• Title/Summary/Keyword: Light exposure time

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A STUDY ON THE MODE OF POLYMERIZATION OF LIGHT-CURED RESTORATIVE MATERIALS CURED WITH THREE DIFFERENT LIGHT SOURCES (광원의 유형에 따른 광중합 수복재의 중합양상)

  • Kwon, Min-Seok;Jung, Tae-Sung;Kim, Shin
    • Journal of the korean academy of Pediatric Dentistry
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    • v.30 no.2
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    • pp.229-237
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    • 2003
  • The purpose of this study was to compare the effect of exposure time on the polymerization of surface and 2 mm below the surface of light-cured restorative materials cured with three different light sources; conventional halogen light curing unit(XL 3000, 3M, U.S.A.), plasma arc light curing unit(Flipo, LOKKI, France) and light emitting diode(LED) light curing unit(Elipar Free light, 3M, U.S.A.) and compare the uniformity of polymerization from the center to the periphery of resin surfaces according to polymerization diameter cure with three different light sources. From the experiment, the following results were obtained. 1. In Z-100, Plasma arc light exposure time of 6 to 9 seconds and LED light exposure time of 40 to 60 seconds produced microhardness values similar to those produced with 40 second exposure to a conventional halogen light(p>0.05). 2. In Tetric Flow, Plasma arc light exposure time of 9 seconds and LED light exposure time of 40 to 60 seconds produced microhardness values similar to those produced with 40 second exposure to a conventional halogen light(p>0.05). 3. In Dyract AP, Plasma arc light exposure time of 6 to 9 seconds and LED light exposure time of 20 to 40 seconds produced microhardness values similar to those produced with 40second exposure to a conventional halogen light(p>0.05). 4. In Fuji II LC, Plasma arc light exposure time of 9 seconds and LED light exposure time of 20 to 60 seconds produced microhardness values similar to those produced with 40second exposure to a conventional halogen light(p>0.05). 5. Except Fuji II LC, microhardness was decreased from the center to the periphery in all light sources(p<0.05).

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COMPENSATION EFFECT OF EXPOSURE TIME INCREASE TO DECREASED LIGHT INTENSITY OF VISIBLE-LIGHT CURING UNIT (가시광선 중합기의 조사강도 감소에 대한 조사시간 증가의 보상효과)

  • Yoon, Tae-Won;Lee, Chang-Seop;Lee, Sang-Ho
    • Journal of the korean academy of Pediatric Dentistry
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    • v.24 no.1
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    • pp.325-336
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    • 1997
  • The purpose of this study was to evaluate the compensation effect of exposure duration increase to decreased light intensity of visible-light curing unit. The specimen with 2mm thickness was made of Restorative $Z-100^{TM}$ (A2 shade, 3M Dental Products, U.S.A.) and cured with $Optilux^{TM}$ (Demetron Research Co. U.S.A.). The light intensity was controlled to 420 $mW/cm^2$, 540 $mW/cm^2$, 630 $mW/cm^2$ and curing time, also, controlled to 40, 60, 80 seconds. Cured specimen was stored in a light-proof container for 24 hours to post-irradation was completed. Microhardness of top and bottom surface of specimen were measured to evaluate the depth of cure. The obtained results were as follows: 1. The microhardness of top and bottom surface of the composite resin specimen was increased significantly as light intensity and exposure time was increased (P<0.01). 2. Light intensity was more correlated with bottom microhardness(${\gamma}{\geq}$0.438) than top microhardness(${\gamma}{\geq}$0.213), and exposure time was more correlated with top microhardness (${\gamma}{\geq}$0.424) than bottom microhardness(${\gamma}{\geq}$0.335). 3. The regressive equation was obtained in this study as follows : $H=0.07{\times}D+0.012{\times}I+76$ (H : Microhardness(KHN), D : Exposure time, I : Light intensity)

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THE MICROHARDNESS AND THE DEGREE OF CONVERSION OF LIGHT CURED COMPOSITE RESIN AND DUAL CURED RESIN CEMENTS UNDER PORCELAIN INLAY (도재인레이 하방에서 광중합형 복합레진과 이중중합형 복합레진시멘트의 미세경도와 중합률에 관한 연구)

