• 제목/요약/키워드: Ion beam methods

검색결과 141건 처리시간 0.025초

이온빔을 이용한 마이크로/나노 가공: 모델링 (Ion Beam Induced Micro/Nano Fabrication: Modeling)

  • 김흥배
    • 한국정밀공학회지
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    • 제24권8호통권197호
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    • pp.108-115
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    • 2007
  • 3D nano-scale manufacturing is an important aspect of advanced manufacturing technology. A key element in ability to view, fabricate, and in some cases operate micro-devices is the availability of tightly focused particle beams, particularly of photons, electrons, and ions. The use of ions is the only way to fabricate directly micro-/ nano-scale structures. It has been utilized as a direct-write method for lithography, implantation, and milling of functional devices. The simulation of ion beam induced physical and chemical phenomena based on sound mathematical models associated with simulation methods is presented for 3D micro-/nanofabrication. The results obtained from experimental investigation and characteristics of ion beam induced direct fabrication will be discussed.

Tilted Homeotropic Alignment using Ion Beam Process; Development of Novel Inorganic thin films

  • Hwang, Byoung-Har;Kim, Kyung-Chan;Ahn, Han-Jin;Kim, Jong-Bok;Baik, Hong-Koo
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.I
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    • pp.450-452
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    • 2005
  • The ion beam alignment technique is one of the potential and fascinating methods. However, there are merely a few reports about aligning nematic liquid crystals (NLCs) horizontally for in-plane switching mode (IPS) by means of low energy ion beam exposure on inorganic materials such as DLC. In this study, we have investigated the tilted vertical alignment of NLC by the ion beam technique on the thin films of various amorphous silicon compounds as new inorganic alignment materials. Appropriate pretilt angles of NLC with preferred orientation on these thin films were achieved. And the electro-optic property of vertically aligned single domain cells has been investigated.

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A Variety of Activation Methods Employed in “Activated-Ion” Electron Capture Dissociation Mass Spectrometry: A Test against Bovine Ubiquitin 7+ Ions

  • Oh, Han-Bin;McLafferty, Fred W.
    • Bulletin of the Korean Chemical Society
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    • 제27권3호
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    • pp.389-394
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    • 2006
  • Fragmentation efficiencies of various ‘activated-ion’ electron capture dissociation (AI-ECD) methods are compared for a model system of bovine ubiquitin 7+ cations. In AI-ECD studies, sufficient internal energy was given to protein cations prior to ECD application using IR laser radiation, collisions, blackbody radiation, or in-beam collisions, in turn. The added energy was utilized in increasing the population of the precursor ions with less intra-molecular noncovalent bonds or enhancing thermal fluctuations of the protein cations. Removal of noncovalent bonds resulted in extended structures, which are ECD friendly. Under their best conditions, a variety of activation methods showed a similar effectiveness in ECD fragmentation. In terms of the number of fragmented inter-residue bonds, IR laser/blackbody infrared radiation and ‘in-beam’ activation were almost equally efficient with ~70% sequence coverage, while collisions were less productive. In particular, ‘in-beam’ activation showed an excellent effectiveness in characterizing a pre-fractionated single kind of protein species. However, its inherent procedure did not allow for isolation of the protein cations of interest.

Negative ion beam sputter 법으로 증착한 DLC 박막의 특성 (I) (Properties of Diamond-like Carbon(DLC) Thin Films deposited by Negative Ion Beam Sputter (I))

  • 김대연;강계원;최병호
    • 한국재료학회지
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    • 제10권7호
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    • pp.459-463
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    • 2000
  • 순수한 동적 결합반응이고 전하 누적이 없는 이온 임플란테이션, 새로운 재료 개발 등에 음이온을 직접 사용하는 새로운 연구가 진행되고 있으며, 이러한 관점에서 새로운 고체상의 Cs이온 법이 실험실 규모로 연구되고 있다. 본 논문에서는 음이온 Cs gun으로 DLC 박막을 실리콘 위에 제조하였다. 이 시스템은 가스가 필요없으므로, 고 진공에서 증착이 일어난다. C(sup)-빔 에너지는 80~150eV 사이에서 조절이 우수하였다. Raman 분석결과 박막의 DLC 지수, 즉$sp^3$비율은 이온 에너지 증가에 따라 증가하였으며, 미소 경도값 또한 7에서 14GPa로 증가하였다. DLC박막의 표면 평균거칠기(Ra)는 ~1$\AA$정도로 아주 매끈하였으며, 불순물이 내재되지 않는 박막을 얻을 수 있었다.

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집속이온빔에 의한 미세가공 특성 (Micro-machining Characteristics using Focused Ion Beam)

  • 이종항;박철우;이상조
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2003년도 춘계학술대회 논문집
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    • pp.636-639
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    • 2003
  • It is difficult to machine below 10 micrometers by conventional machining methods, such as micro-EDM. However, ultra micro machining using focused ion beam(FIB) is able to machine to 50 nanometers. In addition, 3 dimensional structures can be made by a combination of FIB and CVD to the level of 10 nanometers. Die & moulds techniques are better than one-to-one machining techniques in the mass production of ultra size structures, in regards to production costs. In this case, the machining precision of die & moulds affects produced parts. Also, it is advantageous to machine die & moulds to the 10 micrometer level by FIB technique rather than other techniques. In this paper, the grooving characteristics for die & mould materials by FIB were carried out experimentally in order to compare the machining characteristics of FIB with conventional machining methods. The results showed that the machining parameters and the scanning path of FIB affects the precision. The machined width and depth of the groove varied depending on the required depth due to the redeposition of the sputtered ion material accumulating on both the bottom and the side of the wall.

