• Title/Summary/Keyword: Mask effect

Search Result 335, Processing Time 0.026 seconds

Effect of the Application of Temporal Mask Map on the Relationship between NDVI and Rice Yield (시계열 마스크 맵이 논벼 NDVI와 단수와의 관계에 미치는 영향)

  • Na, Sang-il;Ahn, Ho-yong;Park, Chan-won;Hong, Suk-young;So, Kyu-ho;Lee, Kyung-do
    • Korean Journal of Remote Sensing
    • /
    • v.36 no.5_1
    • /
    • pp.725-733
    • /
    • 2020
  • The objectives of this study were (1) to develop a temporal mask map using MCD12Q1 data, and (2) to extract the annual variations in paddy, (3) to investigate the correlation analysis between MYD13Q1 NDVI and rice yield, and (4) to review its applicability. For these purposes, the temporal mask map was created using annual MCD12Q1 PFT data from 2002 to 2019, and compared with the fixed mask map. As a result, it found that the temporal mask map well reflected the variations of the paddy area. In addition, the correlation coefficient between NDVI and rice yield was also high significant as compared to the fixed mask map. Therefore, the temporal mask map will be useful for NDVI extraction, crop monitoring, and estimation of rice yield.

Evaluation of the effects of mandibular angle sagittal ostectomy and botulinum toxin type A treatment using facial golden mask (황금마스크를 이용한 하악각시상골절제술과 보툴리눔독소 치료법의 평가)

  • Shin, Seung-Kyu;Kim, Yong-Ha;Kim, Tae-Gon;Lee, Jun-Ho;Ahn, Ki-Young
    • Archives of Plastic Surgery
    • /
    • v.36 no.4
    • /
    • pp.469-474
    • /
    • 2009
  • Purpose: A lower facial contouring surgery has become a commonly performed procedure in Asia. Currently, mandibular angle sagittal ostectomy and botulinum toxin type A treatment are main procedures for aesthetic correction of a broad lower face. There are a few date to show the differences in the mandibular contouring changes between mandibular angle splitting ostectomy and botulinum toxin type A treatment. Facial golden mask is easy to apply, inexpensive, and relatively objective for evaluation of facial contour analysis. This study was designed specifically to compare the changes in lower face width after two different forms of lower facial contouring procedure using facial golden mask. Methods: Seventeen patients, aged 18 to 55 years (mean, 28.6 years), 15 women and 2 men, consented to the study and receive a contouring procedure of lower face. The patients were classified in to 2 groups. In group A, the sample consisted of 10 patients with a prominent squared mandibular angle and mandibular angle splitting ostectomy was performed. In group B, the sample consisted of 7 patients with masseteric hypertrophy and botulinum toxin type A treatment was performed. Photographs of the face were taken to record the facial change at preoperative and postoperative. The postoperative photographs were taken to considered maximal effect at 2 years after surgery in group A and 4.8 months after treatment in group B. The authors applied the facial golden mask to preoperative and postoperative photographs and horizontal ratio, which compares facial width with golden mask width, were calculated. We made an analysis of the result of horizontal ratio using SPSS. Results: Overall average horizontal ratio of pre- and postoperative photos of group A were 1.24 and 1.11, whereas overall average horizontal ratio of pre- and postoperative photos of group B were 1.19 and 1.12. The horizontal ratio decreased 10.24% in group A and 5.93% in group B. There was a statistically significant change in before and after treatment, but there was no significant change in comparing the group A and group B. Conclusions: The result from this study suggest that mandibular angle sagittal ostectomy and botulinum toxin type A treatment showed relatively satisfactory clinical effects on lower facial contouring treatment. There was no statistical significant difference within two lower facial contouring treatment. Facial golden mask is easy to apply, inexpensive, and relatively objective, so we think that facial golden mask is a good method for evaluation of lower facial contouring treatment.

