• 제목/요약/키워드: Infeed Grinding

검색결과 16건 처리시간 0.02초

Modeling of the Axial Movement of Parts During Centerless Through-Feed Grinding

  • Kim, Kang
    • Journal of Mechanical Science and Technology
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    • 제17권7호
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    • pp.1044-1053
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    • 2003
  • There are two major differences between the centerless infeed grinding process and the centerless through-feed grinding process. One is an axial movement of workpieces, and the other is that several workpieces are ground simultaneously and continuously by through-feeding. Because of these differences, through-feed ground parts inherently possess not only the roundness error but also the tapering error. The aims of the research reported in this paper are to examine this inherent tapering characteristic and to find the effects of grinding variables (center height angle, regulating wheel tilt angle, and shape of grinding wheel surface). To accomplish the objectives, experiments were carried out using two types of cylindrical workpiece shapes. Also, computer simulations were performed using the 3-D through-feed grinding model.

주축모터전류신호를 이용한 원통 연삭시 가공 상태 평가에 관한 연구 (A Study on the Evaluation of Machining States in the Cylindrical Plunge Grinding using the Current Signals of a Spindle Motor)

  • 송지복;이은상;김남훈
    • 한국정밀공학회지
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    • 제17권6호
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    • pp.76-82
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    • 2000
  • This paper describes the machining characteristics of cylindrical plunge grinding. The study investigates the process using the current signals of a spindle motor through a hall sensor. Grinding experiments were conducted under various conditions such as wheel speeds, workpiece speeds and infeed rates with a conventional vitrified bonded wheel. Analyzing the current signal of the spindle motor, a relationship between current signals and the metal removal rate in terms of the in(red rate is induced. It was also shown that a hall sensor has similar capabilities in evaluation of grinding behavior compared to the AE signals, which are useful far monitoring the grinding process.

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2 Dimensional Modeling of Centerless Grinding -Infeed (Plunge) Process-

  • Kim, Kang
    • International Journal of Precision Engineering and Manufacturing
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    • 제4권4호
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    • pp.25-31
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    • 2003
  • A computer simulation model for investigating a two-dimensional (2-D) rounding mechanism in a centerless grinding process is described. This model includes the interference phenomena and the concept of machining elasticity. Since initial contact points are used as a reference, the result of this simulation is not affected by the location of the reference circle center and the radius of the reference circle. Also, details of the machining factor are studied by using process variables (grinding wheel speed, wheel specification, workpiece speed, dressing condition, etc.). The effect of the threshold grinding force on the size of ground workpiece is investigated. For the verification of this method, simulation results are compared with the experimental work.

원통연삭시 휠속도 변화의 패턴인식을 이용한 채터감시에 관한 연구 (A Study on the Monitoring of Chatter Vibration Using Pattern Recognition in the Plunge Grinding)

  • 이종열;송지복;곽재섭
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 1995년도 추계학술대회 논문집
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    • pp.28-32
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    • 1995
  • Bacause the chatter vibration is a main factor to damage on the quality and integrity, The cure is required peticurity in cykinderical plunge grinding. The chatter vibration relatied with wheel speed, workpiece and infeed rate. Therefore, we expressed more credible normal signal and chatter signal Pattern in accrdiance with wheel speed and acquired RMS signal of the accelerrometer. In thos study, after finding the chatter pattern, we applied two parameters, standard deviation and Kurtosis, to Neural Network.

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CVD-SiC 소재의 가공 특성에 관한 연구 (A Study on the Machining Characteristics of CVD-SiC)

  • 박휘근;이원석;강동원;박인승;이종찬
    • 한국기계가공학회지
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    • 제16권5호
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    • pp.40-46
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    • 2017
  • A plasma gas control apparatus for semiconductor plasma etching processes securely holds a cathode for forming a plasma, confines the plasma during the plasma etching process, and discharges gas after etching. It is a key part of the etching process. With the advancement of semiconductor technology, there is increasing interest in parts for semiconductor manufacturing that directly affect wafers. Accordingly, in order to replace the plasma gas control device with a CVD-SiC material superior in mechanical properties to existing SiCs (Sintered-SiC, RB-SiC), a study on the grinding characteristics of CVD-SiC was carried out. It is confirmed that the optimal grinding condition was obtained when the result table feed rate was 2 m/min and the infeed depth was $5{\mu}m$.

실리콘 웨이퍼의 인피드그라인딩에 있어 연삭저항력 측정을 위한 진공척의 개발

  • 박준민;정석훈;정재우;정해도
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2004년도 춘계학술대회 논문요약집
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    • pp.260-260
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    • 2004
  • 연삭 가공은 대직경 반도체 웨이퍼의 경면 가공, 산업용 정밀 부품, 광학 분야의 고정밀급 렌즈 등 여러 산업 분야의 각종 정밀 부품의 마무리 공정에 적총되어 제품의 질을 좌우하는 필수적인 공정이라 할 수 있다. 이러한 연삭 가공은 높은 치수 정밀도와 양호한 표면 거칠기 및 제품의 형상을 동시에 만족시킬 수 있는 가공 기술로서 , 대직경 웨이퍼 생산에 있어서, 고정밀ㆍ고품위의 웨이퍼를 양산하는데 적합한 기술로 인식되고 있다.(중략)

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