  • Kim, Seung-Soo;Cho, Sung-Sik;Um, Chung-Moon
    • Restorative Dentistry and Endodontics
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    • v.25 no.1
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    • pp.17-40
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    • 2000
  • Resin cements are used for cementing indirect esthetic restorations such as resin or porcelain inlays. Because of its limitations in curing of purely light cured resin cements due to attenuation of the curing light by intervening materials, dual cured resin cements are recommended for cementing restorations. The physical properties of resin cements are greatly influenced by the extent to which a resin cures and the degree of cure is an important factor in the success of the inlay. The purpose of this study was to evaluate the influence of porcelain thickness and exposure time on the polymerization of resin cements by measuring the microhardness and the degree of conversion, to investigate the nature of the correlation between two methods mentioned above, and to determine the exposure time needed to harden resin cements through various thickness of porcelain. The degree of resin cure was evaluated by the measurements of microhardness [Vickers Hardness Number(VHN)] and degree of conversion(DC), as determined by Fourier Transform Infrared Spectroscopy(FTIR) on one light cured composite resin [Z-100(Z)] and three dual cured resin cements [Duo cement(D), 3M Resin cement(R), and Dual cement(DA)] which were cured under porcelain discs thickness of 0mm, 1mm, 2mm, 3mm with light exposure time of 40sec, 80sec, 120sec, and regression analysis was performed to determine the correlation between VHN and DC. In addition, to determine the exposure time needed to harden resin cements under various thickness of porcelain discs, the changes of the intensity of light attenuated by 1mm, 2mm, and 3mm thickness of porcelain discs were measured using the curing radiometer. The results were obtained as follows ; 1. The values of microhardness and the degree of conversion of resin cements without intervening porcelain discs were 31~109VHN and 51~63%, respectively. In the microhardness Z was the highest, followed by R, D, DA. In the degree of conversion, D and DA was significantly greater than Z and R(p<0.05). 2. The microhardness and the degree of conversion of the resin cements decreased with increasing thickness of porcelain discs, and increased with increasing exposure time, D and R showed great variation with inlay thickness and exposure time, whereas, DA showed a little variation. 3. The intensity of light through 1mm, 2mm, and 3mm porcelain inlays decreased by 0.43, 0.25, and 0.14 times compared to direct illumination, and the respective needed exposure times are 53 sec, 70 sec, and 93 sec. In D and R, 40 sec of light irradiation through 2mm porcelain disc and 80 sec of light irradiation through 3mm porcelain disc were not enough to complete curing. 4. The microhardness and the degree of conversion of the resin cements showed a positive correlationship(R=0.791~0.965) in the order of R, D, Z, DA. As the thickness of porcelain discs increased, the decreasing pattern of microhardness was different from that of the degree of conversion, however.

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A STUDY ON THE CHANGES IN POLYMERIZATION OF LIGHT-ACTIVATED COMPOSITE RESIN WITH VARIOUS EXPOSURE TIME AND DISTANCE (광중합형 복합레진의 중합시간과 거리에 따른 중합도의 변화)

  • Ahn, Myung-Ki;Jeong, Tae-Sung;Kim, Shin
    • Journal of the korean academy of Pediatric Dentistry
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    • v.28 no.2
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    • pp.293-299
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    • 2001
  • The aim of this study was to evaluate the effect of the distance of the light tip to the surface of restoration and exposure time on the polymerization of surface and 2mm below the surface of light-activated composite resins. Two light-activated composite resins were used. From the experiment, the following results were obtained. 1. Relative light intensity rapidly decreased when distance of the light tip to the surface of material is more than 2mm(p<0.05). 2. In all groups, microhardness was increased according to the increase of relative light intensity and exposure time(p<0.05). 3. The distance of the light tip to the surface of restoration and exposure time more affected 2mm below the surface rather than the surface(p<0.05). 4. Although exposure time was increased, difference of microhardness of the 2mm below the surface with the distance of the light tip to the surface of restoration was relatively high in Z100 between below 4mm and other groups and Z250 between below 2mm and other groups(p<0.05).

