• 대한기계학회논문집
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• 제14권6호
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• pp.1495-1508
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• 1990

본 연구에서는 전류밀도와 가공시간을 변화시켰을 때의 가공량, 가공상태를 검토해 보았으며, 촉침홀더의 가공각도를 달리하거나 재부착문제를 해결하기 위한 마 스크의 사용여부에 따른 촉침의 가공상태를 알아보기 위해 초기선단반경 2$\mu\textrm{m}$, 선단각 90˚의 다이아몬드 촉침을 이온스파터 가공기를 사용하고, 가공조건을 변화시켜서 초 정밀 가공품의 표면거칠기 측정에 적합한 0.5$\mu\textrm{m}$ 이하의 미세한 선단반경을 갖는 촉침 을 가공하기 위한 가공조건에 대한 실험을 하였다.

• 한국정밀공학회지
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• 제7권3호
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• pp.37-47
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• 1990

In accordance with the high precision of mechanical elements, it has been required to high precision in surface roughness measurement and, therefore, stylus tip radius is manufa- ctured less than 2 .mu. m through ion sputter machining. In this experiment, by suing ion sputter machined stylus pf fine tip, radius and lapping machined stylus, surface roughness of standard specimens, silicon wafer were measured and then Rmax, Ra, RMS value were investi- gatedaccording to the variation of tip radius of stylus. As a result, measuring error due to the variation of stylus tip radius in surface roughness measurement was decreased by using ion sputter machined stylus and also the measuring accuracy was improved. And the measuring variation of Ra, RMS calculated from correlation coefficient lager than 0.9 on the wave of short period and amplitude using ion sputter machined stylus of fine tip radius.

• 대한기계학회논문집
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• 제14권3호
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• pp.747-754
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• 1990

본 연구에서는 장시간 가공하는 경우 가공량과 가공물에 입사되는 이온 빔의 입사각도에 따라 이온 스파터 가공이 표면거칠기에 미치는 영향에 대해서 연구해 보았 다.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2004년도 추계학술대회 논문집
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• pp.925-928
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• 2004

The application of focused ion beam (FIB) technology in micro/nano machining has become increasingly popular. Its use in micro/nano machining has advantages over contemporary photolithography or other micro/nano machining technologies such as small feature resolution, the ability to process without masks and being accommodating for a variety of materials and geometries. This paper was carried out some experiments and verifications of mechanism on FIB-CVD using SMI8800 made by Seiko. FIB-CVD has in fact proved to be commercially useful for repair processes because the beam can be focused down to 0.05$\mu\textrm{m}$ dimensions and below and because the same tool can be used to sputter off material with sub-micrometer precision simply by turning off the gas ambient. Recently the chemical vapour deposition induced ion beam has been required more deposition rate and accurate pattern because of trying to manufacture many micro and nano parts. Therefore this paper suggested the optimization parameters and discussed some mechanism of chemical vapour deposition induced ion beam on FIB-CVD for simple pattern.

• 한국정밀공학회지
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• 제8권3호
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• pp.105-113
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• 1991

The practicability of Ion-Sputter machining renders it possible to make diamond stylus for surface roughness measurement with micro stylus tip radius less than 2${\mu}mR$, and to measure surface roughness of fine-machined surface. In this study, we researched the wear or Ion-Sputtered stylus with 0.1${\mu}mR$ and 0.5${\mu}mR$ for micro-figure measurement and polished stylus with 0.5${\mu}mR$ according to measurement distance. As a result, we know that the case of Ion-Sputtered stylus is worn down easilier the case of polished stylus. And we know that in the evaluation of stylus wear, it is more useful method that examine the wear by measuring the variation of stylus tip radius than by evaluating the variation of Ra values.

• 비파괴검사학회지
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• 제9권2호
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• pp.50-60
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• 1989

The control of resistance of foil strain gauge is accomplished by means of etching technique. Thus, there is an irregularity in metal foil. In order to solve this problem, ion sputter machining method has been used to make strain gauge in this study and the characteristics of this strain gauge are investigated. As the result of this study, it was possible to make a flexible strain gauge which can be used to measure the stress. The strain gauge made by authors shows superior characteristics in creep, O point variance, hysteresis and nonlinearity by surrounding temperature.