• Title/Summary/Keyword: KOH

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Modeling of Silicon Etch in KOH for MEMS Based Energy Harvester Fabrication (MEMS기반 에너지 하베스터 제작을 위한 실리콘 KOH 식각 모형화)

  • Min, Chul-Hong;Gang, Gyeong-Woo;Kim, Tae-Seon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.25 no.3
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    • pp.176-181
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    • 2012
  • Due to the high etch rate and low fabrication cost, the wet etching of silicon using KOH etchant is widely used in MEMS fabrication area. However, anisotropic etch characteristic obstruct intuitional mask design and compensation structures are required for mask design level. Therefore, the accurate modeling for various types of silicon surface is essential for fabrication of three-dimensional MEMS structure. In this paper, we modeled KOH etch profile for MEMS based energy harvester using fuzzy logic. Modeling results are compared with experimental results and it is applied to design of compensation structure for MEMS based energy harvester. Through Fuzzy inference approaches, developed model showed good agreement with the experimental results with limited etch rate information.

Preparation and Characterization of KOH-Activated Carbons Developed from Petroleum Coke

  • Sayed Ahmed, S.A.;Abo El-Enin, Reham M.M.;El-Nabarawy, Th.
    • Carbon letters
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    • v.10 no.4
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    • pp.293-299
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    • 2009
  • Potassium hydroxide activated carbons were prepared from Egyptian petroleum cokes with different KOH/coke ratios and at different activation temperatures and times. The textural properties were determined by adsorption of nitrogen at $-196^{\circ}C$. The adsorption of iodine and methylene blue was also investigated at $30^{\circ}C$. The surface area and the non-micropore volume increased whereas the micropore volume decreased with the increase of the ratio KOH/coke. Also the surface area and porosity increased with the rise of activation temperature from 500 to $800^{\circ}C$. Textural parameter considerably increased with the increase of activation time from 1 to 3 h. Further increasing of activation time from 3 to 4 h was associated with a less pronounced increase in textural parameters. The adsorption of iodine shows the same trend of surface area and porosity change exhibited by nitrogen adsorption, with KOH/coke ratio and temperature of activation. Adsorption of methylene blue follows pseudo-first-order kinetics and its equilibrium adsorption follows Langmuir and D-R models.

Surface Treatment with Alkali Solution of Carbon Felt for Vanadium Redox Flow Battery (바나듐레독스흐름전지용 카본펠트전극의 알칼리용액을 이용한 표면개질)

  • KIM, SUNHOE;LEE, KEON JOO
    • Transactions of the Korean hydrogen and new energy society
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    • v.27 no.4
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    • pp.372-377
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    • 2016
  • The carbon felt used as the electrode of vanadium redox flow battery (VRFB) requires imprived electrochemical activity for better battery performance and efficiencies. Many efforts have been tried to improve electrochemical activity of the carbon felt as electrodes. In this study the alkali solution, KOH, is applied on surface treatment of the carbon felt electrode. The carbon felts were treated with KOH under room temperature and $80^{\circ}C$. The isopropyl alcohol was applied to improve wettability of the carbon felt during KOH treatment. The KOH treated carbon felt was analyzed by using the X-ray photoelectron spectroscopy (XPS). The XPS analysis of carbon felt electrode revealed on increase in the overall surface oxygen content of the carbon felts after KOH treatment. Also, cyclic voltametry tests showed electrochemical characteristics enhancement of the carbon felt.

Fabrication of V-groove Device for Precision Coupling of Planar Optical Splitter and Ribbon Optical Fiber (평면 광스플리터와 리본형 광파이버의 정밀 결합을 위한 V-groove연결소자의 제작)

  • Jeong, Seok-Hee;Seo, Hwa-Il;O, Hyun-Cheol;Kim, Young-Cheol
    • Journal of the Semiconductor & Display Technology
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    • v.6 no.3
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    • pp.61-64
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    • 2007
  • V-groove device was fabricated for precision coupling of planar optical splitter and optical fibers. V-groove was made through select wet etching of Si wafer by using KOH solution. Etching rate and surface roughness were checked, changing KOH composition(10, 20, 30, 33, 40 wt.%) and etching temperature (50, 60, 70, $80^{\circ}C$) to fabricate V-groove device effectively. Etching rate was the fastest as $1.84\;{\mu}m/min$ in case of etching by 20 wt.% KOH on $80^{\circ}C$, surface roughness was the best in case of etching by 33 wt. % KOH on $80^{\circ}C$.

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Strength Characteristic of Non-cement Matrix using Paper Ash (제지애쉬를 활용한 무시멘트 경화체의 강도 특성)

  • Kim, Yun-Mi;Kim, Heon-Tae;Park, Sun-Gyu;Lee, Sang-Soo
    • Proceedings of the Korean Institute of Building Construction Conference
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    • 2013.11a
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    • pp.196-197
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    • 2013
  • This study is the experiment for manufacturing the Lightweight non-cement matrix based on the Blast furnace slag. And, the matrix was manufactured matrix by generating the bubble just by the reaction of KOH that is the alkali accelerator and paper ash, instead of the general foaming agent, that is the waste managed of incineration the pulp sludge generated in the process of manufacturing the paper. Consequently, the density according to the addition rate of KOH represented the tendency to increase. And it showed up that density of the matrix adding KOH 22.5% was the lowest. As to the strength test result, strength following addition rate of KOH increased. Since the bubble is generated in the reaction of KOH and paper ash, this shows the very low intensity but it is determined to be the result that the amount of vacant space is decreased because the bubble generated in the mixture process comes up as the specific gravity difference.

