• 제목/요약/키워드: Junction Area

검색결과 341건 처리시간 0.03초

간접 전파광의 수광 효율 향상에 관한 연구 (A Study on the Promotion of Indirect Light Receiving Efficiency)

  • 허수진;정찬수
    • 대한의용생체공학회:의공학회지
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    • 제13권3호
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    • pp.201-208
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    • 1992
  • In the indirect optical bio-telemetry, high frequency response and low minimum detectable optical power can be achieved by using photodiode with small light receiving area which minimizes junction capacitance. But, on the other hand, S/N ratio becomes low because the optical signal current is small. To solve such a problem, we attach plato-convex lens in front of photo diode, The results of comput- er simulation and experiments suggest promotion of light receiving efficiency and possibility of multi- telemetry system through directivity of convex lens in one room.

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MOS 광전변화소자의 식적에 관한 연구 (A Study on the Experimental Fabrication and Analysis of MOS Photovoltaic Solar Energy Conversion Device)

  • Ko, Gi-Man;Park, Sung-Hui;Sung, Man-Young
    • 대한전기학회논문지
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    • 제33권6호
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    • pp.203-211
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    • 1984
  • MOS silicon solar cells have been developed using the fixed (interface) charge inherent to thermally oxidized silicon to induce an n-type inversion layer in 1-10 ohm-cm p-type silicon. Higher collection efficiencies are predicted than for diffused junction cells. Without special precautions a conversion efficiency of 14.2% is obtained. A MOS silicon solar cell is described in which an inversion layer forms the active area which is then contacted by means of a MOS grid. The highest efficiency is obtained when the resistivity of the substrate is high.

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A $32{\times}33$ Photo-elements MOS Image Sensor

  • Park, Sang-Sik;Park, Jeong-Ok;Lee, Jong-Duk
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1987년도 전기.전자공학 학술대회 논문집(I)
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    • pp.411-415
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    • 1987
  • A $32{\times}33$ MOS-type area image sensor has been fabricated. The blooming current is reduced to 1/14 by forming +p photocell in P-well instead of a simple p-type substrate. A shallow n+ junction is made to improve the sensitivity of photodiode on short wavelength. Bootstrapping circuit technique is applied to obtain high speed dynamic shift register. The shift register operates at up to 10MHz for 7V clock.

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접지선 굵기에 관한 연구 (The study on the ground wire size)

  • 최홍규;최병숙;송영주
    • 한국조명전기설비학회:학술대회논문집
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    • 한국조명전기설비학회 2003년도 학술대회논문집
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    • pp.97-102
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    • 2003
  • Ground in must choose enough sectional area of conductor endurably in maximum fault current, fault duration time, maximum allowable temperature and have strong durability and life-time can bear enough from spontaneous corrosion or electrolytic corrosion and must choose material that problem does not exist electrically and mechanically when connection or junction. In this paper, modeled new ground wire size numerical formula, and examine and compare of modeled numerical formula and abroad regulation, and proved and analyzed validity of the new ground wire size computation method because do simulation to computer program.

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PREVENTIVE EFFECTS OF RED GINSENG SAPONIN ON HYPERKERATOSIS: ULTRASTRUCTURAL OBSERVATION AND LIPID ANALYSIS

  • Kim, Hyeyoung
    • Toxicological Research
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    • 제7권2호
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    • pp.129-139
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    • 1991
  • Preventive effect of red ginseng saponin on experimentally-induced hyperkeratosis was investigated by ultrastructural observation, skin weight and epidermal lipid analysis. Hexadecane increased skin weight per unit area and epidermal lipids, free fatty acids, cholesterol and triglyceride in guinea pig skin. Topical application of ginseng saponin reduced these hyperkeratotic responses regradless of the concentration and the purity of ginseng saponin. Ultrastructurally, lipids and empty space-containing multiple horny cells were piled and nuclear remnants, desmosome, desmosomal bodies, tight junction were shown in the stratum corneum of hexadecane-treated skin.

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R&D activities of a-Si:H thin film solar cells by LG Electronics

  • 이돈희
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2007년도 춘계학술발표회 초록집
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    • pp.19-19
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    • 2007
  • Recently, we have developed p-i-n hydrogenated amorphous silicon (a-Si:H) single junction (SJ) thin film solar cells with RF (13,56MHz) plasma enhanced chemical vapor deposition (PECVD) systems, and also successfully fabricated the mini-modules (>300$cm^2$), using laser scribing technique to form an integrated series connection, The efficiency of a mini-module was 7.4% (Area=305$cm^2$, $I_{SC}$=0.25A, $V_{OC}$=14.74V, FF=62%).

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도심의 전파 사각 지역 문제 해결을 위한 VANET 경고 메시지 전달 기능의 개선 (A performance Enhancement of VANET Warning Message Propagation on Electric Wave Blind Area Problem in the Urban Environment)

  • 이원열
    • 한국멀티미디어학회논문지
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    • 제17권10호
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    • pp.1220-1228
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    • 2014
  • Emergency Warning Service will be the most important service of VANET. Transmission delay is the most important performance criteria of the warning service. Most legacy research takes a way to minimize the packet collision. However those approach has a critical weak point on urban environment where there is a blind area of electric wave. So another issue is required in order to provide enhanced warning message propagation technique to overcome the urban environment problem. In this paper, I proposed an enhanced warning message propagation scheme in the poor electric wave environment as the intersection area. Proposed scheme forwards the warning message to the blind area by enhanced forwarding node selection technique. For efficiency of warning message propagation, I suggest forwarding priority for decision of forwarding node. And the node has a direct mode or redirect mode depending on neighbor nodes. The simulation was carried out to evaluate the performance. The simulation results show that proposed scheme has the superior performance compared to legacy warning message technique.

