• Title/Summary/Keyword: LaNiO3 thin films

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Growth of Highly (100) Oriented (Na0.5Bi0.5)TiO3 Thin Films on LaNiO3 Electrode (LaNiO3 전극위에 (100)으로 배향된 (Na0.5Bi0.5)TiO3 박막의 성장)

  • Yoo Young-Bae;Park Min-Seok;Son Se-mo;Chung Su-Tae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.2
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    • pp.176-180
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    • 2006
  • [ $(Na_{0.5}Bi_{0.5})TiO_3$ ][NBT] thin films were prepared on a highly (100) oriented $LaNiO_3[LNO]$ by sol-gel process. X-ray diffraction patterns of the NBT films annealed above $600^{\circ}C$ for 5 minutes have confirmed a highly (100) oriented growth and pseudocubic structure (a=3.884${\AA}$). The (l00) orientation factor increased from 90 to $99\%$ with increasing soaking time from 5 to 60 minutes at $600^{\circ}C$. The NBT films ($600^{\circ}C$/5 min,) have a flat and dense microstructure with large columnar grains, and their grain size are about 44 nm. The Au/NBT/LNO/Si hetero structure sample show a ferroelectric properties.

Preparation of LaGaO3 Based Oxide Thin Film on Porous Ni-Fe Metal Substrate and its SOFC Application

  • Ju, Young-Wan;Matsumoto, Hiroshige;Ishihara, Tatsumi;Inagaki, Toru;Eto, Hiroyuki
    • Journal of the Korean Ceramic Society
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    • v.45 no.12
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    • pp.796-801
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    • 2008
  • $LaGaO_3$ thin film was prepared on Ni-Fe metal porous substrate by Pulsed Laser Deposition method. By the thermal reduction, the dense $NiO-{Fe_3}{O_4}$ substrate is changed to a porous Ni-Fe metal substrate. The volumetric shrinkage and porosity of the substrate are controlled by the reduction temperature. It was found that a thermal expansion property of the Ni-Fe porous metal substrate is almost the same with that of $LaGaO_3$ based oxide. $LaGaO_3$ based electrolyte films are prepared by the pulsed laser deposition (PLD) method. The film composition is sensitively affected by the deposition temperature. The obtained film is amorphous state after deposition. After post annealing at 1073K in air, the single phase of $LaGaO_3$ perovskite was obtained. Since the thermal expansion coefficient of the film is almost the same with that of LSGM film, the obtained metal support LSGM film cell shows the high tolerance against a thermal shock and after 6 min startup from room temperature, the cell shows the almost theoretical open circuit potential.

Preparation of $LaAlO_3$ thin Films by Sol-gel Method (Sol-gel 방법에 의한 $LaAlO_3$ 박막의 제조)

  • Kim, H.J.;Kim, B.J.;Lee, H.G.;Hong, G.W.
    • Progress in Superconductivity
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    • v.9 no.1
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    • pp.85-90
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    • 2007
  • Lanthanum aluminate($LaAlO_3$) film has been prepared on single crystal and metal substrates by dip coating method. Lanthanum acetate and aluminum were prepared via ligand exchange starting from lanthanum nitrate hexahydrate and aluminum nitrate hexahydrate in acetate glacial acetic acid solution after being refluxed. Coating solution was obtained by diluting the gel with methanol and 2-methoxyethanol to adjust the total cation concentration to 0.67 M. Precursor coated film was prepared by dip-coating with a speed of 25 mm/min on various substrates such as $LaAlO_3$ (001), MgO(001), $SrTiO_3$(001) single crystal, LMO/MgO/Ni-alloy. Thin films have been obtained by heat treating the precursor film at various temperatures from $600^{\circ}C{\sim}900^{\circ}C$ and various heating rate from $0.83^{\circ}C/min{\sim}1.25^{\circ}C/min$ under $Ar/O_2$ mixture containing 1000ppm oxygen. The films have been characterized by scanning electronic microscopy (SEM) and X-ray diffraction (XRD). XRD analysis for the prepared film showed that $LaAlO_3$ thin films with a preferred orientation of (100) plane parallel to substrate surface were obtained at $800^{\circ}C(1.11\;^{\circ}C/min)$ on LMO/MgO/Ni-alloy substrate, but the intensity decreased with the increase of heat treatment temperature.

