• Title/Summary/Keyword: Influence of oxide

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Influence of the Cyclic Parameters on the Nitric Oxide Formation in the diesel Engine

  • Rosli Abu Bakar
    • Transactions of the Korean Society of Automotive Engineers
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    • v.6 no.1
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    • pp.27-35
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    • 1998
  • This study describes the influence of combustion parameters on the nitric oxide emission, such as injection timing, air flow rate, injected amount of fuel, and compression ratio of engine. In order to determine the influence factors on the nitric oxide emission, the experiment were investigated with various parameters of engine cycle. According to the results of this study, the retardation of injection timing and the increases of airflow rate, and the decreases of fuel injection amount reduce the nitric oxide concentration in the exhaust emissions. Also, the increases of compression ration of engine increase in the concentration of nitric oxide formation in the combustion chamber. The results of this study give a guideline to decrease the nitric oxide formation by using the simulation program.

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Influence of Compositions on Sol-Gel Derived Amorphous In-Ga-Zn Oxide Semiconductor Transistors

  • Kim, Dong-Jo;Koo, Chang-Young;Song, Keun-Kyu;Jeong, Young-Min;Moon, Joo-Ho
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.1586-1589
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    • 2009
  • We investigated the influence of chemical compositions of gallium and indium cations on the performance of solgel derived amorphous gallium indium zinc oxide (a-GIZO) based thin-film transistors (TFTs). Systematical composition study allows us to understand the solutionprocessed a-GIZO TFTs. Understanding of the compositional influence can be utilized for tailoring the solution processed amorphous oxide TFTs for the specific applications.

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Development of multi-cell flows in the three-layered configuration of oxide layer and their influence on the reactor vessel heating

  • Bae, Ji-Won;Chung, Bum-Jin
    • Nuclear Engineering and Technology
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    • v.51 no.4
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    • pp.996-1007
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    • 2019
  • We investigated the influence of the aspect ratio (H/R) of the oxide layer on the reactor vessel heating in three-layer configuration. Based on the analogy between heat and mass transfers, we performed mass transfer experiments to achieve high Rayleigh numbers ranging from $6.70{\times}10^{10}$ to $7.84{\times}10^{12}$. Two-dimensional (2-D) semi-circular apparatuses having the internal heat source were used whose surfaces of top, bottom and side simulate the interfaces of the oxide layer with the light metal layer, the heavy metal layer, and the reactor vessel, respectively. Multi-cell flow pattern was identified when the H/R was reduced to 0.47 or less, which promoted the downward heat transfer from the oxide layer and possibly mitigated the focusing effect at the upper metallic layer. The top boundary condition greatly affected the natural convection of the oxide layer due to the presence of secondary flows underneath the cold light metal layer.

Influence of Electrolytic KF on the Uniform Thickness of Oxide Layers Formed on AZ91 Mg Alloy by Plasma Electrolytic Oxidation

  • Song, Duck-Hyun;Lim, Dae-Young;Fedorov, Vladimir;Song, Jeong-Hwan
    • Korean Journal of Materials Research
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    • v.27 no.9
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    • pp.495-500
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    • 2017
  • Oxide layers were formed by an environmentally friendly plasma electrolytic oxidation (PEO) process on AZ91 Mg alloy. PEO treatment also resulted in strong adhesion between the oxide layer and the substrate. The influence of the KF electrolytic solution and the structure, composition, microstructure, and micro-hardness properties of the oxide layer were investigated. It was found that the addition of KF instead of KOH to the $Na_2SiO_3$ electrolytic solution increased the electrical conductivity. The oxide layers were mainly composed of MgO and $Mg_2SiO_4$ phases. The oxide layers exhibited solidification particles and pancake-shaped oxide melting. The pore size and surface roughness of the oxide layer decreased considerably with an increase in the concentration of KF, while densification of the oxide layers increased. It is shown that the addition of KF to the basis electrolyte resulted in fabricating of an oxide layer with higher surface hardness and smoother surface roughness on Mg alloys by the PEO process. The uniform thickness of the oxide layer formed on the Mg alloy substrates was largely determined by the electrolytic solution with KF, which suggests that the composition of the electrolytic solution is one of the key factors controlling the uniform thickness of the oxide layer.

