthesis and deposition processes to be completed in a single step. When cobalt gallate is mixed with SAMs, a coordination bond is formed between the cobalt ion and the carboxylate or hydroxyl groups of the SAMs, particularly under hydrothermal conditions. Additionally, the quartz crystal microbalance (QCM) gas sensor accurately measures the number of particulates adsorbed on the MOF films in real-time. Thus, the QCM gas sensor is a valuable tool for quantitatively measuring gases, such as SO2, NO2, and CO2. Furthermore, the QCM MOF film gas sensor was more effective for gas adsorption than the MOF particles alone and allowed the accurate modeling of gas adsorption. Moreover, the QCM MOF films accurately detect the adsorption-desorption mechanisms of SO2 and NO2, which exist as gaseous particulate matter, at specific gas concentrations.

Preparation and Electrical Properties of $SrTiO_3$ Thin Films by Plasma Enhanced Metal Organic Chemical vapor Deposition (PE-MOCVD에 의한 $SrTiO_3$ 박막의 제조 및 전기적 특성에 관한 평가)

  • 김남경;윤순길
    • Journal of the Korean Ceramic Society
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    • v.33 no.2
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    • pp.177-182
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    • 1996
  • strontium titanate (SrTiO3) thin films deposited on Pt/MgO were prepared by Plasma Enhanced Metal Orgainc Chemical vapor Deposition (Pe-MOCVD). The crystallinity of SrTiO3 thin films increased with increasing depo-sition temperature and SrF2 second phase disappeared at 55$0^{\circ}C$ The films showed a dielectric constant of 177 and a dissipation factor of 0.0195 at 100 kHz. The variation of capacitance of the films with applied voltage was small showing paraelectric properties. The charge storage density and leakage current density were 40fC/${\mu}{\textrm}{m}$2 and 3.49$\times$10-7 A/cm2 at 0.25 MV/cm, respectively.

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Characteristics of ferroelectric properties of $(Bi,Ce)_4Ti_3O_{12}$ thin films deposited by pulsed laser deposition (Pulsed laser deposition 방법으로 증착된 $(Bi,Ce)_4Ti_3O_{12}$ 박막의 강유전특성 분석)

  • 오영남;성낙진;윤순길
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.03a
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    • pp.37-37
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    • 2003
  • Ferroelectric random acess memories (FeRAMs) 재료로 주목받고 있는 강유전 물질은 이미 여러 해 전부터 많은 물질들에 대해 연구가 진행되어 왔다. 그 중 낮은 공정 온도를 가지며 큰 remanent polarization 값을 갖는 lead zirconium titanate (PZT) 박막에 대해 많은 연구가 진행되고 있다. 하지만 Pt 기판위에 증착된 PZT 박막은 높은 피로 현상을 보이는 문제가 있다. 최근 Pulsed laser deposition이나 metal-organic vapor phase epitaxy (MOVPE) 등의 방법에 의해 epitaxial substituted-$Bi_4Ti_3O_{12}$ (La, Nd) 박막에 대해 보고가 되고 있다. 본 연구에서는 높은 remanent polarization 값을 갖는 $(Bi,Ce)_4Ti_3O_{12}$ (BCT) 박막을 pulsed laser deposition 방법을 사용하여 증착하였다. 또한 Bismuth의 양을 변화시켜 Bismuth의 양에 따른 remanent polarization의 변화를 확인하여 보았다. 사용된 기판은 Pt/$TiO_2$/$SiO_2$/Si 기판을 사용하였다.

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Deposition of NiO on hi-axially textured Ni substrates fort YBCO coated conductor by a MOCVD method (양축정렬된 textured Ni 기판위에 MOCVD법을 이용한 YBCO coated conductor 완충층용 NiO 증착)

  • 선종원;김형섭;박순동;정충환;전병혁;김잔중
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07a
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    • pp.531-534
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    • 2002
  • NiO buffer layers for YBCO coated conductors were deposited on hi-axially textured Ni substrates by MOCVD(metal organic chemical vapor deposition) method, using single solution source. To establish the processing condition, oxygen partial pressure and deposition temperature were changed. The surface orientation and degree of texture were estimated by X-ray diffraction, X-ray pole figure and atomic force microscopy. The FWHMs of in-plane and out-of-plane of the NiO films were about 10$^{\circ}$. The surface roughness was a function of deposition temperature. The AFM surface roughness of NiO films is in the range of 3∼10 nm, when NiO films was grown at 450∼530$^{\circ}C$.

