• Journal of Advanced Marine Engineering and Technology
• /
• v.37 no.4
• /
• pp.425-430
• /
• 2013

Robust and high speed underwater communication is severely limited when compared to communications in terrestial. In free space, RF communication operates over long distances at high data rates. However, the obstacle in seawater is the severe attenuation due to the conducting nature. Acoustic modems are capable of long range communication up to several tens of kilometers, but it has low data-rate, high power consumption and low propagation speed. An alternative means of underwater communication is based on optics, wherein high data rates are possible. In this paper, the characteristics of underwater channel in the range of visible wavelength is investigated. And the possibility of optical wireless communication in underwater is also described. The LED-based transceiver and CMOS sensor module are integrated in the system, and the performance of image transmission was demonstrated.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.24 no.9
• /
• pp.701-709
• /
• 2011

In semiconductor wafer fabrication, etching is one of the most critical processes, by which a material layer is selectively removed. Because of difficulty to correct a mistake caused by over etching, it is critical that etch should be performed correctly. This paper proposes a new approach for etch endpoint detection of small open area wafers. The traditional endpoint detection technique uses a few manually selected wavelengths, which are adequate for large open areas. As the integrated circuit devices continue to shrink in geometry and increase in device density, detecting the endpoint for small open areas presents a serious challenge to process engineers. In this work, a high-resolution optical emission spectroscopy (OES) sensor is used to provide the necessary sensitivity for detecting subtle endpoint signal. Partial Least Squares (PLS) method is used to analyze the OES data which reduces dimension of the data and increases gap between classes. Support Vector Machine (SVM) is employed to detect endpoint using the data after PLS. SVM classifies normal etching state and after endpoint state. Two data sets from OES are used in training PLS and SVM. The other data sets are used to test the performance of the model. The results show that the trained PLS and SVM hybrid algorithm model detects endpoint accurately.

• Journal of IKEEE
• /
• v.19 no.4
• /
• pp.541-547
• /
• 2015

In current semiconductor manufacturing, as the feature size of integrated circuit (IC) devices continuously shrinks, detecting endpoint in plasma etching process is more difficult than before. For endpoint detection, various kinds of sensors are installed in semiconductor manufacturing equipments, and sensor data are gathered with predefined sampling rate. Generally, detecting endpoint is performed using OES data of by-product. In this study, OES data of both by-product and etchant gas are used to improve reliability of endpoint detection. For the OES data pre-processing, a combination of Signal to Noise Ratio (SNR) and Principal Component Analysis (PCA),are used. Polynomial Regression and Expanded Hidden Markov model (eHMM) technique are applied to pre-processed OES data to detect endpoint.

• Journal of Sensor Science and Technology
• /
• v.19 no.3
• /
• pp.169-175
• /
• 2010

Urinalysis is an important clinical test to diagnose urinary diseases, and dipstick method with visual inspection is widely applied in practice. Automated optical devices recently developed have disadvantages of long measurement time, big size and heavy weight, accuracy degradation with time, etc. The present study proposed a new computer scanning technique, in which the test strip and the standard chart were simultaneously scanned to remove any environmental artifacts, followed by automated differentiation with the minimum distance algorithm, leading to significant enhancement of accuracy. Experiments demonstrated an accuracy of 100 % in that all test results were identical with the human visual inspection. The present technique only uses a personal computer with scanner and shortens the test time to a great degree. The results are also stored and accumulated for later use which can be transmitted to remote locations through a network, thus could be easily integrated to any ubiquitous health care systems.

• The Bulletin of The Korean Astronomical Society
• /
• v.41 no.2
• /
• pp.64.3-65
• /
• 2016

The NISS (Near-infrared Imaging Spectrometer for Star formation history) is the near-infrared instrument optimized to the Next Generation of small satellite series (NEXTSat). The capability of both imaging and low spectral resolution spectroscopy in the near-infrared range is a unique function of the NISS. The major scientific mission is to study the cosmic star formation history in local and distant universe. For those purposes, the main observational targets are nearby galaxies, galaxy clusters, star-forming regions and low background regions. The off-axis optical design is optimized to have a wide field of view ($2deg.{\times}2deg.$) as well as the wide wavelength range from 0.95 to $3.8{\mu}m$. Two linear variable filters are used to realize the imaging spectroscopy with the spectral resolution of ~20. The mechanical structure is considered to endure the launching condition as well as the space environment. The compact dewar is confirmed to operate the infrared detector as well as filters at 80K stage. The electronics is tested to obtain and process the signal from infrared sensor and to communicate with the satellite. After the test and calibration of the engineering qualification model (EQM), the flight model of the NSS is assembled and integrated into the satellite. To verify operations of the satellite in space, the space environment tests such as the vibration, shock and thermal-vacuum test were performed. Here, we report the test results of the flight model of the NISS.