• 한국의류학회지
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• 제48권3호
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• pp.417-432
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• 2024

This study aimed to enhance the comfort of health masks by conducting in-depth interviews, online surveys, and wearing tests on commercial health masks. The findings are summarized below. In-depth interviews revealed that the most comfortable mask styles were ranked as follows: Beak-1 (B-1) & Beak-2 (B-2) style > Flat style > 3-Horizontal foldable (3H) style. Men generally preferred flat style masks, while women favored beak-shaped masks. The internet survey results showed that 77.8% of surveyed brands offered a variety of mask styles, with 3H and B-2 masks being the most common. Different brands provided masks with different filtration levels, ranging from KF-AD to KF94. Size consistency also varied among brands, with flat masks having relatively consistent dimensions and B-2 masks showing significant size differences. Wearing tests indicated that 3H and B-1 masks were highly satisfying for categories like "itchiness," "unpleasant odor," and "mask slipping." Conversely, flat masks scored the highest satisfaction in classifications such as "stiff," "heavy," "thick," "hot while wearing it," "moisture accumulation," "breathing discomfort," "short ear straps," and "itchiness". Overall, the flat style, B-1, and B-2 yielded higher satisfaction levels, while 4-Horizontal foldable (4H) and 3H garnered lower satisfaction scores on wearing tests.

• 융합정보논문지
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• 제11권11호
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• pp.288-295
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• 2021

본 연구는 마스크팩 유효성분을 흡착시킨 엔드 페이퍼를 퍼머넌트 웨이브 시술시 모발에 미치는 영향을 알아보고자 수행하였다. 시중에 판매되는 마스크팩 중 청귤, 콜라겐, 어성초 유효성분을 함유한 마스크팩을 구입하여 엔드 페이퍼에 흡착시켜 퍼머넌트 웨이브를 시술하였다. 실험 방법으로 모발 굵기, 모발 보습력, 인장강도, SEM을 이용한 모표피 관찰, EDS를 이용한 모발 구성 원소 분석을 하였다. 실험 결과 어성초 유효성분을 엔드 페이퍼에 처리한 실험군이 모발 굵기, 인장강도, 모표피 관찰, 모발 구성 원소 분석 결과 모발 보호효과가 있는 것으로 확인되었다. 또한 청귤 유효성분을 엔드 페이퍼에 처리한 실험군은 모발 보습력 실험 결과에서 비교적 많은 수분을 함유하고 있는 것으로 확인되었다. 유효성분들이 함유된 기초화장품 제품들을 활용하여 모발화장품으로 개발하여 활용하고, 산업현장에서 화학시술 시에 적용할 수 있도록 다양한 재료와 도구들에 대한 개발과 연구가 진행되기를 바라는 바이다.

• 융합정보논문지
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• 제11권9호
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• pp.208-213
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• 2021

본 연구는 아르누보의 특성을 활용한 아트 마스크 디자인 제안이다. 선행연구를 바탕으로 아르누보의 특성을 곡선적 표현, 여성적 표현, 자연주의적 표현, 반복적 표현으로 분류하였으며 각 특성에 따라 아르누보의 대표화가 구스타프 클림트의 작품을 4점 선정하였다. 선정된 작품을 모티브로 아트 마스크에 리디자인하였으며 작품 제작에 따른 결과로는 첫째, 아르누보의 특성을 아트 마스크에 디자인 할 수 있는 가능성과 방법론을 모색하였다. 둘째, 아트 마스크에 표현될 수 있는 범위와 방식을 넓혀 다양한 소재에 따른 접근성을 높였다. 셋째, 아트 마스크와 미술사조의 융합은 아트 마스크의 작업 조건에 충분했다. 이러한 연구결과를 토대로 향후 아트 마스크에 표현될 수 있는 소재가 무궁무진해지길 바라며 메이크업 분야로서 아트 마스크의 위상이 더욱 높아지길 기대해본다.

• 전기의세계
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• 제29권10호
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• pp.678-688
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• 1980

This paper is concerned with the computer design of the multiple-output switching functions by using the improved MASK method in order to obtain the paramount prime implicants (prime implicants of the multiple-output switching function) and new algorithm to design the optimal logic network. All the given minterms for each function are considered as minterms of one switching function to simplify the desigh procedures. And then the improved MASK method whose memory requirement and time consuming are much less than any existing known method is applied to identify the paramount prime implicants. In selecting the irredundant paramount prime implicants, new cost criteria are generated. This design technuque is suitable both for solving a problem by hand or programming it on a digital computer.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2000년도 추계종합학술대회 논문집(1)
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• pp.325-328
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• 2000

This paper has been studied a rower amplifier for IMT-2000 handset. Circuit design is performed and optimized by using HP ADS RF software. Designed amplifier consist of 2 stage, has 25㏈ gain, over 27㏈m output power and about 40% power efficiency. Power amplifier operation frequency range is 1955${\pm}$70MHz. Mask layout of the designed Amplifier consisting of 4 mask. The measured results of these values are satisfying the specification of IMT-2000 handset.