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The Effect of F-treatment on the Degradation Behavior of the $CaNi_{5}$ and MG-$CaNi_{5}$ Electrodes ($CaNi_{5}$ 및 MG-$CaNi_{5}$ 전극의 퇴화거동에 미치는 불화처리의 영향)

  • Lee, C.R.;Oh, S.J.;Kang, S.G.
    • Korean Journal of Materials Research
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    • v.9 no.6
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    • pp.622-629
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    • 1999
  • Effects of the fluorination in the $K_2$TiF\ulcorner solution and in-situ KF+ KOH electrolyte on the electrochemical charge-discharge properties of CaNi\ulcorner and the Mg-CaNi\ulcorner electrodes were investigated. In-situ fluorination in the KF+ KOH electrolyte compared with pre-fluorination in the$ K_2$TiF\ulcorner solution could improve the electrochemical cycling durability of CaNi\ulcorner and MG-CaN\ulcorner electrodes. The fluorinated layer on the alloy surface by pre-fluorination to improve the activity and anti-corrosion of the electrodes was dissolved in the pure KOH electrolyte during the cycling. The fluorinated layer was formed continuously on the surface of the electrode by thee2N KF addition in the 6N KOH electrolyte. The excess F\ulcorner ion addition in KOH electrolyte could improve the electrochemical cycling durability of CaNi\ulcorner and Mg-CaNi\ulcorner electrode. But, in case of MG-CaNi\ulcorner electrode, the discharge capacity of the electrode was reduced and the poor cycling property was shown with increasing of the MG process times.

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Maskless Pattern Fabrication on Si (100) Surface by Using Nano Indenter with KOH Wet Etching (나노인덴터와 KOH 습식 식각 기술을 병용한 Si(100) 표면의 마스크리스 패턴 제작 기술)

  • 윤성원;신용래;강충길
    • Transactions of Materials Processing
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    • v.12 no.7
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    • pp.640-646
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    • 2003
  • The nanoprobe based on lithography, mainly represented by SPM based technologies, has been recognized as potential application to fabricate the surface nanostructures because of its operational versatility and simplicity. The objective of the work is to suggest new mastless pattern fabrication technique using the combination of machining by nanoindenter and KOH wet etching. The scratch option of the nanoindenter is a very promising method for obtaining nanometer scale features on a large size specimen because it has a very wide working area and load range. Sample line patterns were machined on a silicon surface, which has a native oxide on it, by constant load scratch (CLS) of the Nanoindenter with a Berkovich diamond tip, and they were etched in KOH solutions to investigate chemical characteristics of the machined silicon surface. After the etching process, the convex structure was made because of masking effect of the affected layer generated by nano-scratch. On the basis of this fact, some line patterns with convex structures were fabricated. Achieved patterns can be used as a mold that will be used for mass production processes such as nanoimprint or PDMS molding process. All morphological data of scratch traces were scanned using atomic force microscope (AFM).

Strength characteristics of granulated ground blast furnace slag-based geopolymer concrete

  • Esparham, Alireza;Moradikhou, Amir Bahador;Andalib, Faeze Kazemi;Avanaki, Mohammad Jamshidi
    • Advances in concrete construction
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    • v.11 no.3
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    • pp.219-229
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    • 2021
  • In recent years, geopolymer cements, have gained significant attention as an environmental-friendly type of cement. In this experimental research, effects of different alkaline activator solutions and variations of associated parameters, including time of addition, concentration, and weight ratio, on the mechanical strengths of Granulated Ground Blast Furnace Slag (GGBFS)-based Geopolymer Concrete (GPC) were investigated. Investigation of the effects of simultaneous usage of KOH and NaOH solutions on the tensile and flexural strengths of GGBFS-based GPC, and the influence of NaOH solution addition time delay on the mechanical strengths is among the novel aspects investigated in this research. four series of mix designs and corresponding specimen testing is conducted to study different parameters of the active alkali solutions on GPC mechanical strengths. The results showed that addition of NaOH to the mix after 3 min of mixing KOH and Na2SiO3 with dry components (1/3 of the total mixing duration) resulted in the highest compressive, tensile and flexural strengths amongst other cases. Moreover, increasing the KOH concentration up to 12 M resulted in the highest compressive strength, while weight ratio of 1.5 for Na2SiO3/KOH was the optimum value to achieve highest compressive strengths.

A Study on the Fabrication of Sub-Micro Mold for PDMS Replica Molding Process by Using Hyperfine Mechanochemical Machining Technique (기계화학적 극미세 가공기술을 이용한 PDMS 복제몰딩 공정용 서브마이크로 몰드 제작에 관한 연구)

  • 윤성원;강충길
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2004.10a
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    • pp.351-354
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    • 2004
  • This work presents a simple and cost-effective approach for maskless fabrication of positive-tone silicon master for the replica molding of hyperfine elastomeric channel. Positive-tone silicon masters were fabricated by a maskless fabrication technique using the combination of nanoscratch by Nanoindenter ⓡ XP and XOH wet etching. Grooves were machined on a silicon surface coated with native oxide by ductile-regime nanoscratch, and they were etched in a 20 wt% KOH solution. After the KOH etching process, positive-tone structures resulted because of the etch-mask effect of the amorphous oxide layer generated by nanoscratch. The size and shape of the positive-tone structures were controlled by varying the etching time (5, 15, 18, 20, 25, 30 min) and the normal loads (1, 5 mN) during nanoscratch. Moreover, the effects of the Berkovich tip alignment (0, 45$^{\circ}$) on the deformation behavior and etching characteristic of silicon material were investigated.

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