New lithography technology to fabricate arbitrary shapes of patterns in nanometer scale (나노미터 크기의 임의 형상을 제작하기 위한 새로운 리소그래피 기술)

  • 홍진수;김창교
    • Journal of the Korea Academia-Industrial cooperation Society
    • /
    • v.5 no.3
    • /
    • pp.197-203
    • /
    • 2004
  • New lithography techniques are employed for the patterning of arbitrary shapes in nanometer scale. When, in the photolithography, the electromagnetic waves such as UV and X-ray are incident on the mask patterned in nanometer scale, the diffraction effect is unavoidable and degrades images of the mask imprinted on wafer. Only a convex lens is well-known Fourier transformer. It is possible to make the mask Fourier-transformed with the convex lens, even though the size of pattern on the mask is very large compared to the wavelength of electromagnetic wave. If the mask, modified according to new technique described in this paper, was placed at the front of the lens and was illuminated with laser beam, the nanometer-size patterns are only formed on the plane called Fourier transform plane. The new method presented here is quite simple setup and comparable with present and next generation lithographies such as UV/EUV photolithograpy and electron projection lithography when compared in attainable minimum linewidth. In this paper, we showed our theoretical research work in the field of Fourier optics, . In the near future, we are going to verify this theoretical work by experiments.

  • PDF

Derivation of the Baseline and Interference Effects for Block Edge Mask (Block Edge Mask의 대역 외 방출 기준치 유도 및 간섭 영향 분석)

  • Kim, Min-Jae;Kang, Yun-Seok;Lee, Hyuck-Jae
    • The Journal of Korean Institute of Communications and Information Sciences
    • /
    • v.36 no.12A
    • /
    • pp.1034-1043
    • /
    • 2011
  • As an introduction of an open spectrum allocation approach with technology and service neutrality is expected as a way to solve problems of frequency shortage due to the expansion of demand for wireless multimedia communications, recently, the new management model of interferences and its standard setting are required. In this paper, as a model for this new interference management considering several candidates, Block Edge Mask(BEM) approach is chosen as the most appropriate model. And to investigate the effects of interference resulting from the standard setting of BEM, assuming the use of LTE systems in the Digital Dividend, BEM out-of-band baseline in the boundaries between digital terrestrial television (DTV) service and LTE mobile communications services which are heterogeneous systems for analysis is derived and the effect of setting guard band is analyzed.

Chinese consumers' awareness of Korean mask packs (중국 소비자들의 한국 마스크팩에 대한 인식 분석)

  • Kwon, Hye-Jin
    • Journal of Digital Convergence
    • /
    • v.17 no.3
    • /
    • pp.449-454
    • /
    • 2019
  • This study was designed to present the direction of Korean K-beauty by examining awareness, selection attributes, and satisfaction of the Chinese on Korean brand mask packs, which currently rank among the top 10 mask packs in China's beauty market. As a result, the perception of Korean Wave, especially entertainment / music preference, has a positive (+) effect on Korean mask pack choice attributes. Also, it was found that the influence of the Korean Wave greatly affected both satisfaction and repurchase intention. The increase of Chinese women's consumption and the appearance of the society due to the advancement of the society also affects the appearance. However, the safety and efficacy of the product has yet to be established. If the improvement of these technologies and the countermeasures of domestic cosmetics companies are provided, Korea's K-Beauty industry will be more active in the domestic and overseas markets.

Shadow Modeling using Z-map Algorithm for Process Simulation of OLED Evaporation

  • Lee, Eung-Ki
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 2004.08a
    • /
    • pp.487-490
    • /
    • 2004
  • In order to simulate OLED evaporation process, modeling of directional distribution of the vaporized organic materials, film thickness distribution profile and pattern-mask shadow effect are required In accordance with many literatures; all of them except shadow effect modeling are studied and developed. In this paper, modeling algorithm of evaporation shadow is presented for process simulation of full-color OLED evaporating system. In OLED evaporating process the offset position of the point cell-source against the substrate rotation axis and the usage of the patterned mask are the principal causes for evaporation shadow. For geometric simulation of shadow using z-map, the film thickness profile, which is condensed on a glass substrate, is converted to the z-map data. In practical evaporation process, the glass substrate is rotated. This physical fact is solved and modeled mathematically for z-map simulation. After simulating the evaporation process, the z-map data can present the shadow-effected film thickness profile. Z-map is an efficient method in that the cross-sectional presentations of the film thickness profile and thickness distribution evaluation are easily and rapidly achieved.

