• Proceedings of the Korean Society of Machine Tool Engineers Conference
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• 2002.04a
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• pp.296-301
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• 2002

In this study, we investigated the machinability of machinable ceramics which were developed by a research lab. of Inha Univ., Korea. The effect of the nozzle scanning times, the size of patterns and compositions of BN in ceramics on the erosion depth of samples with no mask and samples with three different mask pattern in powder blasting of machinable ceramics. The blasting conditions were the impact angles 90$^{\circ}$, scanning times of noble up to 30 and the stand-off distances 100mm. The widths of mask pattern were 0.1mm, 0.5mm and 1 mm. The powder was alumina sharp particles, WA#600. The mass flow rate of powder during the erosion test was fixed constant at 150g/min and the blasting pressure of powder at 0.25Mpa

• Journal of the Korean Institute of Telematics and Electronics
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• v.25 no.1
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• pp.101-107
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• 1988

This paper proposes a circuit extractor which extracts a netlist from the CIF input file cntaining the layout mask artwork informations. The circuit extractor extracts transistors and their interconnections, and calculates circuit parameter such as parasitic resistance and parasitic capacitance from the mask informations. When calculating the parasitic resistance, we consider the current flow path to reduce the errors caused by the resistance approximation. Similarly, we consider the coupling capacitance which has an effect on the circuit characteristics, when the parasitic capacitances are calculated. Therefore, using these parameter values as an input to circuit simulation, the circuit characteristics such as delay time can be estimated accurately. The presented circuit extraction algorithm uses a multiple storage quad tree as a data sturucture for storing and searching the 2-dimensional geometric data of mask artwork. Also, the proposed algorithm is technologically independent to work across a wide range of MOS technologies without any change in the algorihm.

• 한국정보디스플레이학회:학술대회논문집
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• 2002.08a
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• pp.770-772
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• 2002

A new dry-processing method of organic gate dielectric film in field-effect transistors (FETs) was proposed. The method use vapor deposition polymerization (VDP) that is continuous and low temperature process. It has the advantages of shadow mask patterning and dry processing in flexible low-cost large area applications. Here, 80 nm-thick Al as a gate electrode was evaporated through shadow mask. Gate insulators used two different polyimides. The one material was 4,4'-oxydiphtahlic anhydride (ODPA) and 4,4'-oxydianiline (ODA). Another was 2,2-bis(3,4-dicarboxyphenyl) Hexafluoropropane Dianhydride (6FDA) and 4,4' -oxydianiline (ODA). These were co-deposited by high-vaccum thermal-evapora and cured at 150 $^{\circ}C$ for 1 hour, respectively. Pentacene as a semiconductor and 100 nm-thick Au as a source and drain electrode were evaporated through shadow mask.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.13 no.10
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• pp.805-811
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• 2000

Reliability of PBGA(plastic ball grid array) package is weak compared with normal plastic packages. The low reliability is caused by low resistance to the popcorn cracking, which is generated by moisture absorption in PCB(prited circuit board). In this paper, plasma treatment process was used and we analyzed its effects to interface adhesion. The contents of C and Cl decrease after plasma treatment but those of O, Ca, N relatively increase. The plasma treatment improves the adhesion between EMC(epoxy molding compound) and PCB(solder mask). The grade of improvement was over 100% Max, which depends on the properties of EMC. The RMS(root mean square) roughness value of the solder mask surface increases to plasma treatment. There is little difference of adhesion in RF power and treatment time.

• Proceedings of the IEEK Conference
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• 2000.07b
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• pp.851-854
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• 2000

Digital halftoning is a technique to make an equivalent binary image from scanned photo or graphic images. Low pass filtering characteristic of human visual system can be applied to get the effect of spatial averaging of local area consisted of black and white pixels for gray image. The overlapping of black dot decreases brightness and black dot is very sensitive to human visual system in the bright region. In this paper, for gray-level expression, only bright gray region in the color image is considered for blue noise mask (BNM) approach. To solve this problem, BNM with CMY dot is used for the bright region instead of black dot. Dot-on-dot model with single mask causes the problem making much black dot overlap, color distortion. Therefore approach with three masks for C, M and Y each is proposed to decrease pixel overlap and color distortion.