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Effects of light direction and exposure times of plasma arc light on shear bond strength of metal brackets (Plasma arc light를 이용한 금속 브라켓의 부착시 광조사 방향과 중합시간이 전단결합강도에 미치는 영향)

  • Roh, Sang-Jeong;Lee, Hyun-Jung;Jeon, Young-Mi;Kim, Jong-Ghee
    • The korean journal of orthodontics
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    • v.34 no.5 s.106
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    • pp.429-438
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    • 2004
  • The purpose of this study was to compare the effects of different light direction exposure times and setting times when using plasma arc light on shear bond strength of metal brackets. 240 extracted human premolars were randomly assigned to one of 16 groups Standardized brackets were bonded to enamel using different light curing units (Plasma arc light and Halogen light), exposure times (Plasma arc light 2. 4, 6 seconds and Halogen light 20 seconds). and light directions [Vertical direction [V] and Oblique direction [O]). 8 groups were tested after 5 minutes and the remaining 8 groups after 24 hours. The metal brackets were bonded with Transbond XT. Shear bond strength was measured by a universal testing machine. The results were as fellows: There were as differences between the shear bond strengths of the Vertical groups (V) and Oblique groups (O). regardless of exposure times and types of light curing units (p>0.05). The shear bond strength of the group with 2 seconds of plasma light were significantly lower than other exposure time groups (P<0.05). The shear bond strength tested after 5 minutes was lower than after 24 hours (p<0.05) The Adhesive Remment Index (ARI) score showed no statistically significant difference among the different groups. The results of this study suggested that the light direction of plasma arc light had no influence on the shear bond strength of metal brackets to enamel. and exposure times more than 4 seconds produced shear bond strengths similar to those Produced with a conventional halogen curing light.

CMOS Image Automatic Exposure System With Real-time and Robustness Style for the Journal of Korean Contents (실시간성과 강건성을 갖는 CMOS 자동노출 시스템)

  • Choi, Wonseok;Kim, HeeSu;Kim, Jaehyun;Cho, Youngki;Choi, Sungho;Lee, Yongseon
    • The Journal of the Korea Contents Association
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    • v.20 no.10
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    • pp.1-13
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    • 2020
  • There are many factors that influence the image quality of CMOS camera images, among which the image exposure time is an important factor. If the image exposure time is long, the entire image on the screen becomes brighter. If the exposure time is shorter, the entire image becomes darker. When photographing a still image, real time is not required because the automatic exposure system is given sufficient time to obtain an appropriate exposure time. However, if the surroundings and environment change rapidly like the black box of a driving car, the exposure time should be applied in response to real time. To this end, a robust automatic exposure system for real-time performance and ambient light environment is required. An automatic exposure system that has real-time capability and is robust against the ambient light environment is required. we designed a real-time control sysem capable of parallel operation processing through the design of an embedded system using zynq's logic and ARM core, and developed a real-time CMOS automatic exposure system that is robust to noise and converges to a desired target value within 66 ms through PID control.

Changes in Sleep Patterns and Mood States of Shift Workers Following Nocturnal Light Exposure (교대근무자에서 야간 광 노출에 따른 수면양상 및 기분상태 변화)

  • Kwon, Ki-Bum;Yoon, In-Young;Kang, Sang-Bum;Jeong, Do-Un
    • Sleep Medicine and Psychophysiology
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    • v.6 no.1
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    • pp.68-75
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    • 1999
  • Objectives: We intended to observe changes in sleep patterns and mood states of night-shift workers following light exposure. We also estimated the degree of tolerance of light exposure. By studying these, we investigated the possibility of applying light therapy to night-shift workers for improving their adaptation. Methods: Twelve night-shift nurses working at Yong-In Mental Hospital volunteered to participate in this study. The study consisted of 3 parts: 1) night-shift control study; 2) light exposure study; 3) day-shift control study. All the nurses accomplished 3 parts of the study, each of which continued for 3 days, except one nurse who did not participate in day-shift control study. During light exposure study, nurses were exposed to bright light for 4 hours from 1AM to 5AM. Sleep patterns were evaluated with wrist actigraphy and automatic sleep analysis program. Mood states and side effects of light exposure were assessed with self-report scales. Results: Sleep period time, total sleep time, and sleep efficiency were increased following light exposure compared with night-shift control study. Light exposure study showed no difference from day-shift control study in above-mentioned sleep parameters. Daily fluctuation of sleep efficiency was less prominent during light exposure study than during night-shift control study. During light exposure study, the subjects felt more elated and energetic in the evening after daytime sleep than during night-shift control study. None of the subjects complained of severe side effects related to light exposure on the third day of light exposure. Tolerance of side effects was noted to develop with the repetition of light exposure. Conclusion: Light exposure improved the daytime sleep of night-shift workers to the level of normal nighttime sleep, making the subjects more elated and energetic. Side effects of light exposure were found to be tolerable. Light exposure seems to be safely applicable to night-shift workers for their adaptation.

