• Title/Summary/Keyword: Kim Su-On

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A Study on SU-8 Fabrication Process for RF and Microwave Application (RF 및 Microwave 응용을 위한 SU-8 공정 연구)

  • Wang, Cong;Kim, Nam-Young
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.65-66
    • /
    • 2009
  • This paper describes a procedure developed to fabricate negative photo resist SUMS to a semi-insulating (SI)-GaAs-based substrate. SU-8 is attractive for micromachine multi-layer circuit fabrication, because it is photo-polymerizable resin, leading to safe, and economical processing. This work demonstrates SUMS photo resist can be used for RFIC/MMIC application.

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