• Title/Summary/Keyword: Inelastic Electron Tunneling Spectroscopy

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Elastic and inelastic electron tunneling characteristics in polyimide LB films (Polyimide LB막내의 탄성 및 비탄성 tunneling 전기전도특성)

  • ;;Mitsumasa Iwamoto
    • Electrical & Electronic Materials
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    • v.7 no.6
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    • pp.473-480
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    • 1994
  • The electron tunnel effect in polvimide LB films sandwiched between metal electrodes has been investigated in the present work by a study of both the elastic and inelastic tunneling components. By the results of elastic tunneling experiments in Au/Pl/Au tunneling junction, we can judge the height and thickness of tunnel barrier. The inelastic current in Inelastic Electron Tunneling Spectroscopy(IETS) is due to the interaction of the tunneling electron with the vibrational modes of the molecular species in the barrier. Measurements are done on Au/PI/Pb tunneling junctions. The spectra obtained are the second derivatives of the current-voltage characteristics of these junctions : specifically, d$^{2}$1/dV$^{2}$ as a function of voltage V. Because the energies measured by IETS can be directly compared to those measured by infrared and Raman spectroscopy, IR-RAS spectroscopy also measured for reference.

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Inelastic Electron Tunneling in Au/polyimide/monolayer Organic Film/Pb Structures using a Polyimide Barrier (Polyimide 터널 장벽을 이용한 Au/polyimide/유기 단분자막/Pb 구조에서 비탄성 전자 터널링에 관한 연구)

  • ;;;;;;M. Iwamoto
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.2
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    • pp.196-200
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    • 2004
  • Using polyimide Langmuir-Blodgett(LB) films as a tunneling harrier, we fabricated Au/Polyimide/1-layer arachidic acid/Pb structure in order to investigate electron transport properties through a junction. It was found that 9-layer polyimide LB films function as a good tunneling harrier in a study of current-voltage(I-V) chararteristics. And several peaks originating in the vibrational modes of the constituent molecules of 1-layer arachidic acid LB films were clearly observed in d$^2$V/dI$^2$- V corves.

Recent Development of MRAM Technology

  • Miyazaki, T.;Ando, Y.;Kubota, H.
    • Journal of Magnetics
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    • v.8 no.1
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    • pp.36-44
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    • 2003
  • Three topics which are related to technologies for developing of large capacity MRAM over Gbits are reviewed. First, it is stressed that inelastic-electron-tunnel-tunneling spectroscopy(IETS) is a powerfull method to investigate the interface state between magnetic electrodes and insulator. Second, magnetic tunnel junctions with small bias voltage dependence are introduced. Finally, fabrication method of carbon masks for very small magnetic tunnel junctions is demonstrated. These three topics were presented at 47^{th} MMM 2002 conference and each paper will appear in the proceedings.

Inelastic Electron Tunneling Spectroscopy of 1-layer Arachidicacid films using a Polyimide barrier (Polyimide 터널 장벽을 이용한 Arachidicacid 단분자막의 비탄성 터널 스펙트라)

  • Lee, Won-Jae;Kang, Dou-Yol;Iwamoto, Mitsumasa
    • Proceedings of the KIEE Conference
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    • 1994.11a
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    • pp.234-236
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    • 1994
  • We fabricated Au/PI/Pb and Au/PI/1-layer Arachidic acid/Pb structures in order to electron transport properties through the junctions. It was found that 9-layer PI LB films function as a good tunneling barrier from the I-V properties. And several peaks originating in the vibrational modes of the constituent molecules of 1-layer arachidicacid LB films were clearly observed in $d^2V/dI^2-V$ curves.

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Electronic and Optical Properties of amorphous and crystalline Tantalum Oxide Thin Films on Si (100)

  • Kim, K.R.;Tahir, D.;Seul, Son-Lee;Choi, E.H.;Oh, S.K.;Kang, H.J.;Yang, D.S.;Heo, S.;Park, J.C.;Chung, J.G.;Lee, J.C.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.382-382
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    • 2010
  • $TaO_2$ thin films as gate dielectrics have been proposed to overcome the problems of tunneling current and degradation mobility in achieving a thin equivalent oxide thickness. An extremely thin $SiO_2$ layer is used in order to separate the carrier in MOSFETchannel from the dielectric field fluctuation caused by phonons in the dielectric which decreases the carrier mobility. The electronic and optical properties influenced the device performance to a great extent. The atomic structure of amorphous and crystalline Tantalum oxide ($TaO_2$) gate dielectrics thin film on Si (100) were grown by utilizing atomic layer deposition method was examined using Ta-K edge x-ray absorption spectroscopy. By using X-ray photoelectron spectroscopy and reflection electron energy loss spectroscopy (REELS) the electronic and optical properties was obtained. In this study, the band gap (3.400.1 eV) and the optical properties of $TaO_2$ thin films were obtained from the experimental inelastic scattering cross section of reflection electron energy loss spectroscopy (REELS) spectra. EXAFS spectra show that the ordered bonding of Ta-Ta for c-$TaO_2$ which is not for c-$TaO_2$ thin film. The optical properties' e.g., index refractive (n), extinction coefficient (k) and dielectric function ($\varepsilon$) were obtained from REELS spectra by using QUEELS-$\varepsilon$(k, $\omega$)-REELS software shows good agreement with other results. The energy-dependent behaviors of reflection, absorption or transparency in $TaO_2$ thin films also have been determined from the optical properties.

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