• Journal of the Institute of Electronics Engineers of Korea SD
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• v.41 no.2
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• pp.67-75
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• 2004

This paper presents a buffer insertion method for RLC-class interconnect structured as a sin91e line or a tree. First, a closed form expression for the interconnect delay of a CMOS buffer driving single RLC line is represented. This expression has been derived by the n-th power law for deep submicrometer technology and occurs to be within 9 percentage of maximal relative error in accuracy compared with the results of HSPICE simulation for various RLC loads. This paper proposes a closed form expression based on this for the buffer insertion of single RLC lines and the buffer sizing algorithms for RLC tree interconnects to optimize path delays. The proposed buffer insertion algorithms are applied to insert buffers for several interconnect trees with a 0.25${\mu}{\textrm}{m}$ CMOS technology and the results are compared against those of HSPICE.

• Journal of the Korean Society of Propulsion Engineers
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• v.26 no.2
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• pp.40-46
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• 2022

Hall thrusters are one of the electric propulsion, where ions are accelerated to generate thrust and are widely utilized in space missions due to their high specific impulses. Recently, as the utilization of small and micro satellites with the mass of similar or less than 100 kg is highly increasing, the importance of research and development of the low-power electric propulsion is also raised. In this study, we developed two sub-200 W or less class, laboratory model Hall thrusters and measured the thrust and analyzed the discharge characteristics. Consequently, we obtained 2.5-9.0 mN of thrust, 600-1,150 s of specific impulse, and 15-28% of anode efficiency at 50-175 W of anode power.

• Journal of the Korean Society of Propulsion Engineers
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• v.25 no.5
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• pp.65-72
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• 2021

700 W class laboratory model Hall thruster, which can be used for the orbit control or station keeping of small satellites, was developed. The size of the discharge channel was determined using a scaling law, and the magnetic field was designed to be symmetric with respect to the midline of the discharge channel and to be maximized outside the discharge channel. Base pressure of a vacuum chamber was maintained below 2.0×10^-5 Torr during experiments, and the thrust was measured by a thrust stand. The anode flow rate and coil current were varied with the fixed anode voltage at 300 V. Under the operation condition at 2.36 mg/s anode flow rate and 2.4 A coil current, performance was optimized as 38 mN thrust, 1,540 s total specific impulse, and 50 % anode efficiency at 620 W anode power.

• Proceedings of the IEEK Conference
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• 2005.11a
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• pp.937-940
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• 2005

In this paper, the design of high current and high performance Regulatior IC using BCD Technology are presented. We design the 5A class regulator IC including the VDMOS Pass Tr. of N-sink array structure. Also, to obtain the high current and low power characteristics, the PMOS and BJT device are adapted for the Pass Tr. It is shown that simulation results of Regulator IC with VDMOS Pass Tr. have the Iout=4.5092A, LDO=7.3mV.

• Mass Spectrometry Letters
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• v.9 no.3
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• pp.81-85
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• 2018

In this study, the chemical composition of bacterial melanin isolated from the Streptomyces glaucescens strain was elucidated by ultra-high-resolution Fourier transform ion cyclotron resonance (FT-ICR) mass spectrometry. Ultra-high-resolution mass profiles of the microbial melanin product were acquired using a 15 Tesla FT-ICR mass spectrometer in positive and negative ion modes via electrospray ionization to obtain more complete descriptions of the molecular compositions of melanin-derived organic constituents. A mass resolving power of 500,000 (at m/z 400) was achieved for all spectra while collecting 400 scans per sample with a 4 M transient. The results of this analysis revealed that the melanin pigment isolated from S. glaucescens predominantly exhibits CHON and CHO species, which belong to the proteins class of compounds, with the mean C/O and C/N ratios of 4.3 and 13.1, thus suggesting that the melanin could be eumelanin. This analytical approach could be utilized to investigate the molecular compositions of a variety of natural or synthetic melanins. The compositional features of melanins are important for understanding their formation mechanisms and physico-chemical properties.

• Journal of IKEEE
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• v.14 no.2
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• pp.51-57
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• 2010

A CMOS rail-to-rail high voltage buffer amplifier is proposed to drive the gamma correction reference voltage of large TFT LCD panels. It is operating by a single supply and only shows current consumption of 0.5mA at 18V power supply voltage. The circuit is designed to drive the gamma correction voltage of 8-bit or 10-bit high resolution TFT LCD panels. The buffer has high slew rate, 0.5mA static current and 1k$\Omega$ resistive and capacitive load driving capability. Also, it offers wide supply range, offset voltages below 50mV at 5mA constant output current, and below 2.5mV input referred offset voltage. To achieve wide-swing input and output dynamic range, current mirrored n-channel differential amplifier, p-channel differential amplifier, a class-AB push-pull output stage and a input level detector using hysteresis comparator are applied. The proposed circuit is realized in a high voltage 0.18um 18V CMOS process technology for display driver IC. The circuit operates at supply voltages from 8V to 18V.

