• Title/Summary/Keyword: MICP source

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Via Contact and Deep Contact Hole Etch Process Using MICP Etching System (Multi-pole Inductively Coupled Plasma(MICP)를 이용한 Via Contact 및 Deep Contact Etch 특성 연구)

  • 설여송;김종천
    • Journal of the Semiconductor & Display Technology
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    • v.2 no.3
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    • pp.7-11
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    • 2003
  • In this research, the etching characteristics of via contact and deep contact hole have been studied using multi-pole inductively coupled plasma(MICP) etching system. We investigated Plasma density of MICP source using the Langmuir probe and etching characteristics with RF frequency, wall temperature, chamber gap, and gas chemistry containing Carbon and Fluorine. As the etching time increases, formation of the polymer increases. To improve the polymer formation, we controlled the temperature of the reacting chamber, and we found that temperature of the chamber was very effective to decrease the polymer thickness. The deep contact etch profile and high selectivity(oxide to photoresist) have been achieved with the optimum mixed gas ratio containing C and F and the temperature control of the etching chamber.

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MICP(Multi-pole Inductively Coupled Plasma)를 이용한 deep contact etch 특성 연구

  • 김종천;구병희;설여송
    • Proceedings of the Korean Society Of Semiconductor Equipment Technology
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    • 2003.05a
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    • pp.12-17
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    • 2003
  • 본 연구에서는 MICP Etching system 을 이용한 Via contact 및 Deep contact hole etch process 특성을 연구하였다. Langmuir probe 를 이용한 MICP source 의 Plasma density & electron temperature 측정하였고 탄소와 플로우르를 포함하는 혼합 Plasma 를 형성하여 RF frequency, wall temperature, chamber gap, gas chemistry 등의 변화에 따른 식각 특성을 조사하였다. Plasma density 는 1000w 에서 $10^{11}$/$cm^3$ 이상의 high density plasma와 uniform plasma 형성을 확인하였고 $CH_{2}F_{2}$와 CO의 적절한 혼합비를 이용하여 Oxide to PR 선택비가 10 이상인 고선택비 조건을 확보하였다. 고선택비 형성에 따라 Polymer 형성이 많이 되었고 이를 개선하기 위하여 반응 챔버의 온도 조절을 통하여 Polymer 증착 방지에 효과적인 것을 확인하였다. MICP source를 이용하여 탄소와 플로우르의 혼합 가스와 식각 챔버의 온도 조절에 의한 선택비 증가를 확보하여 High Aspect Ratio Contact Hole Etch 가능성을 확보하였다.

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Solidification of uranium mill tailings by MBS-MICP and environmental implications

  • Niu, Qianjin;Li, Chunguang;Liu, Zhenzhong;Li, Yongmei;Meng, Shuo;He, Xinqi;Liu, Xinfeng;Wang, Wenji;He, Meijiao;Yang, Xiaolei;Liu, Qi;Liu, Longcheng
    • Nuclear Engineering and Technology
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    • v.54 no.10
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    • pp.3631-3640
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    • 2022
  • Uranium mill tailing ponds (UMTPs) are risk source of debris flow and a critical source of environmental U and Rn pollution. The technology of microbial induced calcium carbonate precipitation (MICP) has been extensively studied on reinforcement of UMTs, while little attention has been paid to the effects of MICP on U & Rn release, especially when incorporation of metakaolin and bacillus subtilis (MBS). In this study, the reinforcement and U & Rn immobilization role of MBS -MICP solidification in different grouting cycle for uranium mill tailings (UMTs) was comprehensively investigated. The results showed that under the action of about 166.7 g/L metakaolin and ~50% bacillus subtilis, the solidification cycle of MICP was shortened by 50%, the solidified bodies became brittle, and the axial stress increased by up to 7.9%, and U immobilization rates and Rn exhalation rates decrease by 12.6% and 0.8%, respectively. Therefore, the incorporation of MBS can enhance the triaxial compressive strength and improve the immobilization capacity of U and Rn of the UMTs bodies solidified during MICP, due to the reduction of pore volume and surface area, the formation of more crystals general gypsum and gismondine, as well as the enhancing of coprecipitation and encapsulation capacity.