• 한국정보통신학회논문지
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• 제17권1호
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• pp.204-209
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• 2013

영상매체의 발전으로 영상처리가 여러 분야에 적용되고 있으며, 영상의 밝기가 급격히 변화하는 경계 부분은 에지가 중요한 정보와 특징을 포함하므로 영상의 특징을 분석함에 있어서 중요한 요소이다. 이러한 에지를 검출하기 위한 많은 연구가 계속되어 왔으며, 기존의 에지 검출 방법은 인접한 화소 사이에 대한 관계를 이용하여 수행 속도는 우수하나, 휘도 변화를 고려하지 않는 고정된 마스크를 이용하므로 에지검출 특성이 다소 미흡하다. 따라서 본 논문에서는 마스크의 휘도 변화를 이용한 새로운 알고리즘을 제안하였다.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2000년도 추계종합학술대회 논문집(1)
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• pp.325-328
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• 2000

This paper has been studied a rower amplifier for IMT-2000 handset. Circuit design is performed and optimized by using HP ADS RF software. Designed amplifier consist of 2 stage, has 25㏈ gain, over 27㏈m output power and about 40% power efficiency. Power amplifier operation frequency range is 1955${\pm}$70MHz. Mask layout of the designed Amplifier consisting of 4 mask. The measured results of these values are satisfying the specification of IMT-2000 handset.

• 한국광학회:학술대회논문집
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• 한국광학회 2000년도 하계학술발표회
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• pp.126-127
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• 2000

In this paper, we proposed an optical encryption method based in the concept of visual cryptography and interferometry. In our method a secret binary image was divided into two sub-images and they were encrypted by 'XOR' operation with a random key mask. Finally each encrypted image was changed into phase mask. By interference of these two phase masks the original image was obtained. Compared with general visual encryption method, this optical method had good signal-to-noise ratio due to no need to generate sub-pixels like visual encryption.

• 재활복지공학회논문지
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• 제10권2호
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• pp.141-146
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• 2016

본 논문에서는 설진시스템에서 혀 영역의 윤곽선을 정확하게 검출하기 위해 영역제한 마스크 연산과 능동 윤곽선 모델을 적용한다. 혀의 특징을 정확하게 분석하기 위하여 먼저, 혀 영역이 검출되어야 한다. 그러므로 혀 영역의 에지를 검출하기 위한 효율적인 분할 방법은 매우 중요하다. 20~30대 학생 30명으로 구성된 혀 영상 DB로 실험하였다. 실제 혀 영상에서의 실험은 좋은 결과를 보였다. 실험 결과, 제안된 방법이 마스크 연산을 사용하지 않는 방법에 비해 더 정확하게 혀 영역의 윤곽선을 추출하는 것을 확인할 수 있었다.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 1998년도 하계종합학술대회논문집
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• pp.781-784
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• 1998

An image segmentation approach based on the fuzzy worm searching and MIN-MAx clusterng algorithm is proposed in this paper. This algorithm deals with fuzzy worm value and min-max node at a gross scene level, which investigates the edge information including fuzzy worm action. But current segmentation methods based edge extraction methods generally need the mask information for the algebraic model, and take long run times at mask operation, wheras the proposed algorithm has single operation ccording to active searching of fuzzy worms. In addition, we also genetic min-max clustering using genetic algorithm to complete clustering and fuzyz searching on grey-histogram of image for the optimum solution, which can automatically determine the size of rnages and has both strong robust and speedy calculation. The simulation results showed that the proposed algorithm adaptively divided the quantized images in histogram region and performed single searching methods, significantly alleviating the increase of the computational load and the memory requirements.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1987년도 전기.전자공학 학술대회 논문집(II)
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• pp.1532-1535
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• 1987

In this paper, we propose the algorithm for mask level simulation. The circuit parameters were extracted from the photomask data in format of bitmap. The extracted circuit parameter was transformed into the input file format of SPICE-16. And then the simulation of mask pattern data was carried out the SPICE-16. Thus the error operation of IC due to the mistake of photomask pattern could be prevented.

• 전자공학회논문지C
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• 제34C권1호
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• pp.12-20
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• 1997

In this paper, we analyze the thermal deformation of mask frame assembly using finite element method(FEM) and predict the beam landing shift during tube operation. For realistic analysis, the apparent thermal conductivity and the apparent elastic modulus are calculated and the shadow mask is modeled as shell without aperatures. Also, all parts inside the tube are modeled and the each radiative effect is considered. Then the finite element analysis is performed for transient thermo-elastic deformation of the mask frame assembly and the beam landing shift is calculated. Experiments are eprformed for 17" cathode ray tube (CRT) to validate the FEM analysis. The temperatures of all parts inside the tube and beam landing shift on the panel are measured and the results are discussed in comparison with the results of the FEM analysis.ysis.

• 대한전자공학회논문지
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• 제24권1호
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• pp.149-158
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• 1987

This paper describes the SEAS which is a 2-dimensional graphic editor for schematic circuit and IC mask layout. This system runs on general purpose computer and Tektronix 4110 series graphic terminal. With this system, user can edit schematic circuits and/or IC mask layout with 2 level hierarchy. This system supports more than 20 kinds of built-in symbol, user definable internal symbols, 60 macros, 16 function keys, 4 level on-screen menu operation and edit-in-place of cell in main drawing. And it provides editing functions such as reflection, rotation, move and copy of one or a group of elements, and modification of polygona geometry etc. To improve the excution speed, we used local memory of graphic terminal. For the portability of the program, the system is written in FORTRAN 77 programming language.

• 청정기술
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• 제13권3호
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• pp.188-194
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• 2007

급속한 성장에 따른 디스플레이 산업에서의 생산량 증가는 원료 사용의 증가와 배출액의 증가를 야기하고 있으며 이에 따른 폐액 처리양이 증가되어 환경적, 경제적 문제점을 안고 있다. 본 연구에서는 브라운관 소재인 shadow mask의 식각공정 시 사용한 식각용액의 피로도를 감수시키기 위하여 산화반응을 이용하여 신액 사용량과 구액 배출량을 최소화해주는 GRS(Green Recycling System)공정의 수율을 향상시키기 위해 실험실 및 현장적용 실험을 통하여 공정의 최적화를 하기위한 방법을 연구하였다. 공정변수들과 GRS 공정의 수율과의 관계를 규명하였으며 GRS 반응기의 내부구조 개선으로 인해 약 10%의 수율증가를 확인하였으며 공정의 수율 향상과 최적화에 큰 도움이 되었다.

• 한국산업보건학회지
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• 제32권2호
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• pp.111-115
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• 2022

Objectives: The purpose of this study is to verify whether droplet-induced propagation, the main route of infectious diseases such as COVID-19, can occur in semiconductor FAB (Fabrication), based on research results on general droplet propagation. Methods: Through data surveys droplet propagation was modeled through simulation and experimental case analysis according to general (without mask) and mask-wearing conditions, and the risk of droplet propagation was inferred by reflecting semiconductor FAB operation conditions (air current, air conditioning system, humidity, filter conditions). Results: Based on the results investigated to predict the possibility of spreading infectious diseases in semiconductor FAB, the total amount of droplet propagation (concentration), propagation distance, and virus life in FAB were inferred by reflecting the management parameter of semiconductor FAB. Conclusions: The total amount(concentration) of droplet propagation in the semiconductor fab is most affected by the presence or absence of wearing a mask and the line air dilution rate has some influence. when worn it spreads within 0.35~1m, and since the humidity is constant the virus can survive in the air for up to 3 hours. as a result the semiconductor fab is judged to be and effective space to block virus propagation due to the special environmental condition of a clean room.