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Large-Scale Vacuum Technologies for $730{\times}920$ AMOLED Production; The world's largest OLED deposition system

  • Hwang, Changhun;Han, Seung-Jin;Kim, Do-Gon;Yook, Sim-Man;Kim, Seung-Han;Kim, Jin-Hyung;Kim, Beom-jai;Won, You-Tae;Park, Ki-Joo;Kim, Kwang-Ho;Kim, Byung-Seok;Kang, Teak-Sang;Kim, Jung-Hwan;Seo, Sang-Won;Song, Ha-Jin;Sim, Hyung-Bo;Noh, Young-Bo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07a
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    • pp.668-672
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    • 2005
  • Doosan DND, OLED manufacturing equipment maker, has developed the largest deposition system to produce $730{\times}920mm$ size AMOLED devices for the first time in the world. It is necessary for producing 40" AMOLED panels to develop the large-scaled vacuum technologies including ICP plasma, stretching glass chuck, organic deposition, metal deposition and hybrid encapsulation processes.

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Study of the Carrier Injection Barrier by Tuning Graphene Electrode Work Function for Organic Light Emitting Diodes OLED (일함수 변화를 통한 그래핀 전극의 배리어 튜닝하기)

  • Kim, Ji-Hun;Maeng, Min-Jae;Hong, Jong-Am;Hwang, Ju-Hyeon;Choe, Hong-Gyu;Mun, Je-Hyeon;Lee, Jeong-Ik;Jeong, Dae-Yul;Choe, Seong-Yul;Park, Yong-Seop
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.111.2-111.2
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    • 2015
  • Typical electrodes (metal or indium tin oxide (ITO)), which were used in conventional organic light emitting devices (OLEDs) structure, have transparency and conductivity, but, it is not suitable as the electrode of the flexible OLEDs (f-OLEDs) due to its brittle property. Although Graphene is the most well-known alternative material for conventional electrode because of present electrode properties as well as flexibility, its carrier injection barrier is comparatively high to use as electrode. In this work, we performed plasma treatment on the graphene surface and alkali metal doping in the organic materials to study for its possibility as anode and cathode, respectively. By using Ultraviolet Photoemission Spectroscopy (UPS), we investigated the interfaces of modified graphene. The plasma treatment is generated by various gas types such as O2 and Ar, to increase the work function of the graphene film. Also, for co-deposition of organic film to do alkali metal doping, we used three different organic materials which are BMPYPB (1,3-Bis(3,5-di-pyrid-3-yl-phenyl)benzene), TMPYPB (1,3,5-Tri[(3-pyridyl)-phen-3-yl]benzene), and 3TPYMB (Tris(2,4,6-trimethyl-3-(pyridin-3-yl)phenyl)borane)). They are well known for ETL materials in OLEDs. From these results, we found that graphene work function can be tuned to overcome the weakness of graphene induced carrier injection barrier, when the interface was treated with plasma (alkali metal) through the value of hole (electron) injection barrier is reduced about 1 eV.

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Simple and Clean Transfer Method for Intrinsic Property of Graphene

  • Choe, Sun-Hyeong;Lee, Jae-Hyeon;;Kim, Byeong-Seong;Choe, Yun-Jeong;Hwang, Jong-Seung;Hwang, Seong-U;Hwang, Dong-Mok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.659-659
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    • 2013
  • Recently, graphene has been intensively studied due to the fascinating physical, chemical and electrical properties. It shows high carrier mobility, high current density, and high thermal conductivity compare with conventional semiconductor materials even it has single atomic thickness. Especially, since graphene has fantastic electrical properties many researchers are believed that graphene will be replacing Si based technology. In order to realize it, we need to prepare the large and uniform graphene. Chemical vapor deposition (CVD) method is the most promising technique for synthesizing large and uniform graphene. Unfortunately, CVD method requires transfer process from metal catalyst. In transfer process, supporting polymer film (Such as poly (methyl methacrylate)) is widely used for protecting graphene. After transfer process, polymer layer is removed by organic solvents. However, it is impossible to remove it completely. These organic residues on graphene surface induce quality degradation of graphene since it disturbs movement of electrons. Thus, in order to get an intrinsic property of graphene completely remove of the organic residues is the most important. Here, we introduce modified wet graphene transfer method without PMMA. First of all, we grow the graphene from Cu foil using CVD method. And then, we deposited several metal films on graphene for transfer layer instead of PMMA. Finally, we fabricate graphene FET devices. Our approaches show low defect density and non-organic residues in comparison with PMMA coated graphene through Raman spectroscopy, SEM and AFM. In addition, clean graphene FET shows intrinsic electrical characteristic and high carrier mobility.

