Effect of Plasma Treatment on Properties of Interlayer Dielectric Fluoricated Amorphous Carbon (a-C:F) Prepared by ECRCVD and Cu/Ta/a-C:F/Si Multilayer Structure (ECRCVD a-C:F 층간절연막 및 Cu/Ta/a-C:F/Si 다층구조의 특성에 미치는 플라즈마 처리의영향)
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- Proceedings of the Materials Research Society of Korea Conference
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- 2002.05a
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- pp.124-124
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- 2002