• 대한전기학회:학술대회논문집
• /
• 대한전기학회 1998년도 하계학술대회 논문집 E
• /
• pp.1800-1802
• /
• 1998

The Pohang Light Source (PLS) is a third generation 2 GeV synchrotron machine. An injection kicker modulator is positioned in the PLS storage ring tunnel. The kicker modulator is driving four kicker magnets simultaneously. The kicker magnets produce magnetic field to deflect the stored beam orbit in the storage ring closer to the injected beam from the PLS beam transfer line. The injected beam then falls into the storage ring beam dynamic aperture. The current kicker modulator was upgraded and installed on August 1995. Since then, the kicker modulator has shown very reliable and stable performance. The kicker modulator specifications are ${\sim}6.0{\mu}s$ full width, ${\sim}24$ kA peak current, and 10 Hz repetition rate. Output current waveform is a half sinusoid. Two thyratron switches(EEV CX-1536AX) are used in the kicker modulator. Total accumulated thyratron heater run hour is about 15,000 hours as of May 1998. Measurement result of spatial magnetic field distribution in the kicker magnet shows good uniformity.

• 한국소성가공학회:학술대회논문집
• /
• 한국소성가공학회 2008년도 춘계학술대회 논문집
• /
• pp.269-272
• /
• 2008

LGP is a key component of LCD back light unit because it determines the brightness and sharpness of display image. Usually, it has optical patterns fabricated on the bottom surface. In the present paper the LiGA-reflow method was applied to fabricate the LGP mold. Furthermore, the optical simulation considering the replication ratio of pattern height was applied to the pattern design. The optical simulation through systematic correction scheme helped find the optimum distribution of pattern density. Finally, the stamper fabricated by this method was installed in the mold and LGP was produced by injection molding. As a result of luminance measurement for the final product, the average luminance and luminance uniformity was measured 3,180 nit and 84%, respectively. Consequently, the mold fabrication method using the LiGA-reflow and optical simulation(CAE) can save the expense and time compared with the existing fabrication methods(laser ablation and chemical etching).

• 반도체디스플레이기술학회지
• /
• 제20권3호
• /
• pp.22-26
• /
• 2021

Thin-film encapsulation (TFE) technology is most effective in preventing water vapor and oxygen permeation in the organic light emitting diodes (OLED). Of those, a laminated structure of Al₂O₃ and MgO were applied to provide efficient barrier performance for increasing the stability of devices in air. Atomic layer deposition (ALD) method is known as the most promising technology for making the laminated Al₂O₃/MgO and is used to realize a thin film encapsulation technology in organic light-emitting diodes. Atomic layer deposited inorganic films have superior barrier performance and have advantages of excellent uniformity over large scales at relatively low deposition temperatures. In this study, the control system of the MgCP₂ precursor for the atomic layer deposition of MgO was established in order to deposit the MgO layer stably by the injection time of second level and the stable heating temperature. The deposition rate was obtained stably to be from 4 to 10 Å/cycle using the injection pulse times ranging from 3 to 12 sec and a substrate temperature ranging from 80 to 150 ℃.

• 폴리머
• /
• 제38권2호
• /
• pp.193-198
• /
• 2014

렌즈 그리고 DVD 등과 같은 성형품들은 우수한 광학적 특성을 필요로 한다. 일반사출성형 공정은 캐비티 내에 압력이 높고 큰 온도변화를 포함하게 되어 성형품에 큰 잔류응력이 남아 광학적 품질이 저하된다. 따라서 이와 같은 제품들은 성형 시 잔류응력을 최소화하기 위해 캐비티 내의 압력을 낮게 그리고 균일하게 조절할 수 있는 사출압축성형 공정을 사용하는 경우가 많다. 본 연구에서는 실험을 통하여 사출압축 성형품에 영향을 주는 성형인자를 분석하였다. 다수 캐비티 금형을 이용하여 캐비티 간 품질편차도 고찰하였다. 실험에 사용한 재료는 투명수지인 PC와 PS이었다. 사출압축성형의 실험에서 공정변수로는 압축거리, 압축속도, 압축력 그리고 압축지연시간을 이용하였다. 실험결과, 사출압축성형 공정 변수 중 압축력과 압축지연시간 그리고 압축거리가 광학적 특성에 크게 영향을 미쳤으며 그 정도는 수지에 따라 다르게 나타났다. 이러한 현상은 사출압축성형 시 수지마다 유동성에 따라 최적의 성형조건이 있음을 의미하는 것이다.

• 한국자동차공학회논문집
• /
• 제14권1호
• /
• pp.68-78
• /
• 2006

In the past few years, considerable efforts have been directed towards the further development of Urea-SCR(selective catalytic reduction) technique for diesel-driven vehicle. Although urea possesses considerable advantages over Ammonia$(NH_3)$ in terms of toxicity and handling, its necessary decomposition into Ammonia and carbon dioxide complicates the DeNOx process. Moreover, a mobile SCR system has only a short distance between engine exhaust and the catalyst entrance. Hence, this leads to not enough residence times of urea, and therefore evaporation and thermolysis cannot be completed at the catalyst entrance. This may cause high secondary emissions of Ammonia and isocyanic acid from the reducing agent and also leads to the fact that a considerable section of the catalyst may be misused for the purely thermal steps of water evaporation and thermolysis of urea. Hence the key factor to implementation of SCR technology on automobile is fast thermolysis, good mixing of Ammonia and gas, and reducing Ammonia slip. In this context, this study performs three-dimensional numerical simulation of urea injection of heavy-duty diesel engine under various injection pressure, injector locations and number of injector hole. This study employs Eulerian-Lagrangian approach to consider break-up, evaporation and heat and mass-transfer between droplet and exhaust gas with considering thermolysis and the turbulence dispersion effect of droplet. The SCR-monolith brick has been treated as porous medium. The effect of location and number of hole of urea injector on the uniformity of Ammonia concentration distribution and the amount of water at the entrance of SCR-monolith has been examined in detail under various injection pressures. The present results show useful guidelines for the optimum design of urea injector for reducing Ammonia slip and improving DeNOx performance.