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Capping Intercrystalline Defects of Polycrystalline UiO-66 Membranes by Polydimethylsiloxane Coating (폴리다이메틸실록산 코팅을 통한 다결정성 UiO-66 분리막의 비선택적 결정립계 결함 캡핑)

  • Ik Ji Kim;Hyuk Taek Kwon
    • Clean Technology
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    • v.29 no.1
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    • pp.71-75
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    • 2023
  • In general, the presence of non-selective intercrystalline (grain boundary) defects in polycrystalline metal-organic framework (MOF) or zeolite membranes, which are known to be ca. 1 nm in size, causes lower membrane performance (selectivity) than the intrinsically expected. In this study we show that applying a thin polymeric coating of polydimethylsiloxane (PDMS) on a polycrystalline MOF membrane is effective to cap the non-selective intercrystalline defects and therefore improve membrane performance. To demonstrate the concept, first, polycrystalline UiO-66, one of Zr-based MOFs, membranes were prepared by an in-situ solvothermal growth. By controlling membrane growth condition with respect to growth temperature, we were able to obtain polycrystalline UiO-66 membranes at 150 ℃ with intercrystalline defects of which the quantity is not significant, so it can be plugged by the suggested PDMS deposition. Second, their performances were compared before and after the PDMS deposition. As expected, the PDMS deposition ended up with a noticeable increase in CO2/N2 ideal selectivity from 6 to 14, indicating successful intercrystalline defect plugging. However, the enhancement in CO2/N2 selectivity was accompanied by a significant reduction in CO2 permeance from 5700 to 33 GPU because the PDMS deposition not only plugs defects but also forms a continuous coating on membrane surface, adding an additional transport resistance.

A Study on the III-nitride Light Emitting Diode with the Chip Integration by Metal Interconnection (금속배선 칩 집적공정을 포함하는 질화물 반도체 LED 광소자 특성 연구)

  • 김근주;양정자
    • Journal of the Semiconductor & Display Technology
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    • v.3 no.3
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    • pp.31-35
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    • 2004
  • A blue light emitting diode with 8 periods InGaN/GaN multi-quantum well structure grown by metal-organic chemical vapor deposition was fabricated with the inclusion of the metal-interconnection process in order to integrate the chips for light lamp. The quantum well structure provides the blue light photoluminescence peaked at 479.2 nm at room temperature. As decreasing the temperature to 20 K, the main peak was shifted to 469.7 nm and a minor peak at 441.9 nm appeared indicating the quantum dot formation in quantum wells. The current-voltage measurement for the fabricated LED chips shows that the metal-interconnection provides good current path with ohmic resistance of 41 $\Omega$.

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Catalytic synthesis and properties of β-Ga2O3 nanowires by metal organic chemical vapor deposition (MOCVD를 이용한 금속 촉매 종류에 따른 β-Ga2O3 나노 와이어의 제작과 특성)

  • Lee, Seunghyun;Lee, Seoyoung;Jeong, Yongho;Lee, Hyojong;Ahn, Hyungsoo;Yang, Min
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.27 no.1
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    • pp.1-8
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    • 2017
  • Catalytic synthesis and properties of ${\beta}-Ga_2O_3$ nanowires grown by metal organic chemical vapor deposition are reported. Au, Ni and Cu catalysts were suitable for the growth of $Ga_2O_3$ nanowires under our experimental conditions. The $Ga_2O_3$ nanowires grown by using Au, Ni and Cu catalysts showed different growth rates and morphologies in each case. We found the $Ga_2O_3$ nanowires were grown by the Vapor-Solid (VS) process when Ni was used as a catalyst while the Vapor-Liquid-Solid (VLS) was a dominant process in case of Au and Cu catalysts. Also, we found nanowires showed different optical properties depend on catalytic metals. On the other hand, for the cases of Ti, Sn and Ag catalysts, nanowires could not be obtained under the same condition of Au, Cu and Ni catalytic synthesis. We found that these results are related to the different characteristics of each catalyst, such as, melting points and phase diagrams with gallium metal.