• Title/Summary/Keyword: Ion Beam Sputter depostion(IBSD)

Search Result 1, Processing Time 0.015 seconds

SBN Thin films Prepared by Ion Beam Sputtering method (이온빔 스퍼터링법으로 제조된 SBN 박막의 특성)

  • Lee, Dong-Gun;Jang, Jae-Hoon;Lee, Hee-Young
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2002.07b
    • /
    • pp.1144-1147
    • /
    • 2002
  • Ferroelectric $Sr_xBa_{1-x}Nb_2O_6(0.25{\leq}x{\leq}0.75)$ thin films were prepared by the Ion Beam Sputtering method. Deposit onto Pt/Ti/$SiO_2$/Si(100) substrates. The deposited thin films were heat-treated for crystallization. Microstructure and crystallization behavior were examined using FE-SEM, XRD. Ferroelectric hysteresis were measured. The measured remanent polarization and coercive field values were $38{\mu}C/cm^2$ and 120kV/cm, respectively.

  • PDF