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Cha, Ju-Hong;Han, Mun-Gi;Kim, Dong-Hyeon;Lee, Hae-Jun;Lee, Ho-Jun
- Proceedings of the Korean Vacuum Society Conference
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- 2015.08a
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- pp.143.1-143.1
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- 2015
An inductively coupled plasma source driven by 13.56MHz was prepared for the deposition of a-C:H thin film. Properties of the plasma source are investigated by fluid simulation including Navier-Stokes equations and home-made tuned single Langmuir probe. Signal attenuation ratios of the Langmuir probe at first and second harmonic frequency were 13.56Mhz and 27.12Mhz respectively. Dependencies of plasma parameters on process parameters were agreed with simulation results. Ar/CH4 plasma simulation results shown that hydrocarbon radical densities have their lowest value at the vicinity of gas feeding line due to high flow velocity. For input power density of 0.07W/cm3, CH radical density qualitatively follows electron density distribution. On the other hand, central region of the chamber become deficient in CH3 radical due to high dissociation rate accompanied with high electron density. The result suggest that optimization of discharge power is important for controlling deposition film quality in high density plasma sources.
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Hong, C.;Chae, H.B.;Lee, S.B.;Han, Y.J.;Jung, J.H.;Cho, B.K.;Park, H.;Kim, C.K.;Kim, S.O.
- Transactions on Electrical and Electronic Materials
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- v.1 no.1
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- pp.32-39
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- 2000
Langmuir probe measurements of electron density, electron temperature and potential are mad in the early stage (<5${\mu}$s) of a laser ablated plasma plume, in which a positive current form positive ions and a electron current are overlapped. The plasma wes produced by focusing the second harmonic, 532 nm, of Q-switched Nd:YAG laser on a high purity carbon target. Then the laser intensity on the target of ~1.6${\times}$10$\^$15/ W/$\textrm{cm}^2$. The measured electron desities and temperatures are ~2${\times}$10/sip 11/ cm$\^$-3/ and -3 eV. In particluar , the phenomenon that the electron temperature decreased and then increased was observed,. It could be well explained that this phenomenon occurred in the process of inverse Bremsstrahlung of free electrons in plasma. Additionally, the plasma potential(>11V) was higher than the published values.
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Kim, Jong-Dae;Jungling, K.C.
- ETRI Journal
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- v.17 no.2
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- pp.11-19
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- 1995
The plasma densities generated from a semiconductor bridge (SCB) device employing a capacitor discharge firing set have been measured by a novel diagnostic technique employing a microwave resonator probe. The spatial resolution of the probe is comparable to the separation between the two wires of the transmission lines (${\approx}$3 mm). This method is superior to Langmuir probes in this application because Langmuir probe measurements are affected by sheath effects, small bridge area, and unknown fraction of multiple ions. Measured electron densities are related to the land material and input energy. Although electron densities in the plasma generated by aluminum or tungsten-land SCB devices show a general tendency to increase steadily with power, at the higher energies, the electron densities generated from tungsten-land SCB devices are found to remain constant.
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Jo, Ju-Ung;Choi, Yong-Sung;Kim, Yong-Kab;Park, Dae-Hee
- Proceedings of the KIEE Conference
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- 2004.11a
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- pp.167-170
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- 2004
In recent, there have been several developments in lamp technology that promise savings in electrical power consumption and improved quality of the lighting space. The electrodeless fluorescent lamp is intended as a high efficacy replacement for the incandescent reflector lamp in many applications. In this paper, electron temperature and electron density were measured in a radio-frequency inductively coupled plasma using a Langmuir probe method for emission characteristics. Measurement was conducted in an Argon, Ne discharge for pressure from 1 [mTorr] and input RF power 10 [W] to 150 [W]. As for the electron density, a electron temperature was more distinguished for a emission characteristic. The results of ideal may contribute to systematic understanding of a electrodeless fluorescent lamps of emission characteristics.
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