• 제목/요약/키워드: Ion Beam Sputter depostion(IBSD)

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이온빔 스퍼터링법으로 제조된 SBN 박막의 특성 (SBN Thin films Prepared by Ion Beam Sputtering method)

  • 이동근;장재훈;이희영
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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    • pp.1144-1147
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    • 2002
  • Ferroelectric $Sr_xBa_{1-x}Nb_2O_6(0.25{\leq}x{\leq}0.75)$ thin films were prepared by the Ion Beam Sputtering method. Deposit onto Pt/Ti/$SiO_2$/Si(100) substrates. The deposited thin films were heat-treated for crystallization. Microstructure and crystallization behavior were examined using FE-SEM, XRD. Ferroelectric hysteresis were measured. The measured remanent polarization and coercive field values were $38{\mu}C/cm^2$ and 120kV/cm, respectively.

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