• Proceedings of the KIPE Conference
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• 2019.07a
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• pp.230-232
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• 2019

Light Triggerd Thyristor (LTT)는 HVDC 및 산업용 스위치 등에 사용되는 대전력 반도체소자이다. 일반적인 Thyristor가 전기적 신호에 의해 trigger 되는 것과는 다르게 LTT는 광신호에 의해 동작하는 소자이다. 본 논문에서는 5,000V, 2,200A 급의 4인치 LTT 소자의 제작 및 전기적인 특성평가 결과를 기술하였다. 4인치 LTT의 구조적인 특징은 전면부 중앙에 광신호가 주입되는 수광부가 위치해 있으며 입력 전류 증폭을 위한 4-단계 증폭 게이트 (gate) 구조를 가지도록 설계하였다. $400{\Omega}{\cdot}cm$ 비저항을 갖는 1mm 두께의 n-형 실리콘 웨이퍼에 boron 이온주입과 열처리 공정으로 약 $30{\mu}m$ 깊이의 p-base를 형성하였으며, 고내압 저지를 위한 edge termination은 VLD (variable lateral doping) 기술을 적용하였다. 제작된 4인치 LTT는 6,500 V의 순방향 항복전압 ($V_{DRM}$) 특성을 나타내었으며, 100V의 어노드전압 ($V_A$)과 20 mA의 게이트전류 ($I_G$)에 의하여 thyristor가 trigger 됨을 확인하였다. 제작한 LTT 소자는 disk형 press-pack 패키지를 진행한 후, LTT의 수광부에 $10{\mu}s$, 50 mW의 900 nm 광 펄스를 조사하여 전류 특성을 평가하였다. LTT 패키지 샘플에 60 Hz 주파수의 광 펄스를 조사한 경우 2,460 A의 순방향 평균전류 ($I_T$)와 $336A/{\mu}s$의 반복전류상승기울기 (repetitive di/dt)에 안정적으로 동작함을 확인하였다. 또한, 펄스 전류 시험의 경우 61.6 kA의 최대 통전 전류 (ITSM, surge current)와 $1,050A/{\mu}s$의 펄스전류 상승 기울기 (di/dt of on-state pulse current)에도 LTT의 손상 없이 동작함을 확인하였다.

• KIEE International Transactions on Electrophysics and Applications
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• v.5C no.3
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• pp.102-110
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• 2005

Piezoelectric transformers(PT) are expected to be small, thin and highly efficient, and which are attractive as a transformer with high power density for step down voltage. For these reasons, we have attempted to develop a step-down PT for the miniaturized adaptor. We propose a PT, operating in thickness extensional vibration mode for step-down voltage. This PT consists of a multi-layered construction in the thickness direction. In order to develop the step-down PT of 10 W class and turn ratio of 0.1 with high efficiency and miniaturization, the piezoelectric ceramics and PT designs are estimated with a variety of characteristics. The basic composition of piezoelectric ceramics consists of ternary yPb(Zr$_{x}$Ti$_{1-x}$)O$_{3}$-(1-y)Pb(Mn$_{1/3}$Nb1$_{1/3}$Sb$_{1/3}$)O$_{3}$. In the piezoelectric characteristics evaluations, at y=0.95 and x=0.505, the electromechanical coupling factor(K$_{p}$) is 58$\%$, piezoelectric strain constant(d$_{33}$) is 270 pC/N, mechanical quality factor(Qr$_{m}$) is 1520, permittivity($\varepsilon$/ 0) is 1500, and Curie temperature is 350 $^{\circ}C$. At y = 0.90 and x = 0.500, kp is 56$\%$, d33 is 250 pC/N, Q$_{m}$ is 1820, $\varepsilon$$_{33}$$^{T}$/$\varepsilon$$_{0}$ is 1120, and Curie temperature is 290 $^{\circ}C$. It shows the excellent properties at morphotropic phase boundary regions. PZT-PMNS ceramic may be available for high power piezoelectric devices such as PTs. The design of step-down PTs for adaptor proposes a multi-layer structure to overcome some structural defects of conventional PTs. In order to design PTs and analyze their performances, the finite element analysis and equivalent circuit analysis method are applied. The maximum peak of gain G as a first mode for thickness extensional vibration occurs near 0.85 MHz at load resistance of 10 .The peak of second mode at 1.7 MHz is 0.12 and the efficiency is 92$\%$.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.148-148
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• 2011

Recently, there have been many research activities to develop the large-area plasma source, which is able to generate the high-density plasma with relatively good uniformity, for the plasma processing in the thin-film solar cell and display panel industries. The large-area CCP sources have been applied to the PECVD process as well as the etching. Especially, the PECVD processes for the depositions of various films such as a-Si:H, ${\mu}c$-Si:H, Si3N4, and SiO2 take a significant portion of processes. In order to achieve higher deposition rate (DR), good uniformity in large-area reactor, and good film quality (low defect density, high film strength, etc.), the application of VHF (>40 MHz) CCP is indispensible. However, the electromagnetic wave effect in the VHF CCP becomes an issue to resolve for the achievement of good uniformity of plasma and film. Here, we propose a new electrode as part of a method to resolve the standing wave effect in the large-area VHF CCP. The electrode is split up a series of strip-type electrodes and the strip-type electrodes and the ground ones are arranged by turns. The standing wave effect in the longitudinal direction of the strip-type electrode is reduced by using the multi-feeding method of VHF power and the uniformity in the transverse direction of the electrodes is achieved by controlling the gas flow and the gap length between the powered electrodes and the substrate. Also, we provide the process results for the growths of the a-Si:H and the ${\mu}c$-Si:H films. The high DR (2.4 nm/s for a-Si:H film and 1.5 nm/s for the ${\mu}c$-Si:H film), the controllable crystallinity (~70%) for the ${\mu}c$-Si:H film, and the relatively good uniformity (1% for a-Si:H film and 7% for the ${\mu}c$-Si:H film) can be obtained at the high frequency of 40 MHz in the large-area discharge (280 mm${\times}$540 mm). Finally, we will discuss the issues in expanding the multi-electrode to the 8G class large-area plasma processing (2.2 m${\times}$2.4 m) and in improving the process efficiency.