• Korean Journal of Materials Research
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• v.14 no.1
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• pp.46-51
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• 2004

The annealing of a Cu(4.5at.% Mg)/$SiO_2$/Si structure in ambient $O_2$, at 10 mTorr, and $300-500^{\circ}C$, allows for the outdiffusion of the Mg to the Cu surface, forming a thin MgO (15 nm) layer on the surface. The surface MgO layer was patterned, and successfully served as a hard mask, for the subsequent dry etching of the underlying Mg-depleted Cu films using an $O_2$ plasma and hexafluoroacetylacetone [H(hfac)] chemistry. The resultant MgO/Cu structure, with a taper slope of about $30^{\circ}C$ shows the feasibility of the dry etching of Cu(Mg) alloy films using a surface MgO mask scheme. A dry-etched Cu(4.5at.% Mg) gate a-Si:H TFT has a field effect mobility of 0.86 $\textrm{cm}^2$/Vs, a subthreshold swing of 1.08 V/dec, and a threshold voltage of 5.7 V. A novel process for the dry etching of Cu(Mg) alloy films, which eliminates the use of a hard mask, such as Ti, and results in a reduction in the process steps is reported for the first time in this work.

• Journal of the Semiconductor & Display Technology
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• v.15 no.1
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• pp.22-26
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• 2016

Extreme ultraviolet (EUV) pellicle is one of the most concerned research in the field of EUV lithography (EUVL). Imaging performance of EUV mask with pellicle should be investigated prior to high volume manufacturing (HVM) of EUVL. In this paper, we analyzed the relationship between standoff distance and imaging performance of EUV mask to verify the influences of relative standoff distance on imaging performance. As a result, standoff distance of EUV pellicle has no effect on imaging performance of EUV mask such as critical dimension (CD), normalized image log slope (NILS) and image contrast. Therefore, pellicle support structure can be flexibly designed and modified in diverse ways to complement the thermal limitation of EUV pellicle membrane.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.91-93
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• 2008

The organic field-effect transistors with step-edge structure were fabricated. Source and drain electrodes were obliquely deposited by vacuum evaporation. The step-edge of the gate electrode serve as a shadow mask, and the short channel is formed at the step-edge. The excellent device performances were obtained.

• Journal of Animal Reproduction and Biotechnology
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• v.35 no.2
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• pp.171-176
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• 2020

Advancing the estrous cycle of mares is an essential breeding strategy that is routinely conducted by Thoroughbred breeders to improve economic outcomes. For this purpose, Equilume light masks have been developed as an alternative to existing technologies such as artificial lighting or hormonal treatments because they are considered as valid as existing methods with additional animal welfare advantages. For example, with the Equilume light masks, horses can be let out into the pasture, whereas they have to be kept indoors during lighting treatment. Because the function of Equilume light mask on the estrous cycle of mares is influenced by environmental factors such as nutrition condition and temperature, Equilume light mask should be studied in various environments. The objective of the present study was thus to verify the effect of Equilume light masks on the onset of the estrous cycle in Thoroughbred mares in South Korea. Mares were randomly selected and separated into two groups at two Thoroughbred horse breeding farms. The mares in the treatment group were equipped with Equilume light masks from November 18 to February 10 the following year. The body condition, the number and size (> 35 mm) of uterine follicles, and the uterine horn score of the mares were assessed on January 6 and February 10. The body condition scores were not different between the two groups. The treatment with the Equilume light mask had no positive effects on developing follicles and the reproductive tract. In conclusion, the use of Equilume light masks did not influence the seasonal resumption of the estrus cycles in Thoroughbred mares in South Korea.

• KSBB Journal
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• v.28 no.6
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• pp.387-393
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• 2013

In this study, the domestic onion skin has been used to investigate the anti-wrinkle effect of the ethanolic extract. The onion skin has been known to contain a large amount of antioxidant including quercetin. Solvent extraction by 80% ethanol was carried out of the onion skin. The high amount of quercetin have been identified using HPLC as a bioactive compound. The extraction yield of the quercetin increased according to temperature up to $80^{\circ}C$. Two different antioxidant assays (DPPH and ABTS) were performed to determine the free-radical scavenging activity of onion skin extracts. The antioxidant activities ($EC_{50}$ of DPPH) of the vitamin C and the onion extracts were 2.2 and $5.09{\mu}g/mL$, respectively. The results of ABTS tests were 2.33 (of vitamin C) and $2.40{\mu}g/mL$ (of the onion extracts), respectively. In a clinical study, a panel of 10 female volunteers between the ages of 30 and 40 (mean age: 42 years) was given a mask pack containing 1% of this extracts for 4 weeks. It was shown that a highly significant reduction in the deep and moderate wrinkled was obtained with those treated with this onion extracts as compared to the control group. The reduction in deep wrinkles increased with time. Eye wrinkle were reduced statistically significant (p<0.05). The application of the proper topical cream and mask pack containing onion skin extracts has therefore shown to be effective enhancing anti-wrinkle activities.