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Crystal Structure and Dielectric Responses of Pulsed Laser Deposited (Ba, Sr)$TiO_3$ Thin Films with Perovskite $LaNiO_3$ Metallic Oxide Electrode

  • Lee, Su-Jae;Kang, Kwang-Yong;Jung, Sang-Don;Kim, Jin-Woo;Han, Seok-Kil
    • The Korean Journal of Ceramics
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    • v.6 no.3
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    • pp.258-261
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    • 2000
  • Highly (h00)-oriented (Ba, Sr)TiO$_3$(BST) thin films were grown by pulsed laser deposition on the perovskite LaNiO$_3$(LNO) metallic oxide layer as a bottom electrode. The LNO films were deposited on SiO$_2$/Si substrates by rf-magnetron sputtering method. The crystalline phases of the BST film were characterized by x-ray $\theta$-2$\theta$, $\omega$-rocking curve and $\psi$-scan diffraction measurements. The surface microsturcture observed by scanning electron microscopy was very dense and smooth. The low-frequency dielectric responses of the BST films grown at various substrate temperatures were measured as a function of frequency in the frequency range from 0.1 Hz to 10 MHz. The BST films have the dielectric constant of 265 at 1 kHz and showed multiple dielectric relaxation at the low frequency region. The origin of these low-frequency dielectric relaxation are attributed to the ionized space charge carriers such as the oxygen vacancies and defects in BST film, the interfacial polarization in the grain boundary region and the electrode polarization. We studied also on the capacitance-voltage characteristics of BST films.

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Electrical properties of PZT films on Pt and $LaNiO_3$ electrode by using sol-gel method (Pt와 $LaNiO_3$ 전극에 대한 PZT(53/47) sol-gel 막의 전기적 특성)

  • Seo, Byung-Jun;Yeo, Ki-Ho;Ryu, Ji-Goo;Kim, Kang-Eon;Chung, Su-Tae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.07b
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    • pp.641-643
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    • 2003
  • The ferroelectric properties of PZT(53/47) thin film was investigated by methoxy enthanol solution based on sol-gel method. The thickness of each layer by spincoating 0.25M sol at one time was $0.1{\mu}m$ and crack-free film was formed. $LaNiO_3/Si(100)$ electrode and $Pt/Ti/SiO_2/Si(100)$ electrode was coated by PZT sol at several times. PZT orientation was confirmed as a method of XRD and coercive field(Ec) as well as remnant polarization(Pr) was investigated from hysterisis curve. As a result of XRD analysis, we can know that the orientation of on PZT/LNO/Si(100) is better than on $Pt/Ti/SiO_2/Si(100)$. The remnant polarization(Pr) in LNO electrode was $87.5{\mu}C/cm^2$ and $39.8{\mu}C/cm^2$ in Pt. From this figures, it is investigated that the Pr in LNO electrode was better than in Pt.

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Orientation Control and Dielectric Properties of Sol-gel Deposited (Ba,Sr)TiO3 Thin Films for Room-temperature Tunable Element Applications

  • Zhai, Jiwei;Chen, Haydn
    • Journal of the Korean Ceramic Society
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    • v.40 no.4
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    • pp.380-384
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    • 2003
  • The effects of the mole concentrations of precursor solution on the microstructure and dielectric properties of sol-gel deposited $Ba_{0.85}$S $r_{0.15}$Ti $O_3$(BST) thin films have been investigated. The films were of single perovskite phase with strong (100) preferred orientation when grown on LaNi0$_3$ buffered Pt/Ti/ $SiO_2$Si substrates using a diluted precursor solution. Variation of the precursor solution concentration resulted in a different microstructure and, in turn, affected the tunability of the sol-gel deposited films. It was observed that leakage currents increased asymmetrically for the negative and positive bias voltage with decreasing thickness. Overall results suggest that those BST films have acceptable properties f3r applications as room-temperature tunable elements.