• 한국산학기술학회:학술대회논문집
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• 한국산학기술학회 2002년도 추계학술발표논문집
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• pp.201-204
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• 2002

Overlay margin 확보를 위한 oversizing과, design rule checking, jog filtering를 통하여 side-lobe를 추출하였다. 이렇게 추출한 side-lobe를 extent하고, Cr pattern을 정의하여 side-lobe 현상을 해결할 수 있었다. 하지만 이 방법은 mask제조 공정이 복잡하므로 Cr shield방식의 단점인 복잡한 mask제작공정과 구조를 단순화하기 위하여 scattering bar를 이용하였다. 따라서, scattering bar를 삽입하기 위한 rule을 생성하여 metal layer에 적용하고 aerial image simulation을 통해 side-lobe 현상이 억제되었음을 확인하였다. 그리고 앞에서와는 반대로 background clear의 경우에 발생하는 side-lobe에 scattering bar를 적용하여 억제됨을 확인하였다.

• 한국지능시스템학회:학술대회논문집
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• 한국퍼지및지능시스템학회 2006년도 추계학술대회 학술발표 논문집 제16권 제2호
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• pp.272-274
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• 2006

In this paper, we concentrate on the mask design problem for optical micro-lithography. The pre-distorted mask is obtained by minimizing the error between the designed output image and the projected output image. We use the particle swarm optimization(PSO) and fuzzy system to insure that the resulting images are identical to the desired image. Our method has good performance for the iteration number by an experiment.

• Journal of Information Display
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• 제6권3호
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• pp.18-21
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• 2005

A new technology for reducing photolithography process from a four step to a three step process in the fabrication of TFT LCD is introduced. The core technology for 3-mask-TFT processes is the lift-off process [1], by which the PAS and PXL layers can be formed simultaneously. A different method of the lift-off process was developed in order to enhance the performance of efficiency with conventional positive and not negative PR which is the generally used in other lift-off process. In addition, the removal capacity of the ITO/PR in lift-off process was evaluated. The evaluation results showed that the new process can be run in conventional TFT production condition. In order to apply this new process in existing TFT process, several tests were conducted to ensure stability of the TFT process. It was found that the outgases from PR on the substrate in ITO sputtering chamber do not raise any problem, and the deposited ITO film beside the PR has conventional ITO qualities. Furthemore, the particles that were produced due to the ITO chips in PR strip bath could be reduced by the existing filtering system of stripper. With the development of total process and design of the structure for TFT using this technology, 3-mask-panels were achieved in TN and IPS modes, which showed the same display performances as those with the conventional 4mask process. The applicability and usefulness of the 3-mask process has already verified in the mass production line and in fact it currently being used for the production of some products.

• 전기전자학회논문지
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• 제17권3호
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• pp.221-228
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• 2013

About functional parameters of a LED/UVLED (Light Emitting Diode/Ultra Violet LED), one of the most important parameters is the I-V characteristic. By researching factors affect to the I-V characteristic of uvled, we found that beside of the structure of the device itself, there is the influence of the electrode materials, electrode shapes, the process of wiring and packaging. In this work, we want to improve the performance of UVLED to find out the optimal mask design principles. The study is based on theoretical mathematical models, as well as the use of simulation software tool Comsol. From all results obtained, the team has improved mask design to manufacture electrodes for GaN-based UVLED. Electrode masks are designed by three softwares, which are Intellisuite, Klayout and AutoCad. Intellisuite masks would be used in fabrication simulation while Klayout and AutoCad are used to fabricate electrodes in experiments. As well as, we silmulated the structure of an uvled 355nm emission wavelength by TCAD software, in order to compare with uvled sample that has the same emission wavelength.

• Journal of Communications and Networks
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• 제5권4호
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• pp.344-353
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• 2003

Ultra-wideband (UWB) technology is gaining increasing interest for its potential application to short-range indoor wireless communications. Utilizing ultra-short pulses, UWB baseband transmissions enable rich multipath diversity, and can be demodulated with low complexity receivers. Compliance with the FCC spectral mask, and interference avoidance to, and from, co-existing narrow-band services, calls for judicious design of UWB pulse shapers. This paper introduces pulse shaper designs for UWB radios, which optimally utilize the bandwidth and power allowed by the FCC spectral mask. The resulting baseband UWB systems can be either single-band, or, multi-band. More important, the novel pulse shapers can support dynamic avoidance of narrow-band interference, as well as efficient implementation of fast frequency hopping, without invoking analog carriers.