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MgO Sputtering in the AC-PDPs with Monte Carlo Methods

  • Gill, Doh-Hyun;Kim, Hyun-Sook;Joh, Dae-Guen;Kim, Young-Guon;Choi, Eun-Ha;Cho, Guang-Sup
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2000년도 제1회 학술대회 논문집
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    • pp.109-110
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    • 2000
  • Sputtering yield of MgO film in the AC-PDPs has been calculated by Monte Carlo simulation of ion scattering. In the ion energy range less than 50 eV, the sputtering yield is 4 ${\times}$ $10^{-4}$ for Xe ions and it is between 0.1 and 0.01 for He, Ne, and Ar ions. The erosion rate is estimated about $25{\AA}$ per hour for Xe ions in an actual PDP plasma for sustain and full white mode.

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Secondary Neutron Dose in Carbon-ion Radiotherapy: Investigations in QST-NIRS

  • Yonai, Shunsuke;Matsumoto, Shinnosuke
    • Journal of Radiation Protection and Research
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    • 제46권2호
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    • pp.39-47
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    • 2021
  • Background: The National Institutes for Quantum and Radiological Science and Technology-National Institute of Radiological Sciences (QST-NIRS) has continuously investigated the undesired radiation exposure in ion beam radiotherapy mainly in carbon-ion radiotherapy (CIRT). This review introduces our investigations on the secondary neutron dose in CIRT with the broad and scanning beam methods. Materials and Methods: The neutron ambient dose equivalents in CIRT are evaluated based on rem meter (WENDI-II) measurements. The out-of-field organ doses assuming prostate cancer and pediatric brain tumor treatments are also evaluated through the Monte Carlo simulation. This evaluation of the out-of-field dose includes contributions from secondary neutrons and secondary charged particles. Results and Discussion: The measurements of the neutron ambient dose equivalents at a 90#x00B0; angle to the beam axis in CIRT with the broad beam method show that the neutron dose per treatment dose in CIRT is lower than that in proton radiotherapy (PRT). For the scanning beam with the energy scanning technique, the neutron dose per treatment dose in CIRT is lower than that in PRT. Moreover, the out-of-field organ doses in CIRT decreased with distance to the target and are less than the lower bound in intensity-modulated radiotherapy (IMRT) shown in AAPM TG-158 (American Association of Physicists in Medicine Task Group). Conclusion: The evaluation of the out-of-field doses is important from the viewpoint of secondary cancer risk after radiotherapy. Secondary neutrons are the major source in CIRT, especially in the distant area from the target volume. However, the dose level in CIRT is similar or lower than that in PRT and IMRT, even if the contributions from all radiation species are included in the evaluation.

배향막으로 사용된 NDLC 박막의 증착방법에 따른 능력 (Ability of Nitride-doped Diamond Like Carbon Thin Film as an Alignment Layer according to Deposition Methods)

  • 김영환;김병용;오병윤;강동훈;박홍규;이강민;서대식
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.431-431
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    • 2007
  • In this paper, the LC alignment characteristics of the NDLC thin film deposited by PECVD and sputtering were reported respectively. The NDLC thin film deposited using sputter showed uniform LC alignment at the 1200 eV of the ion beam intensity and pretilt angle was about $2^{\circ}$ while the NDLC thin film deposited using the PECVD showed uniform LC alignment and high pretilt angle at the 1800 eV of the ion beam intensity. Concerning the ion beam intensity, uniform LC alignment of the NDLC thin film deposited by the sputtering was achieved at the lower intensity. And the pretilt angle of the NDLC thin film deposited by sputter was higher than those of NDLC thin film that was deposited using the PECVD. The uppermost of the thermal stability of NDLC thin film was $200^{\circ}C$, respectively. However, NDLC thin film deposited by the PECVD showed stability at high temperature without defects, compared to NDLC thin film deposited by the sputter.

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Solution-Derived Hafnium Lanthanum Oxide Films Prepared Using Ion-Beam Irradiation and Their Applications as Alignment Layers for Twisted-Nematic Liquid Crystal Displays

  • Oh, Byeong-Yun
    • Transactions on Electrical and Electronic Materials
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    • 제17권6호
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    • pp.355-358
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    • 2016
  • We present the alignment characteristics of LC (liquid crystal) molecules on solution-derived HLO (hafnium lanthanum oxide) films fabricated using IB (ion-beam) irradiation. We then demonstrated that LC molecules can be homogeneously and uniformly aligned on the HLO film irradiated at an IB incident energy of 1.2 keV. Physicochemical analysis methods such as atomic force microscopy and X-ray photoelectron spectroscopy were used to verify the LC alignment mechanism on the IB-irradiated HLO film. In addition, the electro-optical performance of a TN (twisted-nematic) cell fabricated using the IB-irradiated HLO film exhibited characteristics superior to those of the conventional TN cell fabricated using a rubbed polyimide layer.

집속 이온빔에 의한 3차원 가공 시스템 (3 Dimensional Machining System using Focused ion Beam)

  • 박철우;이종항
    • 한국공작기계학회:학술대회논문집
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    • 한국공작기계학회 2004년도 춘계학술대회 논문집
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    • pp.490-493
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    • 2004
  • There is great difficulty in machine below 10 micrometers by conventional machining methods, such as micro-EDM. However, ultra micro machining using focused ion beam(FIB) is able to machine to 50 nanometers. Bie & moulds techniques are better than one-to-one machining techniques in regards to production costs in the mass production of ultra size structures. Also, it is advantageous to machine die & moulds to the 10 micrometers level by FIB technique rather than other techniques. It is difficult to machine the three dimensional machining, such as micro lens, using FIB system because of their machining characteristics. In this paper, three dimensional machining techniques were properly introduced, and also experiments showed effectiveness of their techniques.

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