터널링 자기저항 소자의 정전기 방전 시뮬레이션 (Electrostatic discharge simulation of tunneling magnetoresistance devices)

  • 박승영;최연봉;조순철
    • 한국자기학회지
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    • 제12권5호
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    • pp.168-173
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    • 2002
  • 본 연구에서는 인체모델(humman body model; HBM)을 터널링 자기저항(tunneling magneto resistance; TMR)소자에 연결하여 정전기에 대한 방전특성을 연구하였다. 이를 위해 제조된 TMR 시편을 전기적 등가회로 바꿔 HBM에 연결하여 PSPICE를 이용해 시뮬레이션 하였다. 이러한 등가회로에서 접합부분의 모델링 요소들의 값을 변화시켜 방전특성을 관찰할 수 있었다. 그 결과 시편의 저항과 정전용량 성분의 값이 다른 요소들에 비해 수배에서 수백 배까지 커서 정전기 방전(electrostatic discharge; ESD) 민감도를 좌우하는 주요한 요소임을 알 수 있었다. 여기에서 ESD현상에 대한 내구성을 향상시키기 위해서는 정전용량을 증가시키는 것 보다 접합면과 도선의 저항값을 줄이는 것이 유리하다. 그리고 직류 전압에 대해 절연층의 전위 장벽이 낮아져 많은 전류가 흐르게 되는 항복(breakdown)전압과 셀의 물리적 구조 및 성질이 변형되어 회복되지 못하는 파괴(failure)전압을 측정하여 DC 상태에서의 내구성을 연구하였다. 이 결과를 HBM 전압에 대한 파괴 전압으로 간주하여 TMR 소자가 견딜 수 있는 HBM 전압을 예측할 수 있었다.

Local Variation of Magnetic Parameters of the Free Layer in TMR Junctions

  • Kim, Cheol-Gi;Shoyama, Toshihiro;Tsunoda, Masakiyo;Takahashil, Migaku;Lee, Tae-Hyo;Kim, Chong-Oh
    • Journal of Magnetics
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    • 제7권3호
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    • pp.72-79
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    • 2002
  • Local M-H loops have been measured on the free layer of a tunneling magnetoresistance (TMR) junction using the magneto-optical Kerr effect (MOKE) system, with an optical beam size of about 2 $\mu$m diameter. Tunnel junctions were deposited using the DC magnetron sputtering method in a chamber with a base pressure of 3$\times$10$^{-9}$ Torr. The relatively irregular variations of coercive force H$_c$(∼17.5 Oe) and unidirectional anisotropy field H$_{ua}$(∼7.5 Oe) in the as-deposited sample are revealed. After $200{^{\circ}C}$ annealing, He decreases to 15 Oe but H$_{ua}$ increases to 20 Oe with smooth local variations. Two-dimensional plots of H$_c$ and H$_{ua}$ show the symmetric saddle shapes with their axes aligned with the pinned layer, irrespective of the annealing field angle. This is thought to be caused by geometric effects during deposition, together with a minor annealing effect. In addition, the variation of root mean square (RMS) surface roughness reveals it to be symmetric with respect to the center of the pinned-layer axis, with the roughness of 2.5 $\AA$ near the edge and 5.8 $\AA$ at the junction center. Comparison of surface roughness with the variation of H$_{ua}$ suggests that the H$_{ua}$ variation of the free layer is well described by dipole interactions related to surface roughness. As a whole, the reversal magnetization is not uniform over the entire junction area and the macroscopic properties are governed by the average sum of local distributions.

Magnetotransport Properties of Co-Fe/Al-O/Co-Fe Tunnel Junctions Oxidized with Microwave Excited Plasma

  • Nishikawa, Kazuhiro;Orata, Satoshi;Shoyama, Toshihiro;Cho, Wan-Sick;Yoon, Tae-Sick;Tsunoda, Masakiyo;Takahashi, Migaku
    • Journal of Magnetics
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    • 제7권3호
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    • pp.63-71
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    • 2002
  • Three fabrication techniques for forming thin barrier layer with uniform thickness and large barrier height in magnetic tunnel junction (MTJ) are discussed. First, the effect of immiscible element addition to Cu layer, a high conducting layer generally placed under the MTJ, is investigated in order to reduce the surface roughness of the bottom ferromagnetic layer, on which the barrier is formed. The Ag addition to the Cu layer successfully realizes the smooth surface of the ferromagnetic layer because of the suppression of the grain growth of Cu. Second, a new plasma source, characterized as low electron energy of 1 eV and high density of $10^{12}$ $cm^{-3}$, is introduced to the Al oxidation process in MTJ fabrication in order to reduce damages to the barrier layer by the ion-bombardment. The magnetotransport properties of the MTJs are investigated as a function of the annealing temperature. As a peculiar feature, the monotonous decrease of resistance area product (RA) is observed with increasing the annealing temperature. The decrease of the RA is due to the decrease of the effective barrier width. Third, the influence of the mixed inert gas species for plasma oxidization process of metallic Al layer on the tunnel magnetoresistance (TMR) was investigated. By the use of Kr-O$_2$ plasma for Al oxidation process, a 58.8 % of MR ratio was obtained at room temperature after annealing the junction at $300{^{\circ}C}$, while the achieved TMR ratio of the MTJ fabricated with usual Ar-$0_2$ plasma remained 48.4%. A faster oxidization rate of the Al layer by using Kr-O$_2$ plasma is a possible cause to prevent the over oxidization of Al layer and to realize a large magnetoresistance.