Investigation of phenol phormaldehyde-based photoresist at an initial stage of destruction in $O_2$ and $N_2O$ radiofrequency discharges
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- 한국전기전자재료학회:학술대회논문집
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- 한국전기전자재료학회 2007년도 추계학술대회 논문집
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- pp.214-215
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- 2007