• JOURNAL OF ELECTRICAL WORLD
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• s.364
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• pp.20-23
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• 2007

• JOURNAL OF ELECTRICAL WORLD
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• s.366
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• pp.2-17
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• 2007

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.06a
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• pp.188-188
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• 2007

ZnO 박막은 넓은 밴드갭과 가시광 영역에서의 높은 투과 및 제조조건에 따른 비저항의 범위가 크게 달라짐으로 태앙전지, 디스플레이등의 투명 전극등에 널리 응용되어지고 있다. 본 살험에서는 이러한 장점을 갖는 ZnO 박막을 먼저 r. f.-sputter 법으로 제조하여 습식으로 식각하였다. 식각된 ZnO 필름은 OLED 및 디스플레이의 적용에 필요한 식각율과 표면구조 전기적 특성을 조사하였다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.40-41
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• 2007

$SnO_2$ nanowires are used at the nanoscale level for the electrical transduction of the gas interaction with these sensing materials. We report on a study of high sensitivity and fast NOx gas sensor. We focused on improving the response time and refresh time by growth nanowires on the trench structure of Si substrate as air path. To improve refresh time we applied the trench structure with depth of $10\;{\mu}m$ by the inductively coupled plasma reactive ion etching(ICP-RIE). The fabricated device was measured at temperature of $200{\sim}300^{\circ}C$. The sensor exhibit ultra-fast and reversible electrical response (t90% ~4 s for response and ~3 s for recovery).

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.169-170
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• 2007

In this paper we report upon an investigation into the effect of sputter pressure and RF power on the electrical properties of Gallium doped zinc oxide (GZO) film. GZO films were deposited on glass substrate without substrate temperature by RF magnetron sputtering from a ZnO target mixed with 5 wt% $Ga_2O_3$. Argon gas pressure and RF power were in the range of 1~11 mTorr, and 50~100 W, respectively. However, the resistivity of the film was strongly influenced by the sputter pressure and RF power. We were able to achieve as low as $1.5{\times}10^{-3}\;{\Omega}cm$, without substrate temperature.

• Proceedings of the KIEE Conference
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• 2007.07a
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• pp.731-732
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• 2007

This paper presents the final configuration of test field and test items for the application of IEC 60364-4-44 in Korea. IEC 60364-4-44 provides rules for the protection against the effects of conducted and radiated disturbances on electrical installations. Especially this standard deals with the protection of low voltage facility against the ground fault in the high voltage side of power distribution system. Many countries define the regulations on the use of electrical facilities based on their own power system and technical references which are considered to be suitable for them. The background of circuit of IEC 60364-4-44 is based on the ungrounded system as most of European countries. However, domestic electric power distribution system is based on multi-grounding system different from European system. Therefore, it is necessary to evaluate or prove the effect of the IEC 60364-4-44 for introducing and applying it to the domestic grounding system as a national standard. The authors with KEA(Korea Electric Association) carried out a project on the application of IEC 60364-4-44 to Korean electrical installations of buildings sponsored by Korean ministry of commerce, industry and energy for three years(2004.4.1$\sim$2007.3.31). The test field is established in K.E.R.I.(Korea Electrotechnology Research Institute), which is the purpose of evaluating the formula to calculate touch voltage and stress voltage in the IEC standards. This paper presents some considerations and final configuration of test field to evaluate and introduce the IEC 60364-4-44 applicable to domestic rule for the protection against ground fault.