• 반도체디스플레이기술학회지
• /
• 제21권1호
• /
• pp.67-70
• /
• 2022

In order to prevent water vapor and oxygen permeation in the organic light emitting diodes (OLED), Al₂O₃ thin-film encapsulation (TFE) technology were investigated. Atomic layer deposition (ALD) method was used for making the Al₂O₃ TFE layer because it has superior barrier performance with advantages of excellent uniformity over large scales at relatively low deposition temperatures. In this study, the thickness of the Al₂O₃ layer was varied by controlling the numbers of the unit pulse cycle including Tri Methyl Aluminum(Al(CH₃)₃) injection, Ar purge, and H₂O injection. In this case, several process parameters such as injection pulse times, Ar flow rate, precursor temperature, and substrate temperatures were fixed for analysis of the effect only on the thickness of the Al₂O₃ layer. As results, at least the thickness of 39 nm was required in order to obtain the minimum WVTR of 9.04 mg/m²day per one Al₂O₃ layer and a good transmittance of 90.94 % at 550 nm wavelength.

• 청정기술
• /
• 제27권1호
• /
• pp.61-68
• /
• 2021

선택적 촉매 혼합법은 대용량의 화력 발전시스템에서 질소산화물을 제거하는 방법으로 많이 사용되고 있다. 분사된 암모니아와 유입된 배기가스의 균일한 혼합은 촉매 층에서의 탈질 환원 과정에서 매우 중요하다. 본 연구에서는 탈질설비의 암모니아 분사시스템 설계과정에 전산해석 기법을 적용하였다. 적용 모델은 현재 가동되고 있는 800 MW급 석탄 화력 발전소의 탈질설비이다. 유동 해석 범위는 암모니아 분사 시스템 입구에서 촉매 층 후단부이다. 2차원 유동장을 선택하였고 비압축성으로 가정하였다. 상용 소프트웨어인 ANSYS-Fluent를 사용하여 정상 상태의 난류 유동을 해석하였다. 설계 변수로는 암모니아 분사 시스템에서의 노즐 배치 간극과 분사 유량으로 4가지 경우에 대해 결과를 분석하였다. 촉매 층 입구에서의 몰 비에 의한 평균제곱근오차 값을 최적화 변수로 선정하였고 실험계획법을 기반으로 한 최적화 알고리즘을 도입하였다. 노즐 피치와 유량을 동시에 조절한 경우가 유동 균일성 관점에서 가장 우수하였다.

• 한국연소학회:학술대회논문집
• /
• 한국연소학회 2001년도 제22회 KOSCI SYMPOSIUM 논문집
• /
• pp.99-105
• /
• 2001

For the design of selective catalytic reactors of NOx by $NH_3$, engineering approach can be performed to determine the reactor shape, mixing device and $NH_3$ injection system. This study shows the optimization of guide vanes to improve the flow pattern near the catalyst layer of SCR in a untility boiler. By varying their spacings and shapes, flow performance of guide vanes was analyzed to achieve an uniform velocity distribution which increases the NOx convesion efficiency, and a flow direction normal to the layer which minimises the erosion by the dust in the flue gas. Including these results, experimental and numerical studies for the SCR design were discussed.

• 한국정밀공학회:학술대회논문집
• /
• 한국정밀공학회 2003년도 춘계학술대회 논문집
• /
• pp.632-635
• /
• 2003

As a process technology of nano pattern with a new conception for economic and practical technology of alternative nano process. process technologies such as Embossing, Imprinting. Molding and Inking are beginning to make its appearance. Among these alternative processes, nano mold process is a process that is of benefit to mass production and keeps excellency of reproduction and high quality of parts. In this study, we experienced micro precision machining technology of nano stamper for the injection mold of optical disk with big capacity. Especially, Flatness and uniformity are important for nano stamper with global area, for the purpose of developing polishing technology of micro precision of Back polishing only being used for nano stamper, we carried out a basic study to secure flatness standards

• 한국추진공학회지
• /
• 제17권4호
• /
• pp.81-88
• /
• 2013

케로신과 액체산소를 추진제로 하는 다단연소방식 액체엔진용 산화제 과잉 예연소기를 설계하여 설계점에서 연소시험을 수행하였다. 설계된 산화제 과잉 예연소기는 산화제 일부와 연료를 혼합헤드를 통해 연소실에 공급하여 연소시키고 나머지 산화제를 연소실 재생냉각채널을 거쳐 연소실 중앙의 분사공을 통해 연소실로 주입하여 기화시키는 형태로 최종적으로 연소압 20 MPa, 혼합비 60에서 작동한다. 혼합헤드에는 단일 와류형 분사기를 벌집형태로 배열하였으며 가스 온도 균일성 향상과 연소 안정성 향상을 위한 혼합링과 터빈까지의 배관을 고려한 노즐을 장착하였다. 설계점 연소시험에서 산화제 과잉 예연소기는 높은 연소 안정성과 생성가스의 균일한 온도분포를 보였다.