RF Sputtered Lithium Nickel Oxide Films and Their Electrochromism (RF 스퍼터링에 의해 제조된 Li-Ni-O 박막의 전기변색 특성)

  • Kim, Young-Il;Kim, Bae-Whan;Choy, Jin-Ho;Campet, Guy;Park, Nam-Gyu;Portier, Josik;Morel, Bertrand
    • Journal of the Korean Chemical Society
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    • v.41 no.11
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    • pp.594-599
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    • 1997
  • Lithium nickel oxide ($Li_{2x}Ni_{1-x}O$) thin films have been prepared by the RF sputtering of lithiated nickel oxide target, where the film microstructure was controlled by the sputtering atmosphere $(Ar/O_2)$ and the substrate temperature ($T_s=50/230^{\circ}C$). From the transmission electron microscopic analysis, it is found that the most porous film with the grain size of $∼80\AA$ could be fabricated under the sputtering atmosphere of $P(O_2)=8{\times}10^2$ mbar with the $$T_s$=50^{\circ}C.$ In the optical and electrochemical studies, the$Li_{2x}Ni_{1-x}O$ films exhibit a significant electrochromic property in association with the lithium insertion/deinsertion process. The amount of charge insertion ($Q_i$) and the optical density (OD) variation depend on the crystallinity of the film as well as its thickness, and for the $Li_{2x}Ni_{1-x}O$ film (170 nm thickness) prepared under $O_2$ atmosphere and $T_s=50^{\circ}C$, the OD could be increased up to ∼1.3 by the charge insertion with $Q_i=30\;mC/cm^2.$

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Electrochemical Properties of Cu Current Collector with Li0.5La0.5TiO3 or Si Thin Film as a Li Free Anode (Li0.5La0.5TiO3와 Si박막을 갖는 구리 집전체의 Li free 음극으로써의 전기화학적 특성)

  • Lee Jae-Jun;Kim Soo-Ho;Lee Jong-Min;Yoon Young-Soo
    • Journal of the Korean Electrochemical Society
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    • v.9 no.1
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    • pp.34-39
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    • 2006
  • Electrochemical properties of Cu foil current collector with a $Li_{0.5}La_{0.5}TiO_3$ Cu a Si thin film deposited by r.f sputtering as an anode for Li free battery were evaluated. The Cu foil current collectors were lied in and out of plasma during sputtering process. The X-ray diffraction results indicated that the as-deposited Si and $Li_{0.5}La_{0.5}TiO_3$ thin films in and out of plasma did not show any crystalline difference. The $Li_{0.5}La_{0.5}TiO_3$ film in plasma and Si film out of plasma showed better cyclability since crystalline $Li_{0.5}La_{0.5}TiO_3$ has much higher ionic conductivity and crystalline Si film is much sensitive far volume change during charge-discharge process. These results suggested that the deposition of amorphous Si on Cu foil current collector is much better for fabrication of Li free battery and it can be useful for the unique battery with a cycling number constraint of below 10.

(100) orientation of PZT thin films coated on the LNO electrode using a different manufacturing process (제조 공정을 달리한 LNO 전극에 코팅된 PZT 박막의 배향성)

  • Seo, Byung-Jun;Moon, Byung-Kee;Kim, Kang-Eon;Chung, Su-Tae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07b
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    • pp.916-919
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    • 2004
  • This paper studied about the (100) orientation of PZT thin films coated on the LNO electrode using a different thermal annealing. The thermal annealing method is divided into two things. The one is the method transferring heat to only the lower substrate and another is transferring heat to all directions. Orientation factor of PZT in the method of transferring heat to only the lower substrate was F=99% in the thermal annealing of the LNO. Orientation factor of PZT was F=67% in the method of transferring heat to all directions.

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