• 제목/요약/키워드: Laser beam homogenizer

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Analysis of the Square Beam Energy Efficiency of a Homogenizer Near the Target for Laser Shock Peening

  • Kim, Taeshin;Hwang, Seungjin;Hong, Kyung Hee;Yu, Tae Jun
    • Journal of the Optical Society of Korea
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    • 제20권3호
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    • pp.407-412
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    • 2016
  • We analyzed through numerical simulations the properties of a square beam homogenizer near the target for laser shock peening. The efficiency was calculated near the target by considering the plasma threshold of the metals. We defined the depth of focus of the square beam homogenizer with a given efficiency near the target. Then, we found the relationship between the depth of focus for the laser shock peening and four main parameters of the square beam homogenizer: the plasma threshold of the metal, the number of lenslets in the array-lens, the focal length of the condenser lens and the input beam size.

주기적인 홀로그램을 이용한 레이저 광 세기 균일화기에서 균일도를 최적화하기 위한 홀로그램의 조건 (The Conditions of a Holographic Homogenizer to Optimize the Intensity Uniformity)

  • 고춘수;오용호;임성우
    • 한국전기전자재료학회논문지
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    • 제24권7호
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    • pp.578-583
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    • 2011
  • We report on the design of a holographic homogenizer composed of a periodic hologram and a condensing lens. If the hologram is periodic, the homogenizer is free from the alignment error of the incident laser beam. Holographic homogenizer also has an advantage of the flexibility in the size of the target beam. We calculated theoretically the Fraunhofer diffracted wave function when a rectangular laser beam is incident on a periodic hologram. The diffracted wave is the sum of sinc functions at regular distance. The width of each sinc function depends on the size of the incident laser beam and the distance between the sinc functions depends on the period of the hologram. We calculated numerically the diffracted light intensity for various ratios of the size of the incident laser beam to the period of the hologram. The results show that it is possible to make the diffracted beam uniform at a certain value of the ratio. The uniformity is high at the central part of the target area and low near the edge. The more sinc functions are included in the target area, the larger portion of the area becomes uniform and the higher is the uniformity at the central part. Therefore, we can make efficient homogenizer if we design a hologram so that the maximum number of the diffracted beams may be included in the target area.

Numerical Analysis of Working Distance of Square-shaped Beam Homogenizer for Laser Shock Peening

  • Kim, Taeshin;Hwang, Seungjin;Hong, Kyung Hee;Yu, Tae Jun
    • Current Optics and Photonics
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    • 제1권3호
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    • pp.221-227
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    • 2017
  • To apply a square-shaped beam homogenizer to laser shock peening, it should be designed with a long working distance and by considering metal targets with various shapes and textures. For long working distances, a square-shaped beam homogenizer with a long depth of focus is required. In the range of working distance, the laser beam is required to have not only high efficiency but high uniformity, in other words, a good peening quality is guaranteed. In this study, we defined this range as the working distance for laser shock peening. We have simulated the effect of some parameters on the working distance. The parameters include the focal length of the condenser lens, pitch size of the array lens, and plasma threshold of the metal. The simulation was performed through numerical analysis by considering the diffraction effect.

Wide-fan-angle Flat-top Linear Laser Beam Generated by Long-pitch Diffraction Gratings

  • Lee, Mu Hyeon;Ryu, Taesu;Kim, Young-Hoon;Yang, Jin-Kyu
    • Current Optics and Photonics
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    • 제5권5호
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    • pp.500-505
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    • 2021
  • We demonstrated a wide-fan-angle flat-top irradiance pattern with a very narrow linewidth by using an aspheric lens and a long-pitch reflective diffraction grating. First, we numerically designed a diffraction-based linear beam homogenizer. The structure of the Al diffraction grating with an isosceles triangular shape was optimized with 0.1-mm pitch, 35.5° slope angle, and 0.02-mm radius of the rounding top. According to the numerical results, the linear uniformity of the irradiance was more sensitive to the working distance than to the shape of the Al grating. The designed Al grating reflector was fabricated by using a conventional mold injection and an Al coating process. A uniform linear irradiance of 405-nm laser diode with a 100-mm flat-top length and 0.176-mm linewidth was experimentally demonstrated at 140-mm working distance. We believe that our proposed linear beam homogenizer can be used in various potential applications at a precise inspection system such as three-dimensional morphology scanner with line lasers.

엑시머 레이저를 사용한 LLO 시스템 설계 및 분석 (Design and Analysis of a Laser Lift-Off System using an Excimer Laser)

  • 김보영;김준하;변진아;이준호;서종현;이종무
    • 한국광학회지
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    • 제24권5호
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    • pp.224-230
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    • 2013
  • 레이저 리프트 오프(Laser Lift-Off: LLO)는 수직형 LED 제조를 위하여 GaN 또는 AlN 박막을 사파이어 웨어퍼로부터 레이저를 이용하여 제거하는 공정으로 광원, 레이저의 출력 파워를 조절해주는 감쇠기, 빔의 형태를 잡아주는 빔 성형 광학계, 원하는 빔 사이즈를 만들어 주고 빔을 균일하게 섞어주는 빔 균일 광학계, 기판에 투사 이전에 빔을 한번 잘라주는 조리개 부분과 마스크 단에서 잘린 빔을 기판에 투사해주는 투사렌즈 부분으로 구성되어 있다. 본 논문에서는 LLO 시스템을 구성하고 있는 광학계 중 감쇠기와 투사렌즈 부분의 설계 및 분석을 진행하였다. 투사렌즈의 $7{\times}7mm^2$ 빔 사이즈 구현을 위하여 광학 설계 프로그램인 지맥스를 통해 설계 및 초점심도를 분석하였으며, 조명 설계 프로그램인 라이트 툴을 사용하여 빔 사이즈 및 균일도를 분석하였다. 성능 분석 결과 사각형 빔의 크기 $6.97{\times}6.96mm^2$, 균일도 91.8%, 초점심도 ${\pm}30{\mu}m$를 확인하였다. 또한 고출력의 엑시머레이저의 빔 강도를 감쇠시키기 위한 장치인 감쇠기의 투과율을 높이기 위하여 에센설 맥클라우드 코팅 프로그램을 사용하여 유전체 코팅을 실시한 결과 총 23층의 박막과 s 편광의 입사각도 $45{\sim}60^{\circ}$에서 10-95%의 투과율을 확인 할 수 있었다.