High Power Single Mode Multi-Oxide Layer VCSEL with Optimized Thicknesses and Aperture Sizes of Oxide Layers

  • Yazdanypoor, Mohammad;Emami, Farzin
    • Journal of the Optical Society of Korea
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    • v.18 no.2
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    • pp.167-173
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    • 2014
  • A novel multi-oxide layer structure for vertical cavity surface emitting laser (VCSEL) structures is proposed to achieve higher single mode output power. The structure has four oxide layers with different aperture sizes and thicknesses. The oxide layer thicknesses are optimized simultaneously to reach the highest single mode output power. A heuristic method is proposed for plotting the influence of these variable changes on the operation of optical output power. A comprehensive optical-electrical thermal-gain self-consistent VCSEL model is used to simulate the continuous-wave operation of the multi-layer oxide VCSELs. A comparison between optimized VCSELs with different structures is presented. The results show that by using multi-oxide layers with different thicknesses, higher single-mode optical output power could be achieved in comparison with multi-oxide layer structures with the same thicknesses.

Effect of the Neutral Beam Energy on Low Temperature Silicon Oxide Thin Film Grown by Neutral Beam Assisted Chemical Vapor Deposition

  • So, Hyun-Wook;Lee, Dong-Hyeok;Jang, Jin-Nyoung;Hong, Mun-Pyo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.253-253
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    • 2012
  • Low temperature SiOx film process has being required for both silicon and oxide (IGZO) based low temperature thin film transistor (TFT) for application of flexible display. In recent decades, from low density and high pressure such as capacitively coupled plasma (CCP) type plasma enhanced chemical vapor deposition (PECVD) to the high density plasma and low pressure such as inductively coupled plasma (ICP) and electron cyclotron resonance (ECR) have been used to researching to obtain high quality silicon oxide (SiOx) thin film at low temperature. However, these plasma deposition devices have limitation of controllability of process condition because process parameters of plasma deposition such as RF power, working pressure and gas ratio influence each other on plasma conditions which non-leanly influence depositing thin film. In compared to these plasma deposition devices, neutral beam assisted chemical vapor deposition (NBaCVD) has advantage of independence of control parameters. The energy of neutral beam (NB) can be controlled independently of other process conditions. In this manner, we obtained NB dependent high crystallized intrinsic and doped silicon thin film at low temperature in our another papers. We examine the properties of the low temperature processed silicon oxide thin films which are fabricated by the NBaCVD. NBaCVD deposition system consists of the internal inductively coupled plasma (ICP) antenna and the reflector. Internal ICP antenna generates high density plasma and reflector generates NB by auger recombination of ions at the surface of metal reflector. During deposition of silicon oxide thin film by using the NBaCVD process with a tungsten reflector, the energetic Neutral Beam (NB) that controlled by the reflector bias believed to help surface reaction. Electrical and structural properties of the silicon oxide are changed by the reflector bias, effectively. We measured the breakdown field and structure property of the Si oxide thin film by analysis of I-V, C-V and FTIR measurement.

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The Influence of Combustor Atmospheric Pressure on Flame Characteristics (연소실 분위기 압력이 화염형상에 미치는 영향)

  • Kim, J.R.;Choi, G.M.;Kim, D.J.
    • Proceedings of the KSME Conference
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    • 2004.11a
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    • pp.1134-1139
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    • 2004
  • Recently, development of flame control scheme has been hot issues in the combustion engineering. It has been held that flame shape can be controllable by pressure inside combustor. The influence of combustor atmospheric pressure on flame shape was investigated in the present study. The flame shape, flammable limit, flame temperature and nitric oxide emission were measured as functions of combustor atmospheric pressure and equivalence ratio. The reaction region became longer and wider with decreasing combustor atmospheric pressure by direct photography, hence reduction of blow off limit. This tendency was also observed in the mean flame temperature distribution. Nitric oxide emission decreased with decreasing combustor atmospheric pressure. Low NOx combustion is ascribed to wide-spread reaction region in the low atmospheric pressure condition. These results demonstrate that flame shape and nitric oxide emission can be controllable with combustor atmospheric pressure.

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