  • PDF

A study on the Interpolation method of Digital scan image (디지털 스캔 이미지의 보간방법에 관한 연구)

  • 이성형;조가람;구철희
    • Journal of the Korean Graphic Arts Communication Society
    • /
    • v.16 no.3
    • /
    • pp.81-95
    • /
    • 1998
  • If a image doesn't include sufficient data of output size and resolution, we will scan again the image. Interpolation generates a new pixel by methematical average of processing. In the interpolation method, there are nearest neighbor interpolation, bilinear interpolation and bicubic interpolation etc. This study was carried out for the purpose of researching compatible method to digital scan image caused by only different interpolation methods. Nearest neighbor interpolation show superior effect in the drawing image. Bilinear interpolation show reduction in detail and contrast. Bicubic interpolation show superior effect in the digital photo image USM(Unsharp Mask) application after extension by interpolation show better than extension by interpolation after USM(unsharp mask) application.

  • PDF

ICP ETCHING OF TUNGSTEN FOR X-RAY MASKS

  • Jeong, C.;Song, K.;Park, C.;Jeon, Y.;Lee, D.;Ahn, J.
    • Journal of the Korean institute of surface engineering
    • /
    • v.29 no.6
    • /
    • pp.869-875
    • /
    • 1996
  • In this article the effects of process parameters of inductively coupled plasma etching with $SF_6$ /$N_2$/Ar mixture gas and mask materials on the etched profile of W were investigated. While the etched profile was improved by $N_2$-addition, low working presure, and reduced $SF_6$ flow rate, the etching selectity (W against SAL resist) was decreased. Due to the difficulty of W etching with single layer resist, sputter deposited $Al_2O_3$ film was used as a hardmask. Reduction of required EB resist thickness through $Al_2O_3$ mask application could reduce proximity effect during e-beam patterning, but the etch anisotropy was degraded by decreased sidewall passiviation effect.

  • PDF

A Study on Detection of Influential Observations on A Subset of Regression Parameters in Multiple Regression

  • Park, Sung Hyun;Oh, Jin Ho
    • Communications for Statistical Applications and Methods
    • /
    • v.9 no.2
    • /
    • pp.521-531
    • /
    • 2002
  • Various diagnostic techniques for identifying influential observations are mostly based on the deletion of a single observation. While such techniques can satisfactorily identify influential observations in many cases, they will not always be successful because of some mask effect. It is necessary, therefore, to develop techniques that examine the potentially influential effects of a subset of observations. The partial regression plots can be used to examine an influential observation for a single parameter in multiple linear regression. However, it is often desirable to detect influential observations for a subset of regression parameters when interest centers on a selected subset of independent variables. Thus, we propose a diagnostic measure which deals with detecting influential observations on a subset of regression parameters. In this paper, we propose a measure M, which can be effectively used for the detection of influential observations on a subset of regression parameters in multiple linear regression. An illustrated example is given to show how we can use the new measure M to identify influential observations on a subset of regression parameters.

Development of Three-Dimensional Ion Implantation Simulator Using Analytical Model (해석모델을 이용한 3차원 이온주입 시뮬레이터 개발)

  • 박화식;이준하;황호정
    • Journal of the Korean Institute of Telematics and Electronics A
    • /
    • v.30A no.12
    • /
    • pp.43-50
    • /
    • 1993
  • Three-dimensional simulator for the ion implantation process is developed. The simulator based on an analytical model which would be a choice with high computational efficiency and accuracy. This is an important issue for the simulation of a numerous number of processing steps required in the fabrication of ULSI or GSI. The model can explain scattering and bulk channeling mechanism (1D). It can also explain depth dependent lateral diffusion effect(2D) and mask effect(3D). The model is consist of one-dimensional JPD(Joined Pearson Distribution) function and two-dimensional modified Gaussian functions. Final implanted profiles under typical mask structures such as hole, line and island structure are obtained with varying ion species.

  • PDF