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A STUDY ON THE MODE OF POLYMERIZATION OF LIGHT-CURED RESTORATIVE MATERIALS CURED WITH PLASMA ARC LIGHT CURING UNIT (Plasma arc light curing unit을 이용한 광중합형 수복재의 중합양상)

  • Woo, Youn-Sun;Jeong, Tae-Sung;Kim, Shin
    • Journal of the korean academy of Pediatric Dentistry
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    • v.29 no.2
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    • pp.262-269
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    • 2002
  • The purpose of this study was to compare the effect of distance of light tip to resin surfaces and exposure time on the polymerization of surface and 2 mm subsurface of composite resins cured with two light sources; conventional halogen light (XL 3000, 3M, U.S.A.) and plasma arc light (Flipo, LOKKI, France) and compare the uniformity of polymerization from the center to the periphery of resin surfaces according to polymerization diameter cure with two light sources. From the experiment, the following results were obtained. 1. Difference of relative light intensity decrease in plasma arc light smaller than that of conventional halogen light(p<0.05). 2. In all groups, microhardness of top surfaces was decreased when distance of the light tip to resin surfaces is more than 2mm and increased according to increase of exposure time(p<0.05). 3. Difference of microhardness of the 2mm subsurface was rapidly decreased when distance of light tip to resin surfaces is more than 4mm(except, plasma arc light exposure time of 3 seconds). and the distance of light tip to resin surfaces and exposure time more affected 2mm subsurface rather than top surface(p<0.05). 4. Although exposure time was increased, difference of microhardness of the 2mm subsurface with the distance of light tip to resin surfaces was relatively high in groups between below 4mm and 6 mm(p<0.05). 5. Plasma arc light exposure time of 6 to 9 seconds produced microhardness values and microhardness change according to various distance similar to those produced with 40 to 80 second exposure to a conventional halogen light(p>0.05). 6. In all groups, microhardness was decreased gradually from the center to the periphery of resin surfaces(p<0.05).

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Photographic Observation and Reduction Technique by a Multiple-exposure Procedure (Multiple-exposure 방법에 의한 사진관측과 그 처리법)

  • Jeong, Jang-Hae
    • Journal of The Korean Astronomical Society
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    • v.8 no.1
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    • pp.15-23
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    • 1975
  • A new technique of photographic observations is developed for the determination of time of minimum light of eclipsing binary. An instrumental system to accomplish the observation is described. With this instrument the atmospheric extinction coefficients in Seoul are observed, and four times of minimum light for Algol and W UMa are determined.

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Photographic Color Reproduction Based on Color Variation Characteristics of Digital Camera

  • Kim, Ui-Seong;Lee, Jong-Min;Kim, Yong-Min;Park, Ki-Tae;Moon, Young-Shik
    • KSII Transactions on Internet and Information Systems (TIIS)
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    • v.5 no.11
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    • pp.2160-2174
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    • 2011
  • In this paper, a new technique for color reproduction based on color variation characteristics of digital camera under a dim light condition is proposed. Generally, photographers should adjust a camera exposure properly for obtaining an image with real color tone of subjects. Thus, in case of taking a picture under a dim light condition, the exposure time of a camera has to be relatively longer than the one under a bright light condition. Although images with real color tone of the subject are obtained, the images may get blurred due to the shaky hands of photographer holding the camera. In order to avoid the blur effect, an input image is captured from a camera set as a short exposure time under a dim light condition. Then we propose a method to reproduce color tone of the dim input image. To this end, color variation characteristics which represent color variations of a digital camera are first extracted by analyzing the Macbeth color checker images taken under various exposure values. Then, a color reproduction is performed by an estimation based on the color variation characteristics. Experimental results have shown that the proposed method has achieved better performance of color reproduction, compared with existing methods.